Reactive sputtering of Ta under gradient oxygen pressure (Englisch)
- Neue Suche nach: Niwa, T.
- Neue Suche nach: Saito, T.
- Neue Suche nach: Kinbara, A.
- Neue Suche nach: Niwa, T.
- Neue Suche nach: Saito, T.
- Neue Suche nach: Kinbara, A.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
11
, 5
;
2790-2795
;
1993
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Reactive sputtering of Ta under gradient oxygen pressure
-
Weitere Titelangaben:Reactive sputtering of Ta under gradient oxygen pressure
-
Beteiligte:
-
Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 11, 5 ; 2790-2795
-
Verlag:
- Neue Suche nach: American Vacuum Society
-
Erscheinungsdatum:01.09.1993
-
Format / Umfang:6 pages
-
ISSN:
-
DOI:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Elektronische Ressource
-
Sprache:Englisch
-
Schlagwörter:
-
Datenquelle:
Inhaltsverzeichnis – Band 11, Ausgabe 5
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 2393
-
Real-time determination of the direction of water temperature change by spatially resolved infrared laser interferometric thermometryDonnelly, V. M. et al. | 1993
- 2393
-
Real‐time determination of the direction of wafer temperature change by spatially resolved infrared laser interferometric thermometryDonnelly, V. M. et al. | 1993
- 2398
-
Real‐time in situ ellipsometric control of antireflection coatings for semiconductor laser amplifiers using SiOxWu, I‐Fan / Dottellis, J. B. / Dagenais, Mario et al. | 1993
- 2407
-
Growth mechanism and surface alloy formation of Ni on Pt(110) surfaceFu, T. I. / Liao, P. C. / Shern, C. S. et al. | 1993
- 2411
-
Interfacial reactions between aluminum and BPDA‐PDAChenite, A. / Selmani, A. / Lamontagne, B. / Yelon, A. et al. | 1993
- 2419
-
Ultrahigh vacuum metalorganic chemical vapor deposition growth and in situ characterization of epitaxial TiO2 filmsChen, Samuel / Mason, M. G. / Gysling, H. J. / Paz‐Pujalt, G. R. / Blanton, T. N. / Castro, T. / Chen, K. M. / Fictorie, C. P. / Gladfelter, W. L. / Franciosi, A. et al. | 1993
- 2430
-
Comparative study of the crystal structure of synthesized CuGa1−yInyTe2 compoundsLeón, M. / Merino, J. M. / Martin De Vidales, J. L. et al. | 1993
- 2430
-
Comparative study of the crystal structure of synthesized CuGa1-gIngTe2 compoundsLeon, M. et al. | 1993
- 2437
-
Aluminum nitride thin film sensor for force, acceleration, and acoustic emission sensingZheng, L. / Ramalingam, S. / Shi, T. / Peterson, R. L. et al. | 1993
- 2447
-
Instability of the metal microcrystal surface at intense electron emission*Ptitsin, V. E. et al. | 1993
- 2452
-
Material properties of a ZrNx film on silicon prepared by ion‐assisted deposition methodHorita, Susumu / Tujikawa, Tetuya / Akahori, Hiroshi / Kobayashi, Mituru / Hata, Tomonobu et al. | 1993
- 2452
-
Material properties of ZrN~x film on silicon prepared by ion-assisted deposition methodHorita, S. / Tujikawa, T. / Akahori, H. / Kobayashi, M. et al. | 1993
- 2458
-
Mesh pattern of Ge islands grown using solid phase epitaxyHibino, H. / Shimizu, N. / Shinoda, Y. et al. | 1993
- 2463
-
Investigation of the kinetics of digermane chemisorption and reaction product desorption in thin film growth of germaniumEres, Gyula / Sharp, J. W. et al. | 1993
