Passivation of stainless steel by films resistant to ozonized water (Englisch)
- Neue Suche nach: Yoshida, M.
- Neue Suche nach: Seki, A.
- Neue Suche nach: Shirai, Y.
- Neue Suche nach: Ohmi, T.
- Neue Suche nach: Yoshida, M.
- Neue Suche nach: Seki, A.
- Neue Suche nach: Shirai, Y.
- Neue Suche nach: Ohmi, T.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
17
, 3
;
1059-1065
;
1999
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Passivation of stainless steel by films resistant to ozonized water
-
Beteiligte:
-
Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 17, 3 ; 1059-1065
-
Verlag:
- Neue Suche nach: American Vacuum Society
-
Erscheinungsdatum:01.05.1999
-
Format / Umfang:7 pages
-
ISSN:
-
DOI:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Elektronische Ressource
-
Sprache:Englisch
-
Schlagwörter:
-
Datenquelle:
Inhaltsverzeichnis – Band 17, Ausgabe 3
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 679
-
Breaking the bond at cryogenic temperatures using atomic hydrogen. Adsorbed trimethylgallium reactivityMawhinney, Douglas B. / Glass, John A. / Yates, John T. et al. | 1999
- 679
-
Articles - Breaking the Ga-CH3 bond at cryogenic temperatures using atomic hydrogen. Adsorbed trimethylgallium reactivityMawhinney, Douglas B. et al. | 1999
- 686
-
Articles - Effects of Ar dilution on the optical emission spectra of fluorocarbon ultrahigh-frequency plasmas: C4F8 vs CF4Nakano, Toshiki et al. | 1999
- 686
-
Effects of Ar dilution on the optical emission spectra of fluorocarbon ultrahigh-frequency plasmas: vsNakano, Toshiki / Samukawa, Seiji et al. | 1999
- 692
-
Articles - Electron beam dissociation of CO and CO2 on ZnS thin filmsDarici, Y. et al. | 1999
- 692
-
Electron beam dissociation of CO and on ZnS thin filmsDarici, Y. / Holloway, P. H. / Sebastian, J. / Trottier, T. / Jones, S. / Rodriquez, J. et al. | 1999
- 698
-
Evidence for germanium phosphide dots on Ge(001)Bottomley, D. J. / Iwami, M. / Uehara, Y. / Ushioda, S. et al. | 1999
- 698
-
Articles - Evidence for germanium phosphide dots on Ge(001)Bottomley, D.J. et al. | 1999
- 704
-
Articles - Controller design issues in the feedback control of radio frequency plasma processing reactorsRaul, Shahid et al. | 1999
- 704
-
Controller design issues in the feedback control of radio frequency plasma processing reactorsRauf, Shahid / Kushner, Mark J. et al. | 1999
- 713
-
Study of the dc saddle-field discharge: Application to methaneSagnes, E. / Szurmak, J. / Manage, D. / Zukotynski, S. et al. | 1999
- 713
-
Articles - Study of the dc saddle-field discharge: Application to methaneSagnes, E. et al. | 1999
- 721
-
Articles - Langmuir probe measurements in a low pressure inductively coupled plasma used for diamond depositionOkada, Katsuyuki et al. | 1999
- 721
-
Langmuir probe measurements in a low pressure inductively coupled plasma used for diamond depositionOkada, Katsuyuki / Komatsu, Shojiro / Matsumoto, Seiichiro et al. | 1999
- 726
-
Plasma-enhanced metal organic chemical vapor deposition of high purity copper thin films using plasma reactor with the H atom sourceJin, Hong Jie / Shiratani, Masaharu / Kawasaki, Takashi / Fukuzawa, Tsuyoshi / Kinoshita, Toshio / Watanabe, Yukio / Kawasaki, Hiroharu / Toyofuku, Masaharu et al. | 1999
- 726
-
