Influence of process parameter variation on the reflectivity of sputter‐deposited W–C multilayer diffraction gratings (Englisch)
- Neue Suche nach: Sager, B.
- Neue Suche nach: Benson, P.
- Neue Suche nach: Jahoda, K.
- Neue Suche nach: Jacobs, J. R.
- Neue Suche nach: Bloch, J. J.
- Neue Suche nach: Sanders, W. T.
- Neue Suche nach: Lagally, M. G.
- Neue Suche nach: Sager, B.
- Neue Suche nach: Benson, P.
- Neue Suche nach: Jahoda, K.
- Neue Suche nach: Jacobs, J. R.
- Neue Suche nach: Bloch, J. J.
- Neue Suche nach: Sanders, W. T.
- Neue Suche nach: Lagally, M. G.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
4
, 3
;
641-644
;
1986
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Influence of process parameter variation on the reflectivity of sputter‐deposited W–C multilayer diffraction gratings
-
Weitere Titelangaben:Influence of process parameter variation
-
Beteiligte:Sager, B. ( Autor:in ) / Benson, P. ( Autor:in ) / Jahoda, K. ( Autor:in ) / Jacobs, J. R. ( Autor:in ) / Bloch, J. J. ( Autor:in ) / Sanders, W. T. ( Autor:in ) / Lagally, M. G. ( Autor:in )
-
Erschienen in:
-
Verlag:
- Neue Suche nach: American Vacuum Society
-
Erscheinungsdatum:01.05.1986
-
Format / Umfang:4 pages
-
ISSN:
-
DOI:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Elektronische Ressource
-
Sprache:Englisch
-
Schlagwörter:TUNGSTEN , CARBON , GRATINGS , FABRICATION , SPUTTERING , MAGNETRONS , ROUGHNESS , X RADIATION , REFLECTIVITY , X−RAY SPECTROSCOPY , (W,C)
-
Datenquelle:
Inhaltsverzeichnis – Band 4, Ausgabe 3
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 257
-
Electron stimulated desorption and its relation to molecular structure at surfacesMadey, Theodore E. et al. | 1986
- 263
-
Space technology todayCohen, Aaron et al. | 1986
- 268
-
Canadarm—a review of its flightsSachdev, S. S. et al. | 1986
- 273
-
Industrial materials processing experiments on board the Space Shuttle OrbiterDebe, M. K. et al. | 1986
- 281
-
Space Station technology experiments and usesBreckenridge, Roger A. / Russell, Richard A. et al. | 1986
- 286
-
Performance characteristics of displacement‐type vacuum pumpsHablanian, M. H. et al. | 1986
- 293
-
Temperature dependence of pumping speed for H2 of a cryosorption pump with a condensed gas layer sorbentArakawa, I. / Tuzi, Y. et al. | 1986
- 297
-
Dissociative pumping of the alkanes using nonevaporable gettersEmerson, L. C. / Knize, R. J. / Cecchi, J. L. / Auciello, O. et al. | 1986
- 300
-
Pumping of methane by St707 at low temperaturesHobson, J. P. / Chapman, R. et al. | 1986
- 303
-
Surface structure and composition profile of sputter‐ion pump cathode and anodeAudi, M. / Pierini, M. et al. | 1986
- 306
-
Central gas analysis laboratory with remote samplingEllefson, R. E. / Morgan, F. E. / Anderson, B. E. et al. | 1986
- 310
-
Automatic regeneration of multiple cryopumpsFinley, Laurence A. et al. | 1986
- 314
-
Downstream pressure control: Calculation of the transfer function and optimization of control parameters leading to a new controller designFischer, R. et al. | 1986
- 317
-
Tokamak Fusion Test Reactor gas injection control system design and operationThompson, M. E. / Dylla, H. F. / LaMarche, P. H. / Arnold, N. D. / Rauch, W. A. / Mueller, D. / Hawryluk, R. J. et al. | 1986
- 322
-
Advanced turnkey computer controlled thermal vacuum facilityCary, Ronald W. et al. | 1986
- 326
-
Summary Abstract: Computer applications in vacuum systemsLlewellyn, J. A. et al. | 1986
- 327
-
Standardization and temperature correction of calibrated leaksSolomon, G. M. et al. | 1986
- 334
-
Transfer leak studies and comparisons of primary leak standards at the National Bureau of Standards and Sandia National LaboratoriesHyland, Richard W. / Ehrlich, Charles D. / Tilford, Charles R. / Thornberg, Steve et al. | 1986
- 338
-
New concepts in molecular gas flowSanteler, Donald J. et al. | 1986
- 344
-
Prediction of flow rates through an orifice at pressures corresponding to the transition between molecular and isentropic flowDeMuth, S. F. / Watson, J. S. et al. | 1986
- 348
-
Exit loss in viscous tube flowSanteler, Donald J. et al. | 1986
- 353
-
Monte Carlo analysis for the appropriate gauge location for an American Vacuum Society standard high vacuum pump speed measurement domeBoeckmann, M. D. et al. | 1986
- 358
-
Long‐term evaluation of fluoroelastomer O‐rings in UF6Russell, R. G. / Otey, M. G. / Dippo, G. L. et al. | 1986
- 362
-
Summary Abstract: The National Bureau of Standards orifice‐flow primary high vacuum standardMcCulloh, K. E. / Tilford, C. R. / Wood, S. D. / Martin, D. F. et al. | 1986
- 363
-
Photochemical vapor deposition of silicon nitride filmsPadmanabhan, R. / Miller, B. J. et al. | 1986
- 369
-
Solventless polyimide films by vapor depositionSalem, J. R. / Sequeda, F. O. / Duran, J. / Lee, W. Y. / Yang, R. M. et al. | 1986
- 375
-
Deposition of pyrocarbon in a low temperature environmentInspektor, A. / Carmi, U. / Raveh, A. / Khait, Y. / Avni, R. et al. | 1986
- 379
-
Summary Abstract: The preparation of thin indium antimonide films by metal‐organic magnetron sputteringWebb, James B. / Halpin, C. / Noad, J. P. et al. | 1986
- 381
-
Reactive radio frequency sputter deposition of higher nitrides of titanium, zirconium, and hafniumYee, D. S. / Cuomo, J. J. / Frisch, M. A. / Smith, D. P. E. et al. | 1986
- 388
-
Design advances and applications of the rotatable cylindrical magnetronWright, Michael / Beardow, Terry et al. | 1986
- 393
-
Hollow‐cathode‐enhanced magnetron sputteringCuomo, J. J. / Rossnagel, S. M. et al. | 1986
- 397
-
Hot hollow cathode and its applications in vacuum coating: A concise reviewKuo, Y. S. / Bunshah, R. F. / Okrent, D. et al. | 1986
- 403
-
Highly conducting ZnSe films by reactive magnetron sputteringNouhi, A. / Stirn, R. J. et al. | 1986
- 408
-
Pressure effects in planar magnetron sputter depositionHelmer, J. C. / Wickersham, C. E. et al. | 1986
- 413
-
High rate sputtering deposition of nickel using dc magnetron modeChang, S. A. / Skolnik, M. B. / Altman, C. et al. | 1986
- 418
-
Structure‐related optical properties of thin filmsMacleod, H. Angus et al. | 1986
- 423
-
Optical properties of nonstoichiometric zinc oxide films deposited by bias sputteringBrett, M. J. / Parsons, R. R. et al. | 1986
- 428
-
Ion‐beam sputtered indium tin oxide for InP solar cellsAharoni, H. / Coutts, T. J. / Gessert, T. / Dhere, R. / Schilling, L. et al. | 1986
- 432
-
The influence of deposition temperature on the structure and optical properties of vanadium oxide filmsChain, E. E. et al. | 1986
- 436
-
Summary Abstract: Neutral ion beam deposition of high reflectance coatings for use in ring laser gyroscopesKalb, A. / Mildebrath, M. / Sanders, V. et al. | 1986
- 437
-
Summary Abstract: Ion‐assisted deposition of Ta2O5 and Al2O3 thin filmsMcNally, J. J. / Al‐Jumaily, G. A. / McNeil, J. R. et al. | 1986
- 439
-
Summary Abstract: Reduction of optical scatter in coated metal surfacesAl‐Jumaily, G. A. / Wilson, S. R. / McNally, J. J. / Jungling, K. C. / McNeil, J. R. et al. | 1986
- 440
-
Summary Abstract: Reactive ion etching of vanadium dioxide thin filmsBuhay, H. / Kogler, K. J. / Whitehead, B. L. / Tiberio, R. C. et al. | 1986
- 443
-
Control of thin film orientation by glancing angle ion bombardment during growthYu, Lock See / Harper, James M. E. / Cuomo, Jerome J. / Smith, David A. et al. | 1986
- 448
-
Ion assisted selective thin film depositionBerg, S. / Nender, C. / Gelin, B. / Östling, M. et al. | 1986
- 453
-
Unbalanced dc magnetrons as sources of high ion fluxesWindow, B. / Savvides, N. et al. | 1986
- 457
-
Significant improvement in step coverage using bias sputtered aluminumSkelly, David W. / Gruenke, Lothar A. et al. | 1986
- 461
-
Summary Abstract: Monte Carlo calculation for ion‐assisted thin film depositionMüller, Karl‐Heinz et al. | 1986
- 462
-
Summary Abstract: Non‐bulk‐like physical properties of thin films due to ion bombardment during film growthKay, Eric et al. | 1986
