X‐ray photoelectron spectroscopy study on the electrical double layer at an Al2O3–Al interface (Englisch)
- Neue Suche nach: Sambe, Hideo
- Neue Suche nach: Ramaker, David E.
- Neue Suche nach: Sambe, Hideo
- Neue Suche nach: Ramaker, David E.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
10
, 5
;
2991-2995
;
1992
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:X‐ray photoelectron spectroscopy study on the electrical double layer at an Al2O3–Al interface
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Weitere Titelangaben:Electrical double layer at an Al2O3–Al interface
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Beteiligte:Sambe, Hideo ( Autor:in ) / Ramaker, David E. ( Autor:in )
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Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 10, 5 ; 2991-2995
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.09.1992
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Format / Umfang:5 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 10, Ausgabe 5
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