NiCr etching in a reactive gas (Englisch)
- Neue Suche nach: Ritter, J.
- Neue Suche nach: Boucher, R.
- Neue Suche nach: Morgenroth, W.
- Neue Suche nach: Meyer, H. G.
- Neue Suche nach: Ritter, J.
- Neue Suche nach: Boucher, R.
- Neue Suche nach: Morgenroth, W.
- Neue Suche nach: Meyer, H. G.
In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
;
25
, 3
;
468-473
;
2007
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:NiCr etching in a reactive gas
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Weitere Titelangaben:NiCr etching in a reactive gas
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Beteiligte:Ritter, J. ( Autor:in ) / Boucher, R. ( Autor:in ) / Morgenroth, W. ( Autor:in ) / Meyer, H. G. ( Autor:in )
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Erschienen in:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films ; 25, 3 ; 468-473
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Verlag:
- Neue Suche nach: American Vacuum Society
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Erscheinungsdatum:01.05.2007
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Format / Umfang:6 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 25, Ausgabe 3
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