- 463
-
Summary Abstract: In situ characterization of nucleation, growth, and composition of ion‐assisted films by ellipsometry, reflectance–transmittance measurements, and ion‐scattering spectroscopyMartin, P. J. / Netterfield, R. P. / Sainty, W. G. / Pacey, C. G. et al. | 1986
- 465
-
Effect of plasma exposure on the performance of indium tin oxide/InP solar cells prepared by radio‐frequency and ion‐beam sputteringNaseem, S. / Coutts, T. J. / Aharoni, H. et al. | 1986
- 470
-
Deposition of a‐Si,Sn:H alloy films by reactive magnetron sputtering from separate Si and Sn targetsParsons, G. N. / Cook, J. W. / Lucovsky, G. / Lin, S. Y. / Mantini, M. J. et al. | 1986
- 475
-
Induction heated plasma assisted chemical vapor deposition of SiNMito, H. / Sekiguchi, A. et al. | 1986
- 480
-
Silicon nitride and silicon diimide grown by remote plasma enhanced chemical vapor depositionTsu, D. V. / Lucovsky, G. et al. | 1986
- 486
-
Summary Abstract: Amorphous tetrahedrally bonded materials for macroelectronicsMort, J. et al. | 1986
- 488
-
Summary Abstract: Indium tin oxide/Si and CdS/CuInSe2 solar cells: Characterization and modelingTavakolian, H. / Hollingsworth, R. E. et al. | 1986
- 490
-
Toward quantification of thin film morphologyMessier, Russell et al. | 1986
- 496
-
Predicting negative ion resputtering in thin filmsKester, Daniel J. / Messier, Russell et al. | 1986
- 500
-
Microstructure evolution in TiN films reactively sputter deposited on multiphase substratesHelmersson, U. / Sundgren, J.‐E. / Greene, J. E. et al. | 1986
- 504
-
Unbalanced magnetron ion‐assisted deposition and property modification of thin filmsSavvides, N. / Window, B. et al. | 1986
- 509
-
Ion beam sputter deposited zinc telluride filmsGulino, Daniel A. et al. | 1986
- 514
-
In situ ellipsometry studies of the growth of hydrogenated amorphous silicon by glow dischargeCollins, R. W. et al. | 1986
- 518
-
Loss of Ga in sputtered deposits made from a Pu‐4 at. % Ga alloyRizzo, H. F. / McClanahan, E. D. / Margolies, D. S. / Echeverria, A. W. et al. | 1986
- 524
-
Epitaxial growth of superconducting niobium thin films by ultrahigh vacuum evaporationWolf, S. A. / Qadri, S. B. / Claassen, J. H. / Francavilla, T. L. / Dalrymple, B. J. et al. | 1986
- 528
-
Room temperature deposition of superconducting NbN for superconductor–insulator–superconductor junctionsThakoor, S. / LeDuc, H. G. / Thakoor, A. P. / Lambe, J. / Khanna, S. K. et al. | 1986
- 532
-
The effect of alkali ion migration on the adhesion of sputtered chromium metallizations to glassBaird, R. J. / Haeberle, R. J. et al. | 1986
- 536
-
Confined oxygen glow discharge cleaning of siliconHoffman, D. M. / Thomas, J. H. et al. | 1986
- 539
-
A review of thin film media for magnetic recordingEltoukhy, A. H. et al. | 1986
- 543
-
Microstructures of thin sputtered amorphous Tb0.26Fe0.74 and polycrystalline Fe filmsNakahara, S. / Hong, M. / van Dover, R. B. / Gyorgy, E. M. / Bacon, D. D. et al. | 1986
- 547
-
Effects of process parameters on low frequency modulation on sputtered disks for longitudinal recordingHill, F. A. / Reineck, S. / Roell, K. et al. | 1986
- 550
-
In‐line sputtering parameters for magnetic recording filmsJohanson, Robert G. / Carruthers, William G. et al. | 1986
- 553
-
Reactively sputter‐deposited and coevaporated TeOx thin films for optical recordingLee, W‐Y. / Sequeda, F. / Salem, J. / Lim, G. / Davis, C. R. / Coufal, H. et al. | 1986
- 558
-
Summary Abstract: Magneto‐optic recording materialsKryder, Mark H. et al. | 1986
- 560
-
Thin film growth rate effects for primary ion beam deposited diamondlike carbon filmsNir, Dan / Mirtich, Michael et al. | 1986
- 564
-
Properties of Cr–N films produced by reactive sputteringShih, K. K. / Dove, D. B. / Crowe, J. R. et al. | 1986
- 568
-
Crystallization of zirconia films by thermal annealingRujkorakarn, R. / Sites, J. R. et al. | 1986
- 572
-
Internal stress in ion beam sputtered molybdenum filmsSun, Sey‐Shing et al. | 1986
- 577
-
Density of amorphous germanium films by spectroscopic ellipsometryBlanco, J. R. / McMarr, P. J. / Yehoda, J. E. / Vedam, K. / Messier, R. et al. | 1986
- 583
-
Evolution of the glow discharge, deposition rate, and film conductivity with target erosion using direct current reactive sputteringFortier, N. / Parsons, R. R. et al. | 1986
- 586
-
Incorporation of chlorine during chlorine reactive ion beam etching of aluminum–copper alloysWhetten, Timothy J. / Ruoff, Arthur L. et al. | 1986
- 590
-
Dry etching of β‐SiC in CF4 and CF4+O2 mixturesPalmour, J. W. / Davis, R. F. / Wallett, T. M. / Bhasin, K. B. et al. | 1986
- 594
-
The use of nitrogen flow as a deposition rate control in reactive sputteringBerg, S. / Larsson, T. / Blom, H‐O. et al. | 1986
- 598
-
Mass spectrometric studies of the electrical breakdown of thin polymer filmsKendall, B. R. F. / Rohrer, V. S. / Bojan, V. J. et al. | 1986
- 602
-
A high performance molecular beam epitaxy system equipped with the automatic substrate transport mechanismUeda, S. / Kamohara, H. / Ishikawa, Y. / Tamura, N. / Katoo, S. / Shiraki, Y. et al. | 1986
- 606
-
Summary Abstract: IrO2 radio frequency sputtered thin film propertiesKreider, Kenneth et al. | 1986
- 607
-
Summary Abstract: Optical properties of sputtered Co3O4 filmsCook, J. G. / van der Meer, M. P. / Hogg, D. et al. | 1986
- 608
-
Summary Abstract: Broad‐beam electron sourceKaufman, Harold R. / Robinson, Raymond S. et al. | 1986
- 610
-
Thin film transducers and sensorsAnderson, J. C. et al. | 1986
- 617
-
The role of thin films in integrated solid‐state sensorsWise, K. D. et al. | 1986
- 623
-
Influence of preadsorbed oxygen on the sign and magnitude of the chemisorption‐induced resistance change for H2 adsorption onto Fe filmsShanabarger, M. R. et al. | 1986
- 626
-
Summary Abstract: Experimental studies of the correlations between gas sensor response and surface chemistrySemancik, S. / Cox, D. F. et al. | 1986
- 627
-
Summary Abstract: Structural and electronic properties of clean and water‐dosed SnO2(110)Cox, David F. / Semancik, Steve / Szuromi, Phillip D. et al. | 1986
- 629
-
Summary Abstract: A hydrogen plasma diagnostic based on Pd metal–oxide–semiconductor diodesBastasz, R. / Hughes, R. C. et al. | 1986
- 631
-
Propagation of explosive crystallization in thin Rh–Si multilayer filmsFloro, J. A. et al. | 1986
- 637
-
TiC as a diffusion barrier between Al and CoSi2Appelbaum, A. / Murarka, S. P. et al. | 1986
- 641
-
Influence of process parameter variation on the reflectivity of sputter‐deposited W–C multilayer diffraction gratingsSager, B. / Benson, P. / Jahoda, K. / Jacobs, J. R. / Bloch, J. J. / Sanders, W. T. / Lagally, M. G. et al. | 1986
- 645
-
Stress measurements on multilevel thin film dielectric layers used in Si integrated circuitsChen, Y. S. / Fatemi, Homi et al. | 1986
- 650
-
Summary Abstract: Structure of interfaces in compositionally modulated amorphous semiconductor superlatticesAbeles, B. / Deckman, H. D. / Persans, P. D. / Roxlo, C. / Tiedje, T. / Yang, L. et al. | 1986
- 653
-
Laser ablation of polymersYeh, J. T. C. et al. | 1986
- 659
-
Direct‐laser writing of silicon microstructures: Raman microprobe diagnostics and modeling of the nucleation phase of depositionHerman, Irving P. / Magnotta, Frank / Kotecki, David E. et al. | 1986
- 665
-
Summary Abstract: Heat and light in laser–materials interactionsHoule, F. A. et al. | 1986
- 666
-
Summary Abstract: The role of surface electronic properties in selective photochemical dry etchingAshby, C. I. H. et al. | 1986
- 668
-
Summary Abstract: Photostimulated reactions in Al2(CH3)6: Gas phase and adsorbed layer photolysisLubben, D. / Motooka, T. / Gorbatkin, S. / Greene, J. E. et al. | 1986
- 669
-
Summary Abstract: Photodecomposition of Mo(CO)6 adsorbed on Si(100)Creighton, J. R. et al. | 1986
- 670
-
Summary Abstract: Deposition of polycrystalline and amorphous silicon by infrared laser irradiation of silaneTonneau, D. / Auvert, G. / Pauleau, Y. et al. | 1986