Articles - Plasma-enhanced metal organic chemical vapor deposition of high purity copper thin films using plasma reactor with the H atom sourceJin, Hong Jie et al. | 1999
- 731
-
Articles - High rate deposition of diamond-like carbon films by sheet-like plasma chemical vapor depositionNonogaki, Ryozo et al. | 1999
- 731
-
High rate deposition of diamond-like carbon films by sheet-like plasma chemical vapor depositionNonogaki, Ryozo / Yamada, Suzuya / Araki, Tsutomu / Wada, Tetsuya et al. | 1999
- 735
-
Low-temperature plasma deposition of dielectric coatings from organosilicon precursorsLin, C.-T. / Li, F. / Mantei, T. D. et al. | 1999
- 735
-
Articles - Low-temperature plasma deposition of dielectric coatings from organosilicon precursorsLin, C.-T. et al. | 1999
- 741
-
Articles - Patterning of fluorine-, hydrogen-, and carbon-containing SiO2-like low dielectric constant materials in high-density fluorocarbon plasmas: Comparison with SiO2Standaert, T.E.F.M. et al. | 1999
- 741
-
Patterning of fluorine-, hydrogen-, and carbon-containing -like low dielectric constant materials in high-density fluorocarbon plasmas: Comparison withStandaert, T. E. F. M. / Matsuo, P. J. / Allen, S. D. / Oehrlein, G. S. / Dalton, T. J. et al. | 1999
- 749
-
Articles - Low damage reactive ion etching for photovoltaic applicationsSchaefer, Sebastian et al. | 1999
- 749
-
Low damage reactive ion etching for photovoltaic applicationsSchaefer, Sebastian / Lüdemann, Ralf et al. | 1999
- 755
-
Silicon etch rate enhancement by traces of metalSebel, P. G. M. / Hermans, L. J. F. / Beijerinck, H. C. W. et al. | 1999
- 755
-
Articles - Silicon etch rate enhancement by traces of metalSebel, P.G.M. et al. | 1999
- 763
-
Bias-assisted etching of polycrystalline diamond films in hydrogen, oxygen, and argon microwave plasmasZhang, W. J. / Sun, C. / Bello, I. / Lee, C. S. / Lee, S. T. et al. | 1999
- 763
-
Articles - Bias-assisted etching of polycrystalline diamond films in hydrogen, oxygen, and argon microwave plasmasZhang, W.J. et al. | 1999
- 768
-
Articles - Effect of additive noble gases in chlorine-based inductively coupled plasma etching of GaN, InN, and AINHahn, Y.B. et al. | 1999
- 768
-
Effect of additive noble gases in chlorine-based inductively coupled plasma etching of GaN, InN, and AlNHahn, Y. B. / Hays, D. C. / Donovan, S. M. / Abernathy, C. R. / Han, J. / Shul, R. J. / Cho, H. / Jung, K. B. / Pearton, S. J. et al. | 1999
- 774
-
Degree of dissociation and etching characteristics in high-density plasmasSamukawa, Seiji et al. | 1999
- 774
-
Articles - Degree of Cl2 dissociation and etching characteristics in high-density plasmasSamukawa, Seiji et al. | 1999
- 780
-
Articles - Characterization of high density CH4-H2-Ar plasmas for compound semiconductor etchingEddy Jr, C.R. et al. | 1999
- 780
-
Characterization of high density plasmas for compound semiconductor etchingEddy, C. R. / Leonhardt, D. / Douglass, S. R. / Shamamian, V. A. / Thoms, B. D. / Butler, J. E. et al. | 1999
- 793
-
Articles - Smoothing of polycrystalline Cu(In,Ga)(Se,S)2 thin films by low-energy ion-beam etchingFrost, F. et al. | 1999
- 793
-
Smoothing of polycrystalline thin films by low-energy ion-beam etchingFrost, F. / Lippold, G. / Otte, K. / Hirsch, D. / Schindler, A. / Bigl, F. et al. | 1999
- 799
-
Platinum etching in plasmas with a photoresist maskShibano, Teruo / Nakamura, Keisuke / Takenaga, Takashi / Ono, Kouichi et al. | 1999
