HfSiON Films Deposited by Radio Frequency Reactive Sputtering (Englisch)
- Neue Suche nach: Feng, Li-Ping
- Neue Suche nach: Liu, Zheng-Tang
- Neue Suche nach: Feng, Li-Ping
- Neue Suche nach: Liu, Zheng-Tang
In:
Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Process, Properties and Applications
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1
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2013
- Aufsatz/Kapitel (Buch) / Elektronische Ressource
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Titel:HfSiON Films Deposited by Radio Frequency Reactive Sputtering
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Beteiligte:Feng, Li-Ping ( Autor:in ) / Liu, Zheng-Tang ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: Bentham Science Publishers Ltd.
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Erscheinungsdatum:2013
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ISBN:
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Medientyp:Aufsatz/Kapitel (Buch)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis E-Book
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 1
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About the EditorsVaz, Filipe / Martin, Nicolas / Fenker, Martin et al. | 2013
- 2
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Modelling of Reactive Sputter Deposition of OxynitridesBerg, Sören / Nyberg, Tomas / Depla, Diederik et al. | 2013
- 3
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Reactive Gas Pulsing Process for Oxynitride Thin FilmsMartin, Nicolas / Lintymer, Jan / Besnard, Aurélien / Sthal, Fabrice et al. | 2013
- 4
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Exploring the Potential of High Power Impulse Magnetron Sputtering for Tailoring the Chemical Composition and the Properties in Metal Oxynitride FilmsSarakinos, Kostas et al. | 2013
- 5
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Tuneable Properties of Zirconium Oxynitride Thin FilmsCarvalho, Pedro / Cunha, Luis / Pessoa Barradas, Nuno / Alves, Eduardo / Pedro Espinós, Juan / Vaz, Filipe et al. | 2013
- 6
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Gradual Evolution of the Properties in Titanium Oxynitride Thin FilmsChappé, Jean-Marie / Martin, Nicolas et al. | 2013
- 7
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Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive GasAgouram, Saïd / Terwagne, Guy / Bodart, Franz et al. | 2013
- 8
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A Comprehensive Study of the Properties of Sputtered NbOxNy Thin FilmsFenker, Martin et al. | 2013
- 9
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Tuneable Properties of Aluminium Oxynitride Thin FilmsBorges, Joel / P. Barradas, Nuno / Alves, Eduardo / Martin, Nicolas / Beaufort, Marie-France / Camelio, Sophie / Eyidi, Dominique / Girardeau, Thierry / Paumier, Fabien / Rivière, Jean-Paul et al. | 2013
- 10
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HfSiON Films Deposited by Radio Frequency Reactive SputteringFeng, Li-Ping / Liu, Zheng-Tang et al. | 2013
- 11
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Properties of Oxynitride Thin Films for Biomedical ApplicationsFenker, Martin et al. | 2013
- 12
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Oxynitrides and Oxides Deposited by Cathodic Vacuum ArcVetter, Jörg et al. | 2013
- 13
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Application of Oxynitrides for Microelectronic Devices and Gas BarriersWu, Yung-Hsien / Huang, Jia-Hong et al. | 2013
- 14
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Author IndexVaz, Filipe / Martin, Nicolas / Fenker, Martin et al. | 2013
- 15
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Subject IndexVaz, Filipe / Martin, Nicolas / Fenker, Martin et al. | 2013