- 673
-
Plasma‐assisted low temperature epitaxyPande, K. P. / Aina, O. et al. | 1986
- 677
-
Damage and contamination‐free GaAs and AlGaAs etching using a novel ultrahigh‐vacuum reactive ion beam etching system with etched surface monitoring and cleaning methodAsakawa, K. / Sugata, S. et al. | 1986
- 681
-
Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor depositionLucovsky, G. / Richard, P. D. / Tsu, D. V. / Lin, S. Y. / Markunas, R. J. et al. | 1986
- 689
-
Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor depositionPai, P. G. / Chao, S. S. / Takagi, Y. / Lucovsky, G. et al. | 1986
- 695
-
Summary Abstract: The relationship between the ion‐enhanced etching of InP by Cl2 and thermodynamic predictionMcNevin, S. C. et al. | 1986
- 696
-
Summary Abstract: Ion‐enhanced etching of Si and SiO2 by Cl2Gillis, H. P. / Gignac, W. J. et al. | 1986
- 698
-
Summary Abstract: Polyimide etching and passivation downstream of an O2–CF4–Ar microwave plasmaVukanovic, V. / Takacs, G. A. / Matuszak, E. A. / Egitto, F. D. / Emmi, F. / Horwath, R. S. et al. | 1986
- 700
-
Ultraviolet assisted growth of II–VI compoundsMullin, J. B. / Irvine, S. J. C. et al. | 1986
- 706
-
Photostimulated molecular layer epitaxyNishizawa, Jun‐ichi / Abe, Hitoshi / Kurabayashi, Toru / Sakurai, Naoki et al. | 1986
- 711
-
Ultraviolet induced metal‐organic chemical vapor deposition growth of GaAsBalk, P. / Heinecke, H. / Pütz, N. / Plass, C. / Lüth, H. et al. | 1986
- 716
-
Excimer laser induced deposition of InPDonnelly, V. M. / Brasen, D. / Appelbaum, A. / Geva, M. et al. | 1986
- 722
-
Low temperature epitaxy by ionized‐cluster beamYamada, I. / Takaoka, H. / Usui, H. / Takagi, T. et al. | 1986
- 728
-
Summary Abstract: Infrared laser‐assisted organometallic chemical vapor deposition growthJuang, C. / Dubey, S. K. / Wiseman, T. M. / Jones, K. A. et al. | 1986
- 729
-
Frequency effects in plasma etchingFlamm, Daniel L. et al. | 1986
- 739
-
Dry etching of TiSi2Cadien, K. C. / Sivaram, S. / Reintsema, C. D. et al. | 1986
- 744
-
Silicon dioxide reactive ion etching dependence on sheath voltageFortuño, Guadalupe et al. | 1986
- 748
-
Summary Abstract: The reaction of atomic and molecular chlorine with aluminumDanner, D. A. / Hess, D. W. et al. | 1986
- 749
-
Summary Abstract: Surface changes induced in Al/Cu/Si and photoresist films by reactive ion etchingFridmann, S. A. / Holland, S. P. et al. | 1986
- 750
-
Summary Abstract: Reactive ion‐etching‐related Si surface residues and subsurface disorderOehrlein, G. S. / Clabes, J. G. / Coyle, G. J. / Tsang, J. C. / Lee, Y. H. et al. | 1986
- 752
-
Summary Abstract: Removal of reactive sputter etching induced damage in siliconBlom, H‐O. / Norström, H. / Östling, M. / Wiklund, P. / Buchta, R. / Petersson, C. S. et al. | 1986
- 754
-
Deposition of indium on Sb(111) single crystal: A low energy electron diffraction, Auger, and x‐ray photoelectron spectroscopy interface investigationDelrue, J. P. / Sporken, R. / Caudano, R. et al. | 1986
- 758
-
Summary Abstract: X‐ray photoelectron and Auger electron forward scattering: A structural probe for studying ultrathin epitaxial films and interfacesEgelhoff, W. F. et al. | 1986
- 759
-
Summary Abstract: Characterization of multilayer Cu films on Ru(0001)Houston, J. E. / Peden, C. H. F. et al. | 1986
- 760
-
Summary Abstract: Electronic structure of palladium films on tungsten surfacesGraham, G. W. et al. | 1986
- 761
-
Summary Abstract: Computer simulation of the surface segregation in binary alloys using the embedded atom methodFoiles, S. M. et al. | 1986
- 762
-
Summary Abstract: Ultrahigh vacuum–scanning electron microscope studies of epitaxial crystal growthVenables, J. A. et al. | 1986
- 764
-
Broad‐beam ion sources: Present status and future directionsKaufman, Harold R. et al. | 1986
- 772
-
Flashover lithium ion source development for large pulsed power acceleratorsBieg, K. W. / Burns, E. J. T. / Gerber, R. A. / Olsen, J. N. / Lamppa, K. P. et al. | 1986
- 777
-
Prospects for printing very large scale integrated circuits with masked ion beam lithographyRandall, J. N. et al. | 1986
- 784
-
A new machine for metal surface treatment by dynamic mixing using a high current ion sourceSato, T. / Ohata, K. / Asahi, N. / Ono, Y. / Oka, Y. / Hashimoto, I. et al. | 1986
- 788
-
Bucket‐type ion source for ion millingOno, Y. / Kurosawa, T. / Sato, T. / Oka, Y. / Hashimoto, I. et al. | 1986
- 791
-
Summary Abstract: Large area ion source for fusionLeung, K. N. et al. | 1986
- 792
-
Summary Abstract: Li emission from a warm surface in a Li–Ar plasmaStearns, J. W. / Pyle, R. V. / Tehranian, F. et al. | 1986
- 794
-
Characterization of the interface between Al–1% Si and rapidly annealed Mo–polycideHo, V. Q. / Beerkens, R. P. / Calder, I. D. et al. | 1986
- 799
-
Overlayer‐induced enhanced oxidation of GaAs surfacesChang, S. / Rizzi, A. / Caprile, C. / Philip, P. / Wall, A. / Franciosi, A. et al. | 1986
- 806
-
The influence of gallium ingot cleaning procedures on the carbon impurity level in molecular beam epitaxy GaAsChambers, F. A. / Chumbley, P. E. / Meese, J. M. / Vojak, B. A. / Zajac, G. W. / Fleisch, T. H. et al. | 1986
- 808
-
Chemical reaction and anion trapping at the Yb/GaAs(110) interfaceNogami, J. / Williams, M. D. / Kendelewicz, T. / Lindau, I. / Spicer, W. E. et al. | 1986
- 814
-
Contact resistivity and secondary ion mass spectroscopy–Auger analysis of Au/Cr contacts on p‐GaAsCastanedo, R. / Asomoza, R. / Jiménez, G. / Romero, S. / Peña, J. L. et al. | 1986
- 818
-
New ternary semiconductors for infrared applications: Hg1−x MnxTeWall, A. / Caprile, C. / Franciosi, A. / Reifenberger, R. / Debska, U. et al. | 1986
- 823
-
Ionic and neutral decomposition of gaseous bromochloromethanesDriscoll, D. C. / Bishop, J. A. / Sturm, B. J. / Dowben, P. A. / Olsen, C. G. et al. | 1986
- 828
-
Microwave electron cyclotron resonance plasma for chemical vapor deposition and etchingKeqiang, Chen / Erli, Zhang / Jinfa, Wu / Hansheng, Zhen / Zuoyao, Guan / Bangwei, Zhou et al. | 1986
- 832
-
Process integration issues for a 0.25 μm n‐channel metal‐oxide‐semiconductor technologyMele, T. C. / Scarpulla, J. / Nulman, J. / Krusius, J. P. et al. | 1986
- 838
-
Thermal dry process solderingMoskowitz, P. A. / Yeh, H. L. / Ray, S. K. et al. | 1986
- 841
-
Effect of the sintering process on the formation and passivation of PtSiChang, Chin‐An / Segmüller, A. / Huang, H.‐C. W. / Turene, F. E. / Cunningham, B. / Totta, P. A. et al. | 1986
- 845
-
Summary Abstract: Synergistic effects in ion bombardment modification of silicon Schottky contactsGiewont, K. / Ringel, S. A. / Ashok, S. et al. | 1986
- 846
-
Summary Abstract: Photoemission study of the annealed Au/Si interfaceCao, Renyu / Yeh, Jyh‐Jye / Nogami, Jun / Lindau, Ingolf et al. | 1986
- 848
-
Summary Abstract: InSb p–n junction current leakage analysisManiv, S. / Shamay, M. / Sinai, Y. et al. | 1986
- 849
-
Summary Abstract: Growth and properties of ion‐beam sputtered HgCdTe filmsKrishnaswamy, S. V. / Takei, W. J. / Francombe, M. H. et al. | 1986
- 850
-
Summary Abstract: Deposition of thin Al and Au overlayers onto sputtered (HgCd)Te surfacesDavis, G. D. / Beck, W. A. / Colavita, E. / Kelly, M. K. / Niles, D. W. / Tache, N. / Margaritondo, G. et al. | 1986
- 852
-
Summary Abstract: Chemically assisted sputter‐etching of permalloy using CO or Cl2Vasile, M. J. / Mogab, C. J. et al. | 1986
- 853
-
Summary Abstract: 18O isotopic tracer studies of oxygen transport through SiO2 films during ‘‘dry’’ oxidation at 1000 °CHan, C. J. / Helms, C. R. et al. | 1986
- 855
-
Schottky barrier heights of epitaxial Ni–silicides on Si(111)Liehr, M. / Schmid, P. E. / LeGoues, F. K. / Ho, P. S. et al. | 1986
- 860
-
Schottky barrier height measurements of type‐A and type‐B NiSi2 epilayers on SiHauenstein, R. J. / Schlesinger, T. E. / McGill, T. C. / Hunt, B. D. / Schowalter, L. J. et al. | 1986
- 865
-
