Selectivity enhancement of GaAs/AlGaAs dry etching by a pulse-excited inductively coupled plasma source (Englisch)
- Neue Suche nach: Matsukura, Y.
- Neue Suche nach: Tanaka, H.
- Neue Suche nach: Wada, J.
- Neue Suche nach: Matsukura, Y.
- Neue Suche nach: Tanaka, H.
- Neue Suche nach: Wada, J.
In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
;
18
, 2
;
864-867
;
2000
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Selectivity enhancement of GaAs/AlGaAs dry etching by a pulse-excited inductively coupled plasma source
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Beteiligte:
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Erschienen in:
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.03.2000
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Format / Umfang:4 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 18, Ausgabe 2
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