- 799
-
Articles - Platinum etching in Ar-Cl2 plasmas with a photoresist maskShibano, Teruo et al. | 1999
- 805
-
Effect of nitric-phosphoric acid etches on material properties and back-contact formation of CdTe-based solar cellsLi, Xiaonan / Niles, David W. / Hasoon, Falah S. / Matson, Richard J. / Sheldon, Peter et al. | 1999
- 805
-
Articles - Effect of nitric-phosphoric acid etches on material properties and back-contact formation of CdTe-based solar cellsLi, Xiaonan et al. | 1999
- 810
-
Adsorption and thermal decomposition of on the (110) and (111) planes of NiAl: A temperature programmed deposition and x-ray photoelectron spectroscopy studyChaturvedi, Sanjay / Strongin, Daniel R. et al. | 1999
- 810
-
Articles - Adsorption and thermal decomposition of C2D5I on the (110) and (111) planes of NiAl: A temperature programmed deposition and x-ray photoelectron spectroscopy studyChaturvedi, Sanjay et al. | 1999
- 817
-
Articles - Ellipsometric investigation of nucleation sites for chemical vapor deposition of Si on SiO2 and Si3N4 surfacesBasa, C. et al. | 1999
- 817
-
Ellipsometric investigation of nucleation sites for chemical vapor deposition of Si on and surfacesBasa, C. / Irene, E. A. et al. | 1999
- 823
-
Articles - Preparation and operation of hydrogen cleaned GaAs(100) negative electron affinity photocathodesElamrawi, K.A. et al. | 1999
- 823
-
Preparation and operation of hydrogen cleaned GaAs(100) negative electron affinity photocathodesElamrawi, K. A. / Elsayed-Ali, H. E. et al. | 1999
- 832
-
Platinum complex/Zn-porphyrin macrosystem assemblies: Electronic structure and conformational investigation by x-ray photoelectron spectroscopyPolzonetti, G. / Ferri, A. / Russo, M. V. / Iucci, G. / Licoccia, S. / Paolesse, R. et al. | 1999
- 832
-
Articles - Platinum complex-Zn-porphyrin macrosystem assemblies: Electronic structure and conformational investigation by x-ray photoelectron spectroscopyPolzonetti, G. et al. | 1999
- 840
-
Articles - Measurement of electron energy distribution function in an argon-copper plasma for ionized physical vapor depositionLu, Z.C. et al. | 1999
- 840
-
Measurement of electron energy distribution function in an argon/copper plasma for ionized physical vapor depositionLu, Z. C. / Foster, J. E. / Snodgrass, T. G. / Booske, J. H. / Wendt, A. E. et al. | 1999
- 845
-
Development of a triplasmatron ion source for the generation of and primary ion beams on an ion microscope secondary ion mass spectrometry instrumentGillen, Greg / King, R. Lance / Chmara, Frank et al. | 1999
- 845
-
Articles - Development of a triplasmatron ion source for the generation of SF+-5 and F- primary ion beams on an ion microscope secondary ion mass spectrometry instrumentGillen, Greg et al. | 1999
- 853
-
In situ x-ray photoelectron spectroscopy studies of interactions of evaporated metals with Poly(-phenylene vinylene) and its ring-substituted derivativesAtreya, M. / Li, S. / Kang, E. T. / Neoh, K. G. / Ma, Z. H. / Tan, K. L. et al. | 1999
- 853
-
Articles - In situ x-ray photoelectron spectroscopy studies of interactions of evaporated metals with Poly(p-phenylene vinylene) and its ring-substituted derivativesAtreya, M. et al. | 1999
- 862
-
Articles - Spectrophotometric analysis of aluminum nitride thin filmsJoo, Han-Yong et al. | 1999