- 2472
-
Production of a dense metal‐ion stream for ion coating by a pulsed vacuum arc in a strong magnetic fieldNakagawa, Yoshiro / Itami, Masao et al. | 1993
- 2477
-
Synthesis of carborane and boron‐rich films from solid diborane using synchrotron radiationRuckman, M. W. / Murray, M. F. / Mowlem, J. K. / Strongin, D. R. et al. | 1993
- 2483
-
Spin correlation effects on the bonding character of alkali/silicon interfaces: An extended Hubbard modelLópez‐Sancho, J. M. / Refolio, M. C. / López‐Sancho, M. P. / Rubio, J. et al. | 1993
- 2487
-
Novel radio‐frequency induction plasma processing techniquesKeller, John H. / Forster, John C. / Barnes, Michael S. et al. | 1993
- 2492
-
Reactive ion etching of SiGe alloys using fluorine‐containing plasmas*Zhang, Ying / Oehrlein, Gottlieb S. / de Frésart, Edouard / Corbett, James W. et al. | 1993
- 2496
-
Dual‐function remote plasma etching/cleaning system applied to selective etching of SiO2 and removal of polymeric residuesYasuda, T. / Lucovsky, G. et al. | 1993
- 2508
-
Moving‐coil waveguide discharge for inner coating of metal tubesHytry, R. / Möller, W. / Wilhelm, R. / Keudell, A. v. et al. | 1993
- 2508
-
Moving-coll waveguide discharge for inner coating of metal tubesHytry, R. / Moeller, W. / Wilhelm, R. / Keudell, A. V. et al. | 1993
- 2518
-
Oxygen discharge cleaning method for aluminum storage ring vacuum chambersSaitoh, Masao / Kanazawa, Ken‐ichi / Momose, Takashi / Ishimaru, Hajime / Ota, Nobuhiko / Uramoto, Jōshin et al. | 1993
- 2525
-
Correlation of plasma and surface chemistry during electron cyclotron resonance hydrogen etching of native silicon oxideTsai, W. / Delfino, M. / Day, M. E. / Sheng, T. / Chung, B. C. / Salimian, S. et al. | 1993
- 2530
-
Etching of a‐C:H films by an atomic oxygen beamBourdon, E. B. D. / Raveh, A. / Gujrathi, S. C. / Martinu, L. et al. | 1993
- 2536
-
Surface characterization of GaAs after the reactive ion etching of GeMoW ohmic contact in radio frequency SF6–O2 plasmaCampo, A. / Cardinaud, Ch. / Turban, G. / Dubon‐Chevallier, C. / Amarger, V. / Etrillard, J. et al. | 1993
- 2543
-
Role of contaminants in electron cyclotron resonance plasmasGoeckner, M. J. / Meyer, J. A. / Kim, G.‐H. / Jenq, J.‐S. / Matthews, A. / Taylor, J. W. / Breun, R. A. et al. | 1993
- 2553
-
Thermal desorption of ultraviolet–ozone oxidized Ge(001) for substrate cleaningZhang, X.‐J. / Xue, G. / Agarwal, A. / Tsu, R. / Hasan, M.‐A. / Greene, J. E. / Rockett, A. et al. | 1993
- 2562
-
Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistryStout, Phillip J. / Kushner, Mark J. et al. | 1993
- 2572
-
Wave propagation and plasma uniformity in an electron cyclotron resonance plasmaSamukawa, Seiji et al. | 1993
- 2577
-
Excimer laser reactive ablation: An efficient approach for the deposition of high quality TiN filmsMihailescu, I. N. / Chitica, N. / Teodorescu, V. S. / De Giorgi, M. Luisa / Leggieri, G. / Luches, A. / Martino, M. / Perrone, A. / Dubreuil, B. et al. | 1993
- 2583
-
Comparison of TiAlN coatings grown by unbalanced magnetron and arc bond sputtering techniquesMünz, W.‐D. / Hurkmans, T. / Keiren, G. / Trinh, T. et al. | 1993
- 2583
-