Low temperature material reaction at the Ti/Si(111) interfaceTromp, R. M. / Rubloff, G. W. / van Loenen, E. J. et al. | 1986
- 869
-
Unified model of ideal metal–semiconductor contacts and semiconductor heterojunctionsMailhiot, C. / Duke, C. B. et al. | 1986
- 874
-
Metal‐derived band gap states: Ti on GaAs(110)Ludeke, R. / Straub, D. / Himpsel, F. J. / Landgren, G. et al. | 1986
- 879
-
V/Ge(111): Temperature dependent intermixing studied with high resolution photoemission and quantitative modelingdel Giudice, M. / Butera, R. A. / Ruckman, M. W. / Joyce, J. J. / Weaver, J. H. et al. | 1986
- 882
-
Summary Abstract: Aluminum deposition on low‐temperature GaAsKelly, M. K. / Tache, Nacira / Margaritondo, G. / Kahn, A. et al. | 1986
- 884
-
Kinetic processes in molecular beam epitaxy of GaAs(100) and AlAs(100) examined via static and dynamic behavior of reflection high‐energy electron‐diffraction intensitiesLee, T. C. / Yen, M. Y. / Chen, P. / Madhukar, A. et al. | 1986
- 889
-
Growth, nucleation, and electrical properties of molecular beam epitaxially grown, As‐doped Ge on Si substratesSheldon, P. / Yacobi, B. G. / Asher, S. E. / Jones, K. M. / Hafich, M. J. / Robinson, G. Y. et al. | 1986
- 894
-
Growth and surface structure of Ge–Si alloy films on Si(111)‐(7×7)Seo, J. M. / Doering, D. L. / Black, D. S. / Rowe, J. E. et al. | 1986
- 897
-
Growth and characterization of epitaxial SrF2 on InP(100)Sinharoy, S. / Hoffman, R. A. / Rieger, J. H. / Warner, J. D. / Bhasin, K. B. et al. | 1986
- 900
-
Summary Abstract: Thermal and accelerated (≤200 eV) In doping of Si(100) layers during molecular beam epitaxyRockett, A. / Knall, J. / Hassan, M. A. / Sundgren, J.‐E. / Barnett, S. A. / Greene, J. E. et al. | 1986
- 901
-
Summary Abstract: MeV ion channeling study of CaF2/Si(111) epitaxyHashimoto, Shin / Gibson, W. M. / Schowalter, L. J. / Fathauer, R. W. et al. | 1986
- 903
-
Summary Abstract: Low temperature reactive deposition of dielectricsGignac, W. J. / Gillis, H. P. / Schwartz, R.N. et al. | 1986
- 905
-
Process modeling for submicron complementary metal‐oxide‐semiconductor very large scale integrated circuitsKrusius, J. P. et al. | 1986
- 912
-
Process modeling and simulation toolsNeureuther, A. R. et al. | 1986
- 916
-
Models for the oxidation of siliconLewis, E. A. / Irene, E. A. et al. | 1986
- 926
-
Modeling of dopant diffusion during rapid thermal annealingFair, Richard B. et al. | 1986
- 933
-
Application of focused ion beam technology to maskless ion implantation in a molecular beam epitaxy grown GaAs or AlGaAs epitaxial layer for three‐dimensional pattern doping crystal growthMiyauchi, Eizo / Hashimoto, Hisao et al. | 1986
- 939
-
The atomic structure of the NiSi2–Si(111) interfacevan Loenen, E. J. et al. | 1986
- 944
-
Atomic structure of polar (111) surfaces of GaAs and ZnSeChadi, D. J. et al. | 1986
- 947
-
Atomic and electronic structure of the (311) surfaces of GaAsDuke, C. B. / Mailhiot, C. / Paton, A. / Kahn, A. / Stiles, K. et al. | 1986
- 953
-
High resolution electron energy loss study of AlxGa1−xAs mixed crystalsThiry, P. A. / Liehr, M. / Pireaux, J. J. / Caudano, R. / Kuech, T. et al. | 1986
- 958
-
Electron energy loss spectroscopy and work function measurements on Sb/GaAs(110): Example of an unpinned interface?Li, K. / Kahn, A. et al. | 1986
- 962
-
Understanding and controlling heterojunction band discontinuitiesNiles, D. W. / Colavita, E. / Margaritondo, G. / Perfetti, P. / Quaresima, C. / Capozi, M. et al. | 1986
- 965
-
Metal–anion bond strength and room temperature diffusion at metal/GaAs interfaces: Transition versus rare‐earth versus Au metal overlayersGrioni, M. / Joyce, J. J. / Weaver, J. H. et al. | 1986
- 969
-
Kinetic study of Schottky barrier formation of In on GaAs(110) surfaceChin, K. K. / Kendelewicz, T. / McCants, C. / Cao, R. / Miyano, K. / Lindau, I. / Spicer, W. E. et al. | 1986
- 973
-
Dependence of the electrical properties of Zn contacts to GaAs on the structural properties of the Zn–GaAs interfaceKulkarni, A. K. et al. | 1986
- 977
-
Study of interface formation on PbTeLai, B. / Wells, G. M. / Cerrina, F. / Anderson, J. R. / Papagno, L. / Lapeyre, G. J. et al. | 1986
- 984
-
An x‐ray photoelectron spectroscopy study on ozone treated GaAs surfacesIngrey, S. / Lau, W. M. / McIntyre, N. S. et al. | 1986
- 989
-
Reactively sputtered AlN films for GaAs annealing capsEste, G. / Surridge, R. / Westwood, W. D. et al. | 1986
- 993
-
Titanium–silicon and silicon dioxide reactions controlled by low temperature rapid thermal annealingBrillson, L. J. / Slade, M. L. / Richter, H. W. / VanderPlas, H. / Fulks, R. T. et al. | 1986
- 998
-
Summary Abstract: Initial stages of interface formation in group IV–IV heterostructures: Sn on Ge(100)c2×4 and Ge(111)c2×8Gossmann, H.‐J. / Feldman, L. C. et al. | 1986
- 999
-
Summary Abstract: p‐type doping of Si molecular beam epitaxy layers using a Ga liquid metal ion sourceChrenko, R. M. / Schowalter, L. J. / Turner, L. G. / DeBlois, R. W. et al. | 1986
- 1000
-
Summary Abstract: Chemical synthesis of ideal electronic surfaces on silicon and germaniumYablonovitch, E. / Gmitter, T. et al. | 1986
- 1002
-
A review of recent developments in thin gate dielectrics for very large scale integrationBaglee, David A. et al. | 1986
- 1005
-
Ultrathin gate dielectrics on 150 mm Si wafers via rapid thermal processingNulman, J. / Krusius, J. P. / Shah, N. / Gat, A. / Baldwin, A. et al. | 1986
- 1009
-
Nature of defects in P‐ and B‐doped SiO2Offenberg, M. / Maier, M. / Meyer, R. / Balk, P. et al. | 1986
- 1013
-
Diamondlike carbon films on semiconductors for insulated‐gate technologyKapoor, Vik J. / Mirtich, Michael J. / Banks, Bruce A. et al. | 1986
- 1018
-
The anodized Al–InP interfaceHwang, T. / Chang, R. R. / Geib, K. M. / Wilmsen, C. W. et al. | 1986
- 1022
-
Summary Abstract: Interfacial properties of ‘‘diamondlike’’ amorphous carbon films on InP: Metal–insulator–semiconductor structuresOh, Jae E. / Lamb, Joel D. / Snyder, Paul G. / Woollam, John A. et al. | 1986
- 1023
-
Summary Abstract: Recent advances in silicon‐on‐insulator technologiesLam, Hon Wai et al. | 1986
- 1024
-
Summary Abstract: High temperature decomposition of SiO2 at the Si/SiO2 interfaceRubloff, G. W. / Tromp, R. M. / van Loenen, E. J. / Balk, P. / LeGoues, F. K. et al. | 1986
- 1026
-
Molecular beam epitaxy growth and applications of epitaxial fluoride filmsSchowalter, L. J. / Fathauer, R. W. et al. | 1986
- 1033
-
Summary Abstract: III–V molecular beam epitaxy: Toward a concept of all ultrahigh vacuum processingHarbison, James P. et al. | 1986
- 1035
-
Interaction of metals with model polymer surfaces: Core level photoemission studiesSanda, P. N. / Bartha, J. W. / Clabes, J. G. / Jordan, J. L. / Feger, C. / Silverman, B. D. / Ho, P. S. et al. | 1986
- 1039
-
Metal polyimide interface: A titanium reaction mechanismOhuchi, F. S. / Freilich, S. C. et al. | 1986
- 1046
-
Synchrotron‐radiation excited carbon 1s photoemission study of Cr/organic polymer interfacesJordan, J. L. / Sanda, P. N. / Morar, J. F. / Kovac, C. A. / Himpsel, F. J. / Pollak, R. A. et al. | 1986
- 1049
-
Summary Abstract: Structure, bonding reactivity, and synthesis of thin polymer filmsClark, D. T. et al. | 1986
- 1050
-
Summary Abstract: Electron vibrational spectroscopy of polymer–vacuum and polymer–metal interfacesDiNardo, N. J. / Demuth, J. E. / Clark, T. C. et al. | 1986
- 1075
-
The influence of impurity and particle control on Tandem Mirror Experiment Upgrade plasma operationAllen, S. L. / Yu, T. L. / Foote, J. H. / Pickles, W. L. et al. | 1986
- 1079
-
Gas injection system in the Tara central cellBrau, K. / Goodrich, P. / Post, R. S. / Sevillano, E. et al. | 1986
- 1084
-
Neutral beam injection induced gas influx and desorption in the Doublet III vesselKim, Jinchoon / Colleraine, A. P. / Stewart, L. D. et al. | 1986
- 1087
-