- 862
-
Spectrophotometric analysis of aluminum nitride thin filmsJoo, Han-Yong / Kim, Hyeong Joon / Kim, Sang June / Kim, Sang Youl et al. | 1999
- 871
-
Articles - In situ substrate temperature measurements during radio frequency sputtering of ZnO thin film using fiber Bragg gratingZayer, N.K. et al. | 1999
- 871
-
In situ substrate temperature measurements during radio frequency sputtering of ZnO thin film using fiber Bragg gratingZayer, N. K. / Henderson, P. J. / Grellier, A. J. C. / Pannell, C. N. et al. | 1999
- 877
-
Articles - Spectroellipsometric characterization of plasma-deposited Au-fluoropolymer nanocomposite filmsDalacu, Dan et al. | 1999
- 877
-
Spectroellipsometric characterization of plasma-deposited Au/fluoropolymer nanocomposite filmsDalacu, Dan / Martinu, Ludvik et al. | 1999
- 884
-
Articles - Friction-reducing mechanisms of molybdenum dithiocarbamate-zinc dithiophosphate combination: New insights in MoS2 genesisGrossiord, C. et al. | 1999
- 884
-
Friction-reducing mechanisms of molybdenum dithiocarbamate/zinc dithiophosphate combination: New insights in genesisGrossiord, C. / Martin, J.-M. / Le Mogne, Th. / Inoue, K. / Igarashi, J. et al. | 1999
- 891
-
Real-time monitoring of structure and stress evolution of boron films grown on Si(100) by ultrahigh vacuum chemical vapor depositionNesting, David C. / Kouvetakis, J. / Hearne, Sean / Chason, E. / Tsong, I. S. T. et al. | 1999
- 891
-
Articles - Real-time monitoring of structure and stress evolution of boron films grown on Si(100) by ultrahigh vacuum chemical vapor depositionNesting, David C. et al. | 1999
- 895
-
Articles - Quantitative analysis of sputtered a- and a+b-brass surfaces by using Auger electron spectroscopy with principal component analysis-target factor analysisHammer, G.E. et al. | 1999
- 895
-
Quantitative analysis of sputtered alpha - and alpha + beta -brass surfaces by using Auger electron spectroscopy with principal component analysis-target factor analysisHammer, G.E. et al. | 1999
- 895
-
Quantitative analysis of sputtered α- and α+β-brass surfaces by using Auger electron spectroscopy with principal component analysis-target factor analysisHammer, G. E. et al. | 1999
- 899
-
Articles - Influence of substrate bias voltage on the properties of CNx films prepared by reactive magnetron sputteringHajek, V. et al. | 1999
- 899
-
Influence of substrate bias voltage on the properties of films prepared by reactive magnetron sputteringHajek, V. / Rusnak, K. / Vlcek, J. / Martinu, L. / Gujrathi, S. C. et al. | 1999
- 909
-
Crystalline SiC thin films deposited at room temperature using pulsed laser ablation of graphite and magnetron sputtering of siliconNainaparampil, Josekutty J. / Zabinski, Jeffrey S. et al. | 1999
- 909
-
Articles - Crystalline SiC thin films deposited at room temperature using pulsed laser ablation of graphite and magnetron sputtering of siliconNainaparampil, Josekutty J. et al. | 1999
- 917
-
Articles - High-quality LaNiO3 thin-film electrode grown by pulsed laser depositionGuo, Xiangxin et al. | 1999
- 917
-
High-quality thin-film electrode grown by pulsed laser depositionGuo, Xiangxin / Li, Chunling / Zhou, Yueliang / Chen, Zhenghao et al. | 1999
- 921
-