Comparison of TiAIN coatings grown by unbalanced magnetron and arc bond sputtering techniquesMünz, W.-D. et al. | 1993
- 2590
-
Surface characterization of fluorinated polyimide films grown by vapor deposition polymerizationMaruo, Yasuko Yamada / Andoh, Yasuko / Sasaki, Shigekuni et al. | 1993
- 2597
-
Time‐of‐flight secondary ion mass spectrometry study of P2S5/(NH4)2S‐ and ultraviolet/ozone‐treated GaAsBennett, J. / Dagata, J. A. et al. | 1993
- 2603
-
Accurate determination of delay time and length of flight path for a time‐of‐flight modulated molecular beam apparatusWu, P. K. / Hudson, J. B. et al. | 1993
- 2610
-
Photoirradiation‐charge compensation for secondary ion mass spectrometers analysis of semiconductorsHayashi, Shun‐ichi / Hashiguchi, Yoshihiro et al. | 1993
- 2614
-
Photoion detection with a wide dynamic range using a quadrupole mass spectrometer for nonresonant multiphoton ionization of sputtered neutralsMaruo, T. / Higashi, Y. / Tanaka, T. / Homma, Y. et al. | 1993
- 2619
-
Photoelectron spectroscopic studies on interfacial reactions in Zr/2×1(100)Si and Zr/SiO2/(100)Si systemsYamauchi, T. / Kitamura, H. / Wakai, N. / Zaima, S. / Koide, Y. / Yasuda, Y. et al. | 1993
- 2619
-
Photoelectron spectroscopic studies on interfacial reactions in Zr-2x1(1oo)Si and Zr-SiO2-(100)Si systemsYamauchi, T. et al. | 1993
- 2623
-
Correlation of outgassing of stainless steel and aluminum with various surface treatmentsDylla, H. F. / Manos, D. M. / LaMarche, P. H. et al. | 1993
- 2637
-
Hydrogen desorption behavior of aluminium materials used for extremely high vacuum chamberHirohata, Yuko / Fujimoto, Satoshi / Hino, Tomoaki / Yamashina, Toshiro et al. | 1993
- 2642
-
Structural change of titanium oxide evaporated films during in situ heating in an electron microscopeYamada, Y. / Shiota, I. / Yoshida, K. et al. | 1993
- 2649
-
Surface structure of SrTiO3(001) with various surface treatmentsHikita, Tokihisa / Hanada, Takashi / Kudo, Masahiro / Kawai, Maki et al. | 1993
- 2655
-
Extremely high vacuum system for dynamical surface analysisTsukui, Katsuyuki / Endo, Kazuhiko / Hasunuma, Ryu / Osaka, Toshiaki / Ohdomari, Iwao / Yagi, Nobuaki / Aihara, Hajime et al. | 1993
- 2659
-
Auger electron angular distributions from Al(100): Resolution of an apparent contradictionChyan, Oliver M. R. / Frank, Douglas G. / Doyle, Charles A. / Hubbard, Arthur T. et al. | 1993
- 2665
-
Photoelectron spectroscopy studies of Tm silicide films on Si(111)Wigren, C. / Andersen, J. N. / Nyholm, R. / Karlsson, U. O. et al. | 1993
- 2672
-
Scanning tunneling microscopy study of carbon and hydrogen reactions with Si(111) in ultrahigh vacuumRogers, D. / Tiedje, T. et al. | 1993
- 2676
-
In situ observation of growing surface of oxide films by reflection high‐energy electron diffraction beam excited Auger electron spectroscopyNonaka, Hidehiko / Shimizu, Takashi / Ichimura, Shingo / Arai, Kazuo et al. | 1993
- 2681
-
Surface composition of AlN powders studied by x‐ray photoelectron spectroscopy and bremsstrahlung‐excited Auger electron spectroscopyLiao, H. M. / Sodhi, R. N. S. / Coyle, T. W. et al. | 1993
- 2681
-
Surface composition of AIN powders studied by x-ray photoelectron spectroscopy and bremsstrahlung-excited Auger electron spectroscopyLiao, H.M. et al. | 1993
