On specimen preparation by radio frequency planar magnetron sputtering (Englisch)
- Neue Suche nach: Ochiai, Y.
- Neue Suche nach: Aso, K.
- Neue Suche nach: Hayakawa, M.
- Neue Suche nach: Matsuda, H.
- Neue Suche nach: Hayashi, K.
- Neue Suche nach: Ishikawa, W.
- Neue Suche nach: Iwasaki, Y.
- Neue Suche nach: Ochiai, Y.
- Neue Suche nach: Aso, K.
- Neue Suche nach: Hayakawa, M.
- Neue Suche nach: Matsuda, H.
- Neue Suche nach: Hayashi, K.
- Neue Suche nach: Ishikawa, W.
- Neue Suche nach: Iwasaki, Y.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
4
, 1
;
19-25
;
1986
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:On specimen preparation by radio frequency planar magnetron sputtering
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Weitere Titelangaben:On specimen preparation
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Beteiligte:Ochiai, Y. ( Autor:in ) / Aso, K. ( Autor:in ) / Hayakawa, M. ( Autor:in ) / Matsuda, H. ( Autor:in ) / Hayashi, K. ( Autor:in ) / Ishikawa, W. ( Autor:in ) / Iwasaki, Y. ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.01.1986
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Format / Umfang:7 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:FABRICATION , SPUTTERING , ALUMINIUM ALLOYS , SILICON , ALUMINIUM , TITANIUM , CHROMIUM , COBALT , IRON , NICKEL , COPPER , ZIRCONIUM , NIOBIUM , MOLYBDENUM , SILVER , TANTALUM , TUNGSTEN , COBALT ALLOYS , SILICON ALLOYS , TITANIUM ALLOYS , CHROMIUM ALLOYS , IRON ALLOYS , NICKEL ALLOYS , COPPER ALLOYS , ZIRCONIUM ALLOYS , NIOBIUM ALLOYS , MOLYBDENUM ALLOYS , SILVER ALLOYS , TANTALUM ALLOYS , TUNGSTEN ALLOYS , MAGNETRONS , METALLIC GLASSES , MAGNETIC MATERIALS , ARGON IONS , ELECTRIC DISCHARGES , Co alloys
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Datenquelle:
Inhaltsverzeichnis – Band 4, Ausgabe 1
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On specimen preparation by radio frequency planar magnetron sputteringOchiai, Y. / Aso, K. / Hayakawa, M. / Matsuda, H. / Hayashi, K. / Ishikawa, W. / Iwasaki, Y. et al. | 1986
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