Growth and structural properties of hydrogenated silicon films deposited by pulsed laser ablationTrusso, Sebastiano / Vasi, Cirino / Neri, Fortunato et al. | 1999
- 921
-
Articles - Growth and structural properties of hydrogenated silicon films deposited by pulsed laser ablationTrusso, Sebastiano et al. | 1999
- 926
-
Articles - Growth and structure of epitaxial CeO2 by oxygen-plasma-assisted molecular beam epitaxyKim, Y.J. et al. | 1999
- 926
-
Growth and structure of epitaxial by oxygen-plasma-assisted molecular beam epitaxyKim, Y. J. / Gao, Y. / Herman, G. S. / Thevuthasan, S. / Jiang, W. / McCready, D. E. / Chambers, S. A. et al. | 1999
- 936
-
Different effect of annealing temperature on resistivity for stoichiometric, W rich, and N rich tungsten nitride filmsLin, Jun / Tsukune, Atsuhiro / Suzuki, Toshiya / Yamada, Masao et al. | 1999
- 936
-
Articles - Different effect of annealing temperature on resistivity for stoichiometric, W rich, and N rich tungsten nitride filmsLin, Jun et al. | 1999
- 939
-
Mass spectroscopy of recoiled ions, secondary ion mass spectroscopy, and Auger electron spectroscopy investigation of -stabilized and (110)Herman, G. S. / Henderson, M. A. / Starkweather, K. A. / McDaniel, E. P. et al. | 1999
- 939
-
Articles - Mass spectroscopy of recoiled ions, secondary ion mass spectroscopy, and Auger electron spectroscopy investigation of Y2O3-stabilized ZrO2(100) and (110)Herman, G.S. et al. | 1999
- 945
-
Control of the structure and properties of aluminum oxide coatings deposited by pulsed magnetron sputteringKelly, P. J. / Arnell, R. D. et al. | 1999
- 945
-
Articles - Control of the structure and properties of aluminum oxide coatings deposited by pulsed magnetron sputteringKelly, P.J. et al. | 1999
- 954
-
Effects of vacuum and inert gas annealing of ultrathin tantalum pentoxide films on Si(100)Mao, A. Y. / Son, K. A. / White, J. M. / Kwong, D. L. / Roberts, D. A. / Vrtis, R. N. et al. | 1999
- 954
-
Articles - Effects of vacuum and inert gas annealing of ultrathin tantalum pentoxide films on Si(100)Mao, A.Y. et al. | 1999
- 961
-
Articles - Epitaxial growth and characterization of Ce1-xZrx O2 thin filmsGao, Y. et al. | 1999
- 961
-
Epitaxial growth and characterization of thin filmsGao, Y. / Herman, G. S. / Thevuthasan, S. / Peden, C. H. F. / Chambers, S. A. et al. | 1999
- 970
-
Modeling of silicon deposition process scale-up employing axisymmetric ring nozzle sources. IChen, G. / Boyd, I. D. et al. | 1999
- 970
-
Articles - Modeling of silicon deposition process scale-up employing axisymmetric ring nozzle sources. IChen, G. et al. | 1999
- 978
-
Three dimensional modeling of silicon deposition process scale-up employing supersonic jets. IIChen, G. / Boyd, I. D. / Engstrom, J. R. et al. | 1999
- 978
-
Articles - Three dimensional modeling of silicon deposition process scale-up employing supersonic jets. IIChen, G. et al. | 1999
- 986
-
Articles - Nanocrystalline WC and WC-a-C composite coatings produced from intersected plasma fluxes at low deposition temperaturesVoevodin, A.A. et al. | 1999
- 986
-
Nanocrystalline WC and composite coatings produced from intersected plasma fluxes at low deposition temperaturesVoevodin, A. A. / O’Neill, J. P. / Prasad, S. V. / Zabinski, J. S. et al. | 1999
- 993
-
Articles - Behavior of thin Ta-based films in the Cu-barrier-Si systemStavrev, Momtchil et al. | 1999
- 993
-