Summary Abstract: Preliminary measurements of beam energy spectrum and impurity content for the Tokamak Fusion Test Reactor neutral beam injectorsLangley, R. A. / Botnick, E. M. / Magee, C. W. / Corso, V. L. / Kugel, H. W. / Manos, D. M. et al. | 1986
- 1088
-
Ion cyclotron resonance heating in the divertor tokamak ASDEXSteinmetz, K. / Wesner, F. / Niedermeyer, H. / Becker, G. / Braun, F. / Eberhagen, A. / Fussmann, G. / Gehre, O. / Gernhardt, J. / v. Gierke, G. et al. | 1986
- 1095
-
Summary Abstract: Lower hybrid heating, current drive, and technologyPorkolab, Miklos et al. | 1986
- 1096
-
Summary Abstract: Electron cyclotron‐resonance heating in tandem mirrorsStallard, B. W. et al. | 1986
- 1098
-
An historic overview of inertial confinement fusion: What have we learned?Glass, Alexander J. et al. | 1986
- 1106
-
Hydrogen pellet acceleration with a two‐stage system consisting of a gas gun and a fuseless electromagnetic railgunHonig, J. / Kim, K. / Wedge, S. W. et al. | 1986
- 1113
-
Operation of a repeating pneumatic hydrogen pellet injector on the Tokamak Fusion Test ReactorCombs, S. K. / Milora, S. L. / Foust, C. R. / Schmidt, G. L. / McBride, T. P. et al. | 1986
- 1118
-
Nuclear spin polarization of solid deuterium–tritiumSouers, P. C. / Fearon, E. M. / Mapoles, E. R. / Gaines, J. R. / Sater, J. D. / Fedders, P. A. et al. | 1986
- 1124
-
Summary Abstract: The use of poly(vinyl alcohol) shells as fuel containers for inertial fusion experimentsAnkney, Janet S. / Mruzek, Michael T. / Felmlee, William J. et al. | 1986
- 1125
-
Summary Abstract: Observations of mass transport phenomena in multicomponent liquid mixturesMruzek, M. T. / Musinski, D. L. / Jacobs, R. B. et al. | 1986
- 1128
-
Microcellular foams via phase separationYoung, Ainslie T. et al. | 1986
- 1134
-
Development of a coating technique for inertial confinement fusion plastic targetsKubo, Uichi / Tsubakihara, Hiroshi et al. | 1986
- 1138
-
A hollow droplet generator for polymer shell productionCrawley, R. et al. | 1986
- 1142
-
Fabrication of thin cylindrical targets for x‐ray laser experimentsKim, H. / Noyes, S. / Richardson, M. C. / Yaakobi, B. et al. | 1986
- 1145
-
Ablation layer coating of mechanically nonsupported inertial fusion targetsGram, R. Q. / Kim, H. / Mason, J. F. / Wittman, M. et al. | 1986
- 1150
-
Tritium gettering from air with hydrogen uranyl phosphateSouers, P. C. / Uribe, F. S. / Stevens, C. G. / Tsugawa, R. T. et al. | 1986
- 1155
-
Deuterium permeation properties of beta‐irradiated and unirradiated poly(vinyl alcohol) and polystyrene shellsScott, L. A. / Schneggenburger, R. G. / Anderson, P. R. et al. | 1986
- 1160
-
Summary Abstract: Details of the response of a Kodak high resolution plate to x irradiation for the characterization of inertial confinement fusion targets and componentsMartin, A. J. / Simms, R. J. et al. | 1986
- 1163
-
Physics and chemistry of berylliumStonehouse, A. James et al. | 1986
- 1171
-
The behavior of graphite under neutron irradiationKelly, B. T. et al. | 1986
- 1179
-
The effect of bulk hydrogen inventory on the chemical erosion of graphiteHaasz, A. A. / Auciello, O. / Stangeby, P. C. et al. | 1986
- 1183
-
Chemisorption of tritium on graphites at elevated temperaturesStrehlow, R. A. et al. | 1986
- 1186
-
Retention and thermal release of oxygen implanted in graphiteWampler, W. R. / Brice, D. K. et al. | 1986
- 1189
-
The retention of deuterium and tritium in POCO AXF‐5Q graphiteCausey, R. A. / Baskes, M. I. / Wilson, K. L. et al. | 1986
- 1193
-
Surface analysis of 1984/85 Tokamak Fusion Test Reactor limiter tilesPontau, A. E. / Wampler, W. R. / Mills, B. E. / Doyle, B. L. / Wright, A. F. / Ulrickson, M. A. / LaMarche, P. H. / Dylla, H. F. / Fukuda, S. et al. | 1986
- 1198
-
Hydrogen isotope exchange and conditioning in graphite limiters used in the Tokamak Fusion Test ReactorLaMarche, P. H. / Dylla, H. F. / McCarthy, P. J. / Ulrickson, M. et al. | 1986
- 1203
-
Migration of beryllium in the Impurity Study Experiment‐B tokamak during the Beryllium Limiter ExperimentLangley, R. A. / Zuhr, R. A. / Lewis, M. B. et al. | 1986
- 1207
-
Infrared thermography of first wall components on the Tandem Mirror Experiment UpgradeWatkins, J. G. / Dykhuizen, R. C. / Hsu, W. L. / Hill, D. N. / Allen, S. L. et al. | 1986
- 1210
-
Weight change measurements of erosion/deposition at beryllium limiter tiles in the Impurity Study Experiment‐BRoberto, J. B. / Edmonds, P. H. / England, A. C. / Gabbard, A. / Zuhr, R. A. et al. | 1986
- 1213
-
Summary Abstract: Postmortem near surface analysis of beryllium limiter tiles from the Impurity Study Experiment‐BZuhr, R. A. et al. | 1986
- 1213
-
Summary Abstract: Cleanup and gettering during the Beryllium Limiter Experiment in the Impurity Study Experiment‐BClausing, R. E. / Heatherly, L. / von Seggern, J. / Tschersich, K. G. / Isler, R. C. / Mioduszewski, P. K. / Simpkins, J. E. / Zuhr, R. A. et al. | 1986
- 1216
-
Summary Abstract: Tritium solubility in high purity berylliumSwansiger, W. A. et al. | 1986
- 1218
-
Angular distributions of sputtered particlesBaxter, J. P. / Schick, G. A. / Singh, J. / Kobrin, P. H. / Winograd, N. et al. | 1986
- 1222
-
Charge exchange in gas–surface collisions: Momentum transferOlson, John A. / Garrison, Barbara J. et al. | 1986
- 1227
-
Composite materials for high heat and particle flux components in fusion devicesKrauss, A. R. / Gruen, D. M. / Brooks, J. N. / DeWald, A. B. et al. | 1986
- 1232
-
Comparison of glow discharge cleaning and ion‐impact desorption of stainless steelRuzic, D. N. / Gerdin, G. A. / Loxton, C. M. et al. | 1986
- 1236
-
Carbon monoxide production in low energy oxygen ion bombardment of pyrolytic graphite and Kapton surfacesHorton, C. C. / Eck, T. G. / Hoffman, R. W. et al. | 1986
- 1240
-
Dissociative attachment in electron‐stimulated desorption from condensed NO and N2OSanche, L. / Parenteau, L. et al. | 1986
- 1243
-
Laser desorption for hydrogen quantitative analysis: Study by a nuclear method of the laser‐induced hydrogen mobilityRoss, G. G. / Terreault, B. / Boucher, C. / Boivin, R. et al. | 1986
- 1247
-
Summary Abstract: Classical trajectory calculations of photon‐stimulated desorption of ions from alkali–halidesWalkup, R. E. / Avouris, Ph. et al. | 1986
- 1248
-
Summary Abstract: The influence of surface structure on ion emission from TiO2Kurtz, Richard L. et al. | 1986
- 1251
-
Reflection high energy electron diffraction studies of epitaxial growth on semiconductor surfacesCohen, P. I. / Pukite, P. R. / Van Hove, J. M. / Lent, C. S. et al. | 1986
- 1259
-
Electronic and atomic structure of arsenic terminated Si(100)Uhrberg, R. I. G. / Bringans, R. D. / Bachrach, R. Z. / Northrup, John E. et al. | 1986
- 1265
-
Total energy all‐electron theory of surface structural, electronic, and magnetic propertiesFreeman, A. J. / Fu, C. L. / Wimmer, E. et al. | 1986
- 1271
-
An experimental/theoretical comparison of spin‐polarized low energy electron diffraction from the Cu(100) surfaceLind, D. M. / Jamison, K. D. / Dunning, F. B. / Walters, G. K. / Davis, H. L. et al. | 1986
- 1274
-
Quantitative surface structural determination using impact collision ion scattering spectroscopyYarmoff, Jory A. / Williams, R. Stanley et al. | 1986
- 1278
-
Summary Abstract: Temperature dependence of surface state optical absorptionOlmstead, Marjorie A. / Chadi, D. J. et al. | 1986
- 1280
-
Summary Abstract: Temperature dependent step structure of Ni(115)Conrad, E. H. / Aten, R. M. / Kaufman, D. S. / Allen, L. R. / Engel, T. / den Nijs, M. / Riedel, E. K. et al. | 1986
- 1282
-
High resolution electron energy loss spectroscopy: Explored regions and the frontierErskine, J. L. et al. | 1986
- 1289
-
Field emission energy distribution study of laser‐induced thermal effectsGao, Y. / Reifenberger, R. et al. | 1986
- 1294
-
Surface science aspects of interfacial electrochemistryKolb, D. M. et al. | 1986
- 1302
-
Summary Abstract: The structure of overlayer adsorption on Ni(001) by high‐resolution electron energy loss spectroscopyXu, M. L. / Tong, S. Y. et al. | 1986
- 1303