- 2687
-
Oxygen detection in thin silicon dioxide layers by low‐energy x‐ray fluorescence spectrometryKirby, Robert E. / Wherry, David / Madden, Michael et al. | 1993
- 2694
-
X‐ray fluorescence measurements of x‐ray absorption near edge structure at the Si, P, and S L edgesKasrai, Masoud / Yin, Zhanfeng / Bancroft, G. Michael / Tan, Kim H. et al. | 1993
- 2700
-
Hydrogen atom detection by H− conversionSamano, E. C. / Carr, W. E. et al. | 1993
- 2707
-
X‐ray photoelectron spectroscopy study of growth of thin cerium films on polypropyleneHeuberger, M. / Dietler, G. / Nowak, S. / Schlapbach, L. et al. | 1993
- 2714
-
Thermal stability of two‐dimensional atomic structures of Au–Ag adsorbates on Si(111) surfacesYuhara, J. / Inoue, M. / Morita, K. et al. | 1993
- 2718
-
Gas adsorption studies of sputtered amorphous hydrogenated carbon filmsPigram, P. J. / Lamb, R. N. / Collins, R. E. / Pailthorpe, B. A. et al. | 1993
- 2725
-
Thin film properties of germanium oxide synthesized by pulsed laser sputtering in vacuum and oxygen environmentsWolf, Paul J. / Christensen, Thomas M. / Coit, Nathan G. / Swinford, Richard W. et al. | 1993
- 2733
-
Comparison of magnetron sputter deposition conditions in neon, argon, krypton, and xenon dischargesPetrov, I. / Ivanov, I. / Orlinov, V. / Sundgren, J.‐E. et al. | 1993
- 2742
-
Electronic and optical properties of room temperature sputter deposited indium tin oxideLee, S. B. / Pincenti, J. C. / Cocco, A. / Naylor, D. L. et al. | 1993
- 2747
-
Langmuir probe diagnostics of a radio frequency magnetron discharge for deposition of high Tc YBCO filmsMishra, S. K. / Sarkar, A. / Ray, S. K. / Bhattacharya, D. / Chopra, K. L. / Das, S. R. et al. | 1993
- 2752
-
Radio‐frequency reactive sputter etching in magnetron fieldsDavies, K. E. / Gross, M. / Horwitz, C. M. et al. | 1993
- 2758
-
Interferometric measurements of the energy of sputtered copper atoms in a magnetron dischargeTurner, G. M. / Falconer, I. S. / James, B. W. / McKenzie, D. R. et al. | 1993
- 2765
-
Monte Carlo simulations of textured planar magnetron targetsBouchard, F. / Dittmar, M. B. / Manring, B. et al. | 1993
- 2771
-
Effect of substrate temperature on the orientations of radio frequency sputtered Ba2Si2TiO8 thin filmsLi, Yi / Youdelis, William V. / Chao, Benjamin S. / Yamauchi, Hisao et al. | 1993
- 2778
-
Molecular dynamics modeling of microstructure and stresses in sputter‐deposited thin filmsFang, C. C. / Prasad, V. / Jones, F. et al. | 1993
- 2790
-
Reactive sputtering of Ta under gradient oxygen pressureNiwa, T. / Saito, T. / Kinbara, A. et al. | 1993
- 2796
-
Directionality of sputtered Cu atoms in a hollow cathode enhanced planar magnetronTurner, G. M. / Rossnagel, S. M. / Cuomo, J. J. et al. | 1993
- 2802
-
Microstructure of a sputtered Ti film on an indium tin oxide substrateYamashita, Hirofumi / Yamaguchi, Tetsuya / Miyagawa, Ryohei et al. | 1993
- 2808
-
Physical properties of radio‐frequency magnetron sputtered Pb(Zr,Ti)O3 thin films: Direct determination of oxygen composition by Rutherford backscattering spectroscopy and nuclear reaction analysis*Cattan, E. / Agius, B. / Achard, H. / Cheang Wong, J. C. / Ortega, C. / Siejka, J. et al. | 1993