Behavior of thin Ta-based films in the Cu/barrier/Si systemStavrev, Momtchil / Fischer, Dirk / Praessler, Frank / Wenzel, Christian / Drescher, Kurt et al. | 1999
- 1002
-
Thermal outgassing of vacuum glazingLenzen, M. / Turner, G. M. / Collins, R. E. et al. | 1999
- 1002
-
Articles - Thermal outgassing of vacuum glazingLenzen, M. et al. | 1999
- 1018
-
Improvement of bonding strength between Au/Ti and films by Si layer insertionNagata, Hirotoshi / Shinriki, Takashi / Shima, Kaori / Tamai, Masumi / Min Haga, Eungi et al. | 1999
- 1018
-
Articles - Improvement of bonding strength between Au-Ti and SiO2 films by Si layer insertionNagata, Hirotoshi et al. | 1999
- 1024
-
Electronic structure and mechanical properties of resistant coatings: The chromium molybdenum nitride systemHones, P. / Sanjinés, R. / Lévy, F. / Shojaei, O. et al. | 1999
- 1024
-
Articles - Electronic structure and mechanical properties of resistant coatings: The chromium molybdenum nitride systemHones, P. et al. | 1999
- 1031
-
Hydrogen plasma pretreatment effect on the deposition of aluminum thin films from metalorganic chemical vapor deposition using dimethylethylamine alaneJang, Tae Woong / Rhee, Hwa Sung / Ahn, Byung Tae et al. | 1999
- 1031
-
Articles - Hydrogen plasma pretreatment effect on the deposition of aluminum thin films from metalorganic chemical vapor deposition using dimethylethylamine alaneJang, Tae Woong et al. | 1999
- 1036
-
Optical and mechanical consequences of microstructural alteration of alpha platinum dioxide filmsMaya, L. / Anovitz, L. M. / Thundat, T. / Yust, C. S. et al. | 1999
- 1036
-
Articles - Optical and mechanical consequences of microstructural alteration of alpha platinum dioxide filmsMaya, L. et al. | 1999
- 1040
-
Outgassing in thin wall stainless steel cellsNemanič, Vincenc / Šetina, Janez et al. | 1999
- 1040
-
Articles - Outgassing in thin wall stainless steel cellsNemanic, Vincenc et al. | 1999
- 1047
-
Metastable deexcitation spectroscopy study of oxygen adsorption on a polycrystalline titanium surfaceKurahashi, Mitsunori / Yamauchi, Yasushi et al. | 1999
- 1047
-
Articles - Metastable deexcitation spectroscopy study of oxygen adsorption on a polycrystalline titanium surfaceKurahashi, Mitsunori et al. | 1999
- 1053
-
Characterization of the Ti-doped diamond-like carbon coatings on a type 304 stainless steelHsieh, W. P. / Wang, D. Y. / Shieu, F. S. et al. | 1999
- 1053
-
Articles - Characterization of the Ti-doped diamond-like carbon coatings on a type 304 stainless steelHsieh, W.P. et al. | 1999
- 1059
-
Articles - Passivation of stainless steel by dAl2O3 films resistant to ozonized waterYoshida, M. et al. | 1999
- 1059
-
Passivation of stainless steel by films resistant to ozonized waterYoshida, M. / Seki, A. / Shirai, Y. / Ohmi, T. et al. | 1999
- 1066
-
Particle measurements in vacuum tools by in situ particle monitorMiyashita, Haruzo / Kikuchi, Toshio / Kawasaki, Yohsuke / Katakura, Yoshio / Ohsako, Nobuharu et al. | 1999
- 1066
-
Articles - Particle measurements in vacuum tools by in situ particle monitorMiyashita, Haruzo et al. | 1999
- 1071
-
Thermal relaxation of hot filamentsDurakiewicz, Tomasz / Halas, Stanislaw et al. | 1999
- 1071
-
Articles - Thermal relaxation of hot filamentsDurakiewicz, Tomasz et al. | 1999
- 1075
-
CUMULATIVE AUTHOR INDEX| 1999