-
Summary Abstract: Resonance electron scattering from benzene chemisorbed on Pd(100) and Pd(111)Waddill, G. D. / Kesmodel, L. L. et al. | 1986
- 1304
-
Summary Abstract: Surface potential stabilization of insulators in high resolution electron energy loss spectroscopyDecroupet, D. / Liehr, M. / Thiry, P. A. / Pireaux, J. J. / Caudano, R. et al. | 1986
- 1306
-
Summary Abstract: Small perturbations on surface electronic structure induced by trace impuritiesKevan, S. D. et al. | 1986
- 1307
-
Summary Abstract: Surface science model studies of Cs solvation by protic and aprotic solventsStuve, E. M. / Döhl‐Oelze, R. / Bange, K. / Sass, J. K. et al. | 1986
- 1309
-
Synchrotron x‐ray scattering studies of semiconductor (111) surface reconstructionRobinson, I. K. et al. | 1986
- 1315
-
Scanning tunneling microscopy studies of Si(111)‐2×1 surfacesFeenstra, R. M. / Thompson, W. A. / Fein, A. P. et al. | 1986
- 1320
-
A simplified scanning tunneling microscope for surface science studiesDemuth, J. E. / Hamers, R. J. / Tromp, R. M. / Welland, M. E. et al. | 1986
- 1324
-
Infrared absorption measurement of the overtone of the wagging mode of hydrogen on W(100)Chabal, Y. J. et al. | 1986
- 1329
-
Summary Abstract: Surface structure determination using x‐ray standing wavesDurbin, S. M. / Berman, L. E. / Bedzyk, M. J. / Batterman, B. W. / Blakely, J. M. et al. | 1986
- 1330
-
Summary Abstract: The hexagonal reconstruction of Pt(100): A scanning tunneling microscopy studyBehm, R. J. / Hösler, W. / Ritter, E. / Binnig, G. et al. | 1986
- 1331
-
Summary Abstract: Xenon on potassium‐covered Ni(100): A probe of surface potentials and polarizabilityMullins, D. R. / White, J. M. / Luftman, H. S. et al. | 1986
- 1333
-
Low temperature adsorption of CO and O2 on Ni(100) and Ni(111): Evidence for precursorsShayegan, M. / Glover, R. E. / Park, Robert L. et al. | 1986
- 1336
-
A theoretical and chemical view of surface chemistry: Chemisorption and reactions of acetyleneSilvestre, Jérôme / Hoffmann, Roald et al. | 1986
- 1342
-
Testing site size requirements in chemisorption: Experiment and theoryCampbell, Charles T. / Paffett, Mark T. / Voter, Arthur F. et al. | 1986
- 1347
-
Rehybridization of CO under the influence of coadsorbed K on Ru(001)Weimer, J. J. / Wurth, W. / Hudeczek, E. / Umbach, E. et al. | 1986
- 1351
-
Synchrotron photoemission evidence for ‘‘lying‐down’’ CO on Cr(110)Shinn, Neal D. et al. | 1986
- 1354
-
Summary Abstract: Modification of the adsorption properties and catalytic activity of Ru(0001) by addition of CuPeden, C. H. F. / Blair, D. S. / Goodman, D. W. et al. | 1986
- 1355
-
Summary Abstract: Adsorption and dissociation of ethylene oxide on clean and oxygen‐covered Cu(110)Benndorf, Carsten / Nieber, Bärbel et al. | 1986
- 1357
-
Island coalescence in a chemisorbed overlayerPimbley, J. M. / Lu, T. ‐M. / Wang, G. ‐C. et al. | 1986
- 1362
-
Calculations of the surface temperature rise and desorption temperature in laser‐induced thermal desorptionBurgess, D. / Stair, P. C. / Weitz, E. et al. | 1986
- 1367
-
A versatile data acquisition system for low‐energy electron diffractionAnderegg, J. W. / Thiel, P. A. et al. | 1986
- 1372
-
M2,3 electron energy loss studies of Ni(100) at small scattering anglesTyliszczak, T. / Hitchcock, A. P. et al. | 1986
- 1376
-
Ferromagnetic resonance in ultrahigh vacuum: Effect of epitaxial overlayers on FeHeinrich, B. / Arrott, A. S. / Cochran, J. F. / Liu, C. / Myrtle, K. et al. | 1986
- 1380
-
Surface band dispersion of Ge(111)c(2×8) and Ge(111):As 1×1Bringans, R. D. / Uhrberg, R. I. G. / Bachrach, R. Z. / Northrup, John E. et al. | 1986
- 1385
-
A combination channeling study of Si(100)(2×1) reconstructed surfaceJin, H.‐S. / Ito, T. / Gibson, W. M. et al. | 1986
- 1391
-
The Si/GaAs(110) heterojunctionList, R. S. / Mahowald, P. H. / Woicik, J. / Spicer, W. E. et al. | 1986
- 1396
-
Reconstruction of aluminum and indium overlayers on Si(111): A systematic study with high‐resolution electron energy loss spectroscopy and low‐energy electron diffractionKelly, M. K. / Margaritondo, G. / Anderson, J. / Frankel, D. J. / Lapeyre, G. J. et al. | 1986
- 1400
-
Energy loss spectroscopy study of Si(111)–alkali metal interfaces at low temperaturesAvci, Recep et al. | 1986
- 1404
-
Surface states and dipoles on Si(111)1×1:NaNorthrup, John E. et al. | 1986
- 1407
-
Summary Abstract: X‐ray photoelectron spectroscopy studies of NO and N2O on clean and oxygen covered W(100) surfacesBaldwin, E. K. / Friend, C. M. et al. | 1986
- 1408
-
Summary Abstract: A photoemission study of TaC(001)DiDio, R. A. / Zehner, D. M. / Lui, S.‐C. / Plummer, E. W. et al. | 1986
- 1409
-
Summary Abstract: An observed isotope effect for hydrogen and deuterium adsorption/desorption on Pd(111)Gdowski, G. E. / Felter, T. E. et al. | 1986
- 1411
-
Summary Abstract: Growth kinetics of an adsorbate‐induced surface reconstructionPenka, V. / Behm, R. J. / Ertl, G. et al. | 1986
- 1412
-
Summary Abstract: Calculations of the energetics and structure of Pt(110) using the embedded atom methodDaw, Murray S. / Foiles, Stephen M. et al. | 1986
- 1414
-
Summary Abstract: Surface vibrational resonances and the order–disorder transformation of the W(100) surfaceWoods, J. P. / Erskine, J. L. et al. | 1986
- 1415
-
Summary Abstract: The lattice parameter of metallic monolayersIgnatiev, A. / Fan, W. C. et al. | 1986
- 1416
-
Summary Abstract: The work function of In/Si(111) superstructuresHirayama, H. / Baba, S. / Kinbara, A. et al. | 1986
- 1419
-
Direct observations of surface chemical and structural changes resulting from the CO oxidation reaction on rhodiumKellogg, G. L. et al. | 1986
- 1424
-
Fermi level pinning during oxidation of atomically clean n‐InP(110)Bertness, K. A. / Kendelewicz, T. / List, R. S. / Williams, M. D. / Lindau, I. / Spicer, W. E. et al. | 1986
- 1427
-
Summary Abstract: Electron‐stimulated desorption as a probe of hydrogen adsorption on and diffusion into Pd(111)Kubiak, Glenn D. / Stulen, Richard H. et al. | 1986
- 1429
-
Summary Abstract: Site conversion of CO on Ni(111): Difference in binding energy between bridge and atop sitesTang, S. L. / Yang, Q. Y. / Lee, M. B. / Beckerle, J. D. / Ceyer, S. T. et al. | 1986
- 1430
-
Summary Abstract: The role of surface defects in aluminum surface oxidationTestoni, A. L. / Stair, P. C. et al. | 1986
- 1431
-
Summary Abstract: Development of single‐crystal adsorption calorimetryKyser, D. A. / Masel, R. I. et al. | 1986
- 1433
-
A secondary ion mass spectrometry study of the catalytic oxidation of methanol on Cu(110)Karwacki, E. J. / Winograd, N. et al. | 1986
- 1437
-
Infrared reflectance absorbance spectroscopy of coadsorbed CO and H2O on Pt(111) surfacesTornquist, W. J. / Griffin, G. L. et al. | 1986
- 1442
-
The interaction of CO, NO, and O2 with sodium‐promoted Rh(100) surfacesHöchst, H. / Colavita, E. et al. | 1986
- 1446
-
An enhanced electron‐stimulated‐desorption ion angular distribution method for imaging molecular orientations of adsorbed speciesDresser, M. J. / Alvey, M. D. / Yates, J. T. et al. | 1986
- 1451
-
The bonding of hydrogen on water‐dosed Si(111)Rosenberg, R. A. / Love, P. J. / Rehn, Victor / Owen, Ian / Thornton, G. et al. | 1986
- 1455
-
X‐ray study of orientational epitaxy in rare gas monolayers on graphiteD’Amico, K. L. / Moncton, D. E. et al. | 1986
- 1459
-
Adsorption characteristics of H2 on the porous layers of condensed Xe, Kr, and CO2Arakawa, I. et al. | 1986
- 1463
-
Photon‐stimulated ion desorption from condensed SiF4 and SiH4Rosenberg, R. A. et al. | 1986
- 1465
-
Characterization of Pt/TiO2 surfaces by means of photoelectron spectroscopy of adsorbed xenonDolle, P. / Markert, K. / Heichler, W. / Armstrong, N. R. / Wandelt, K. / Kim, K. S. / Fiato, R. A. et al. | 1986
- 1467
-
Summary Abstract: Surface Raman spectroscopy of pyridine adsorbed on Ni(111) and Ni(100) surfacesHarradine, D. / Campion, A. et al. | 1986
- 1468
-
