Temperature-dependent morphology and composition of ultra-thin GeSn epilayers prepared by remote plasma enhanced chemical vapor deposition (Englisch)
- Neue Suche nach: Jiang, Jiechao
- Neue Suche nach: Chetuya, Nonso Martin
- Neue Suche nach: Meletis, Efstathios I.
- Neue Suche nach: Ngai, Joseph H.
- Neue Suche nach: Grzybowski, Gordon J.
- Neue Suche nach: Claflin, Bruce
- Neue Suche nach: Jiang, Jiechao
- Neue Suche nach: Chetuya, Nonso Martin
- Neue Suche nach: Meletis, Efstathios I.
- Neue Suche nach: Ngai, Joseph H.
- Neue Suche nach: Grzybowski, Gordon J.
- Neue Suche nach: Claflin, Bruce
In:
Journal of Vacuum Science & Technology B
;
42
, 3
;
8
;
2024
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Temperature-dependent morphology and composition of ultra-thin GeSn epilayers prepared by remote plasma enhanced chemical vapor deposition
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Beteiligte:Jiang, Jiechao ( Autor:in ) / Chetuya, Nonso Martin ( Autor:in ) / Meletis, Efstathios I. ( Autor:in ) / Ngai, Joseph H. ( Autor:in ) / Grzybowski, Gordon J. ( Autor:in ) / Claflin, Bruce ( Autor:in )
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Erschienen in:Journal of Vacuum Science & Technology B ; 42, 3 ; 8
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.05.2024
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Format / Umfang:8 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 42, Ausgabe 3
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