Annealing effects on microstructures of HfAlO/Si with a Ti capping layer (Englisch)
- Neue Suche nach: Wan, L.
- Neue Suche nach: Gong, X.
- Neue Suche nach: Cheng, X. H.
- Neue Suche nach: Luo, H.
- Neue Suche nach: Huang, Y.
- Neue Suche nach: Tang, B.
- Neue Suche nach: Shangguan, J.
- Neue Suche nach: Wan, L.
- Neue Suche nach: Gong, X.
- Neue Suche nach: Cheng, X. H.
- Neue Suche nach: Luo, H.
- Neue Suche nach: Huang, Y.
- Neue Suche nach: Tang, B.
- Neue Suche nach: Shangguan, J.
In:
The European Physical Journal Applied Physics
;
48
, 2
;
2009
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Annealing effects on microstructures of HfAlO/Si with a Ti capping layer
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Beteiligte:Wan, L. ( Autor:in ) / Gong, X. ( Autor:in ) / Cheng, X. H. ( Autor:in ) / Luo, H. ( Autor:in ) / Huang, Y. ( Autor:in ) / Tang, B. ( Autor:in ) / Shangguan, J. ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: EDP Sciences
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Erscheinungsdatum:01.11.2009
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Format / Umfang:6 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 48, Ausgabe 2
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