Summary Abstract: The adsorption of water on clean and oxygen‐covered Ag(100) studied by high resolution electron energy loss spectroscopyDing, Xunmin / Garfunkel, Eric / Dong, Guosheng / Yang, Shu / Hou, Xiaoyuan / Wang, Xun et al. | 1986
- 1470
-
Summary Abstract: Vibrations of ammonia on the Cu(100) surfacePettersson, Lars G. M. / Bauschlicher, Charles W. / Hussla, Ingo et al. | 1986
- 1472
-
Summary Abstract: The reactivity of intermediates in the water formation reaction on Pt(111)Mitchell, G. E. / Akhter, S. / White, J. M. et al. | 1986
- 1473
-
Summary Abstract: Refined potentials for rare gas atom adsorption on rare gas and alkali–halide surfacesWilson, J. W. / Heinbockel, J. H. / Outlaw, R. A. et al. | 1986
- 1475
-
Summary Abstract: Surface diffusivities from concentration profilesWatanabe, Fumiya / Ehrlich, Gert et al. | 1986
- 1476
-
Summary Abstract: Chemisorption of fluorocarbon free radicals on Si(111)Roop, B. / Joyce, S. / Steinfeld, J. I. et al. | 1986
- 1477
-
Summary Abstract: Spin‐polarized photoelectron diffraction from magnetically ordered solids and surfacesSinković, B. / Hermsmeier, B. / Fadley, C. S. et al. | 1986
- 1479
-
Summary Abstract: Oxidation study of the Si(111) surface with an ordered Ag overlayerYeh, Jyh‐Jye / Friedman, Daniel J. / Cao, Renyu / Lindau, Ingolf et al. | 1986
- 1481
-
Time and angle resolved ultraviolet photoemission spectroscopy studies of single crystal surface and interfacesHaight, R. / Bokor, J. / Freeman, R. R. / Bucksbaum, P. H. et al. | 1986
- 1487
-
Observation of significant nitrogen–oxygen bond weakening in nitric oxide on Rh(100)Villarrubia, J. S. / Richter, Lee J. / Gurney, Bruce A. / Ho, W. et al. | 1986
- 1491
-
Molecular beam study of the dissociative chemisorption of oxygen on W(110)Rettner, Charles T. / DeLouise, Lisa A. / Auerbach, Daniel J. et al. | 1986
- 1493
-
Pulsed laser‐induced desorption studies of the kinetics of ethylene dehydrogenation on Ni(100)Hall, R. B. / Bares, S. J. / DeSantolo, A. M. / Zaera, F. et al. | 1986
- 1499
-
State‐selective ionization detection of neutral NO following electron‐stimulated desorptionBurns, A. R. et al. | 1986
- 1501
-
Electron‐beam‐induced fracture of Kevlar single fibersDickinson, J. Thomas / Jensen, L. C. / Klakken, M. L. et al. | 1986
- 1505
-
Summary Abstract: Direct, real‐time measurement of the adsorption and desorption kinetics of CO and Cu(100)Dubois, L. H. / Ellis, T. H. / Kevan, S. D. et al. | 1986
- 1506
-
Summary Abstract: Dynamics of the dissociative adsorption of hydrogen on Ni(100)Hamza, A. V. / Madix, R. J. et al. | 1986
- 1507
-
Summary Abstract: Surface reactions studied by laser‐induced thermal desorption with Fourier transform mass spectrometry detectionSherman, M. G. / Kingsley, J. R. / Land, D. / McIver, R. T. / Hemminger, John C. et al. | 1986
- 1510
-
Two‐dimensional gas–solid phase transition of xenon adsorbed on different metal substratesJablonski, A. / Eder, S. / Markert, K. / Wandelt, K. et al. | 1986
- 1514
-
Some experimental artifacts in low energy electron diffraction studies of phase transitionsUnertl, W. N. / Clark, D. E. / Shern, C. S. et al. | 1986
- 1518
-
Epitaxial growth of iron iodide films on Fe(110)Mueller, D. R. / Rhodin, T. N. / Dowben, P. A. et al. | 1986
- 1522
-
Summary Abstract: Low energy electron diffraction and physisorption studies of the Ge(111) surfaceWebb, M. B. / Phaneuf, R. J. / Packard, W. E. et al. | 1986
- 1523
-
Summary Abstract: Film growth, wetting, and epitaxyDash, J. G. et al. | 1986
- 1524
-
Summary Abstract: Reconstruction in a thin film: Epitaxial Pt on Pd(100)Beauvais, S. L. / Behm, R. J. / Chang, S.‐L. / Olson, C. G. / Rape, P. R. / Thiel, P. A. et al. | 1986
- 1526
-
Summary Abstract: Experimental determination of the electronic structure of small metal particlesCaprile, C. / Franciosi, A. / Wielickza, D. / Olson, C. G. et al. | 1986
- 1528
-
Summary Abstract: A new approach to overlayer dynamicsVoter, Arthur F. et al. | 1986
- 1529
-
Summary Abstract: Atomic jump rates in heteroclustersWrigley, John D. / Ehrlich, Gert et al. | 1986
- 1532
-
Recent developments in quantitative surface analysis by electron spectroscopyPowell, C. J. et al. | 1986
- 1540
-
Fourier transform photoelectron spectroscopyMuehlhoff, L. / Muehlhoff, H.‐M. et al. | 1986
- 1545
-
A technique for comparing Auger electron spectroscopy signals from different spectrometers using common materialsBaer, D. R. / Thomas, M. T. et al. | 1986
- 1551
-
Imaging properties and energy aberrations of a double‐pass cylindrical‐mirror electron energy analyzerErickson, N. E. / Powell, C. J. et al. | 1986
- 1557
-
Peak resolving of complex Auger spectra by least‐squares fitting with prefiltering of spectra: An application to depth profilingSekine, T. / Ando, Y. / Tokumasu, H. et al. | 1986
- 1562
-
Summary Abstract: A test of biased referencing for the x‐ray photoelectron spectroscopy analysis of nonconducting materialsEdgell, M. J. / Baer, D. R. / Castle, J. E. et al. | 1986
- 1563
-
Summary Abstract: Influence of crystalline grain orientation of Auger electron spectroscopySakai, Y. / Mogami, A. et al. | 1986
- 1565
-
Summary Abstract: Multicomponent quantitative analysis by Auger electron spectroscopyTurner, N. H. et al. | 1986
- 1567
-
Summary Abstract: Semiempirical modeling of the background in low energy ion scattering spectraNelson, G. C. et al. | 1986
- 1570
-
Auger analysis of Si–H bonding and hydrogen concentration in hydrogenated amorphous siliconNelson, A. J. / Burnham, N. A. / Schwartzlander, A. B. / Asher, S. E. / Kazmerski, L. L. et al. | 1986
- 1574
-
A study of chemical bonding in suboxides of silicon using Auger electron spectroscopyChao, S. S. / Tyler, J. E. / Takagi, Y. / Pai, P. G. / Lucovsky, G. / Lin, S. Y. / Wong, C. K. / Mantini, M. J. et al. | 1986
- 1580
-
Characterization of nitrogen‐containing glasses by x‐ray photoelectron spectroscopyClabes, J. G. / Fern, R. E. / Frischat, G. H. et al. | 1986
- 1585
-
Electronic structure of Laves‐type uranium intermetallics studied with synchrotron radiationHöchst, H. / Tan, K. / Hillebrecht, U. et al. | 1986
- 1589
-
Auger and electron energy loss study of the electronic structure of U–M(M=Fe,Co,Ni) metallic glassesBevolo, Albert J. / Drehman, Alvin J. et al. | 1986
- 1595
-
High‐resolution electron energy loss spectroscopy as a probe of surface morphology and electronic states at metal/semiconductor interfacesChambers, S. A. / del Giudice, M. / Ruckman, M. W. / Anderson, S. B. / Weaver, J. H. / Lapeyre, G. J. et al. | 1986
- 1599
-
Summary Abstract: Chemical effects in materials studies using Auger analysisRye, Robert R. et al. | 1986
- 1600
-
Summary Abstract: A consistent quantitative interpretation of the Auger line shapes of carbon in molecules and solidsRamaker, David E. / Hutson, Fred L. et al. | 1986
- 1601
-
Summary Abstract: The Auger line shape of graphiteRogers, J. W. / Houston, J. E. / Rye, R. R. / Hutson, F. L. / Ramaker, D. E. et al. | 1986
- 1603
-
Summary Abstract: Analysis of chemical bonding in TiC, TiN, and TiO using second‐principles band structures from photoemission dataKim, Sehun / Williams, R. Stanley et al. | 1986
- 1604
-
Effect of surface treatments on near surface composition of 316 nuclear grade stainless steelRao, T. V. / Vook, R. W. / Meyer, W. / Joshi, A. et al. | 1986
- 1608
-
Hydrazine reduction of transition metal oxides: In situ characterization using x‐ray photoelectron spectroscopyLittrell, D. M. / Tatarchuk, B. J. et al. | 1986
- 1613
-
Surface composition of polycrystalline Pd15Rh following high temperature oxidation in airGraham, G. W. / Potter, T. / Baird, R. J. / Gandhi, H. S. / Shelef, M. et al. | 1986
- 1617
-
Combined electrochemical/surface science investigations of Pt/Cr alloy electrodesDaube, K. A. / Paffett, M. T. / Gottesfeld, S. / Campbell, C. T. et al. | 1986
- 1621
-
X‐ray photoemission spectroscopy study of the activated oxidation of GaAs(1̄1̄1̄)López de Ceballos, I. / Muñoz, M. C. / Goñi, J. M. / Sacedón, J. L. et al. | 1986