- 2808
-
Physical properties of radio-frequency magnetron sputtered Pb(Zr,Ti)03 thin films: Direct determination of oxygen composition by Rutherford backscattering spectroscopy and nuclear reaction analysisCattan, E. et al. | 1993
- 2816
-
Influence of vacuum gauges on outgassing rate measurementsSaitoh, M. / Shimura, K. / Iwata, T. / Momose, T. / Ishimaru, H. et al. | 1993
- 2822
-
Reflector atomic hydrogen source: A method for producing pure atomic hydrogen in ultrahigh vacuumBornscheuer, K. H. / Lucas, S. R. / Choyke, W. J. / Partlow, W. D. / Yates, J. T. et al. | 1993
- 2827
-
Nuclear polarization of solid deuterium–tritiumSouers, P. C. / Tsugawa, R. T. / Fearon, E. M. / Collins, G. W. / Maienschein, J. L. / Failor, R. A. / Mapoles, E. R. / Fedders, P. A. et al. | 1993
- 2837
-
Development of foam shell with plastic ablator for cryogenic laser fusion targetTakagi, M. / Ishihara, M. / Norimatsu, T. / Yamanaka, T. / Izawa, Y. / Nakai, S. et al. | 1993
- 2846
-
Reactive ion etching of niobium in SF6/O2 to produce sloped sidewall profilesCurtis, B. J. / Mantle, H. et al. | 1993
- 2849
-
Indium doping of silicon using an evaporated indium film sourceKolluri, S. V. / Chandorkar, A. N. / Dhaul, A. et al. | 1993
- 2851
-
Characterization of the virtual source in an electron‐beam evaporation systemMiller, Mark D. / Biltoft, Peter J. / Benapfl, Mike et al. | 1993
- 2854
-
Easily made device for increasing the manipulation length of a high precision ultrahigh vacuum manipulatorReisfeld, G. / Rabi, S. et al. | 1993
- 2856
-
Poor man’s scratch testerMacGill, R. A. / Yao, X. Y. / Castro, R. A. / Dickinson, M. R. / Brown, I. G. et al. | 1993
- 2858
-
Reactive ion etcher self‐bias voltage regulatorSchramm, Jeff E. / Babic, Dubravko I. / Hu, Evelyn L. / Merz, James L. et al. | 1993
- 2860
-
Performance of an ultrahigh‐vacuum sample transfer system for investigation of molecular‐beam epitaxy grown semiconductor surfacesWang, X.‐S. / Huang, C. / Bressler‐Hill, V. / Maboudian, R. / Weinberg, W. H. et al. | 1993
- 2863
-
Simple, compact, high‐purity Cr evaporator for ultrahigh vacuumMcClelland, J. J. / Unguris, J. / Scholten, R. E. / Pierce, D. T. et al. | 1993
- 2865
-
Use of a silicon strip doping source in chemical beam epitaxyJoyce, T. B. / Bullough, T. J. et al. | 1993
- 2867
-
Design of an ultrahigh vacuum direct‐drive, cryogenic sample manipulator providing two degrees of rotational freedomBraun, Robert M. / Winograd, Nicholas et al. | 1993
- 2871
-
‘‘Drawbridge’’ fixture for folding rotary linear magnetic feedthroughsFitch, J. T. / Sumakeris, J. J. / Lucovsky, G. et al. | 1993
- 2874
-
Gold wire sealing method of stainless‐steel/aluminum‐alloy joint for thermal isolation at liquid‐nitrogen temperatureShimoshikiryo, Fumikazu / Takakuwa, Yuji / Oyama, Naoki / Miyamoto, Nobuo et al. | 1993
- 2876
-
Erratum: ‘‘Angle‐resolved x‐ray photoelectron spectroscopy method for the thickness measurement of metal oxide/metal ultrathin films’’ [J. Vac. Sci. Technol. A 11, 2303 (1993)]Chen, Liangyu / Hoffman, Richard W. et al. | 1993
- 2877
-
CUMULATIVE AUTHOR INDEX| 1993
-
Preliminary Program of the 40th National Symposium of the American Vacuum Society Program and Exhibitors| 1993