- 1626
-
Catalytic oxidation of niobium by rare earthsLatta, E.‐E. / Ronay, Maria et al. | 1986
- 1631
-
Summary Abstract: Oxidation of a terbium–iron alloyFrankenthal, R. P. / van Dover, R. B. / Siconolfi, D. J. et al. | 1986
- 1633
-
Recent developments concerning segregation and fracture at grain boundariesWhite, Calvin L. et al. | 1986
- 1638
-
Chemistry of hydrogen and arsenic interactions at silicon grain boundariesKazmerski, L. L. et al. | 1986
- 1643
-
Characterization of cam lobe and valve lifter antiwear films by a high‐spatial‐resolution Auger microprobeGaarenstroom, Stephen W. / Caracciolo, Frank et al. | 1986
- 1648
-
The emission of atoms and molecules accompanying fracture of single‐crystal MgODickinson, J. T. / Jensen, L. C. / McKay, M. R. / Freund, F. et al. | 1986
- 1653
-
Variable angle x‐ray photoelectron spectroscopy and ion scattering spectroscopy study of the Ag/SiO2 interfacePitts, J. R. / Thomas, T. M. / Czanderna, A. W. et al. | 1986
- 1658
-
Summary Abstract: Surface science studies of metal oxide alumina interactions: Group VIB oxidesCarver, James C. / Lanier, Robert G. et al. | 1986
- 1659
-
Summary Abstract: Applications of an in situ friction and wear device for a scanning Auger spectrometerPope, L. E. / Peebles, D. E. et al. | 1986
- 1662
-
Recent advances in sputter depth profilingWittmaack, K. et al. | 1986
- 1666
-
An analytical expression for describing Auger sputter depth profile shapes of interfacesKirchhoff, W. H. / Chambers, G. P. / Fine, J. et al. | 1986
- 1671
-
Ion scattering spectroscopy and Auger electron spectroscopy depth profiles of silver–copper thin film interdiffusionPitts, J. R. / Czanderna, A. W. / Thomas, T. M. et al. | 1986
- 1675
-
Surface segregation in binary alloysVahalia, Uresh / Dowben, Peter / Miller, Allen et al. | 1986
- 1680
-
Scanning Auger microprobe studies of ball cratered CdS/CuInSe2 solar cellsLevenson, L. L. / Burnham, N. A. / Matson, R. J. / Noufi, R. / Kazmerski, L. L. et al. | 1986
- 1684
-
Summary Abstract: Improvement of ion scattering spectroscopy as an analytical technique for imaging and depth profilingStaib, P. / Simondet, F. / Horreard, F. / Profizi, J. L. et al. | 1986
- 1685
-
Summary Abstract: Thermal diffusion of oxygen in titanium and titanium oxide filmsRogers, J. W. / Erickson, K. L. / Belton, D. N. / Ward, S. J. et al. | 1986
- 1688
-
Auger depth profiling studies with TiN filmsRistolainen, E. O. / Molarius, J. M. / Korhonen, A. S. / Lindroos, V. K. et al. | 1986
- 1692
-
Surface modification strategies for (100)3C‐SiCBellina, J. J. / Ferrante, J. / Zeller, M. V. et al. | 1986
- 1696
-
Characterization of β‐SiC surfaces and the Au/SiC interfaceMizokawa, Yusuke / Geib, K. M. / Wilmsen, C. W. et al. | 1986
- 1701
-
Surface composition of SiC after ion bombardment, annealing, and exposure to oxygenJo/rgensen, B. / Morgen, P. et al. | 1986
- 1705
-
Summary Abstract: Properties of thin antimultipactor coatings for klystron windowsNyaiesh, A. R. / Garwin, E. L. / King, F. K. / Kirby, R. E. et al. | 1986
- 1705
-
Summary Abstract: Surface chemical modification of high‐strain graphite filamentsMadden, H. H. / Allred, R. E. et al. | 1986
- 1709
-
The quadrupole: System design and residual gas analyzer performanceDawson, P. H. et al. | 1986
- 1715
-
Long‐term changes in the sensitivity of quadrupole mass spectrometersBlanchard, W. R. / McCarthy, P. J. / Dylla, H. F. / LaMarche, P. H. / Simpkins, J. E. et al. | 1986
- 1720
-
An aluminum alloy quadrupole mass filter with a 120‐m‐long rf cableWatanabe, F. / Ishimaru, H. et al. | 1986
- 1724
-
Effect of measuring conditions on the accuracy of a spinning rotor gaugeHirata, M. / Isogai, H. / Ono, M. et al. | 1986
- 1728
-
Quartz friction vacuum gauge for pressure range from 0.001 to 1000 TorrOno, M. / Hirata, M. / Kokubun, K. / Murakami, H. / Hojo, H. / Kawashima, H. / Kyogoku, H. et al. | 1986
- 1732
-
Calibration and characterization of Bayard–Alpert gauges operating in high magnetic fieldsPickles, W. L. / Hunt, A. L. et al. | 1986
- 1736
-
Operation of cold‐cathode magnetron gauges in high magnetic fieldsThomas, S. R. / Goerz, D. A. / Pickles, W. L. et al. | 1986
- 1740
-
Summary Abstract: A mass spectrometer system to determine very low levels of helium in small solid and liquid samplesFarrar, Harry / Oliver, B. M. et al. | 1986
- 1742
-
The design, construction, and testing of the vacuum vessel for the tandem Mirror Fusion Test FacilityGerich, Jerry W. et al. | 1986
- 1749
-
Fermilab Accumulator Ring ultrahigh vacuum systemMills, F. E. / Bartelson, C. / Gormley, M. / Klen, J. / Lee, G. N. / Marriner, J. / Misek, J. R. / Rathbun, T. D. / Satti, J. A. / Sax, W. et al. | 1986
- 1753
-
Chromium getter studies in the Tokamak Fusion Test ReactorDylla, H. F. / LaMarche, P. H. / Blanchard, W. R. / Budny, R. V. / Boody, F. P. / Bush, C. E. / Groebner, R. J. / McCarthy, P. J. / Simpkins, J. E. / Stratton, B. C. et al. | 1986
- 1758
-
Summary Abstract: The Tara vacuum systemPost, R. S. / Brindza, P. / Goodrich, P. / Gaudreau, M. P. et al. | 1986
- 1759
-
Summary Abstract: The Tara neutral beamline hydrogen pumping systemPost, R. S. / Brindza, P. D. / Goodrich, P. / Horne, S. F. / Hsu, W. L. / Baskes, M. I. et al. | 1986
- 1761
-
Summary Abstract: Clean vacuum systems for the Radio Frequency Test FacilityLivesey, R. L. et al. | 1986
- 1762
-
Summary Abstract: All aluminum alloy ultrahigh vacuum system for a 30 GeV electron–positron colliderIshimaru, H. / Momose, T. / Narushima, K. / Mizuno, H. / Kanazawa, K. / Watanabe, H. / Shimamoto, K. et al. | 1986
- 1764
-
Summary Abstract: Effects of surface roughness on Ti getter coating in Tandem Mirror Experiment UpgradeHsu, W. L. / Bastasz, R. / Pontau, A. E. / Allen, S. L. / Pickles, W. L. et al. | 1986
- 1766
-
Summary Abstract: Behavior of fresh Zr–V–Fe getters exposed to hydrogen in an ultrahigh vacuum systemBoucher, C. / Lehoux, M. / Veilleux, G. / Terreault, B. et al. | 1986
- 1768
-
Optical emission and laser‐induced fluorescence diagnostics in reactive plasmasMiller, Terry A. et al. | 1986
- 1773
-
Energy transfer processes in glow dischargesAbril, I. / Gras‐Marti, A. / Valles‐Abarca, J. A. et al. | 1986
- 1779
-
Laser spectroscopy of sputtered atomsGruen, D. M. / Pellin, M. J. / Young, C. E. / Calaway, W. F. et al. | 1986
- 1786
-
Laser diagnostics of a silane plasma—SiH radicals in an a‐Si:H chemical vapor deposition systemMatsumi, Y. / Hayashi, T. / Yoshikawa, H. / Komiya, S. et al. | 1986
- 1791
-
Diagnostics of microwave plasma by laser induced fluorescenceNinomiya, Ken / Suzuki, Keizo / Nishimatsu, Shigeru / Okada, Osami et al. | 1986
- 1795
-
Summary Abstract: Negative ion kinetics in radio‐frequency glow dischargesGottscho, Richard A. / Gaebe, Carl E. et al. | 1986
- 1796
-
Summary Abstract: Collisional energy transfer in noble gas/hydrogen plasmasKrogh, Ole / Wicker, Tom / Chapman, Brian et al. | 1986
- 1798
-
Summary Abstract: Diagnostics of low‐pressure oxygen radio‐frequency plasmas and the mechanism for polymer etching: A comparison of reactive sputter etching and magnetron sputter etchingSteinbrüchel, Ch. / Curtis, B. J. / Lehmann, H. W. / Widmer, R. et al. | 1986
- 1800
-
Design of plasma etching and deposition systemsKumagai, H. Y. et al. | 1986
- 1805
-
Surface thermographyUlrickson, M. et al. | 1986
- 1810
-
Electric probes in plasmasLipschultz, B. / Hutchinson, I. / LaBombard, B. / Wan, A. et al. | 1986
- 1817
-
Characterization of the Tokamak Fusion Test Reactor plasma edge by Langmuir–calorimeter probesKilpatrick, S. J. / Manos, D. M. / Budny, R. V. / Stangeby, P. C. / Ritter, R. S. / Young, K. M. et al. | 1986
- 1822
-
Langmuir probe characterization of magnetron operationRossnagel, S. M. / Kaufman, H. R. et al. | 1986
- 1826
-
Calorimetry in thin film processingShivashankar, S. A. / Robinson, B. et al. | 1986
- 1830
-
Summary Abstract: Diagnostics in plasma processingCoburn, J. W. et al. | 1986