Investigation of the mechanism of CO2 laser driven production of ultrafine sinterable (Si3N4 and SiC) powders (Englisch)
Nationallizenz
- Neue Suche nach: Borsella, E.
- Neue Suche nach: Caneve, L.
- Neue Suche nach: Fantoni, R.
- Neue Suche nach: Piccirillo, S.
- Neue Suche nach: Basili, N.
- Neue Suche nach: Enzo, S.
- Neue Suche nach: Borsella, E.
- Neue Suche nach: Caneve, L.
- Neue Suche nach: Fantoni, R.
- Neue Suche nach: Piccirillo, S.
- Neue Suche nach: Basili, N.
- Neue Suche nach: Enzo, S.
In:
Applied Surface Science
;
36
, 1-4
;
213-220
;
1988
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ISSN:
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Investigation of the mechanism of CO2 laser driven production of ultrafine sinterable (Si3N4 and SiC) powders
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Beteiligte:Borsella, E. ( Autor:in ) / Caneve, L. ( Autor:in ) / Fantoni, R. ( Autor:in ) / Piccirillo, S. ( Autor:in ) / Basili, N. ( Autor:in ) / Enzo, S. ( Autor:in )
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Erschienen in:Applied Surface Science ; 36, 1-4 ; 213-220
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Verlag:
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Erscheinungsdatum:24.08.1988
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Format / Umfang:8 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Datenquelle:
Inhaltsverzeichnis – Band 36, Ausgabe 1-4
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Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 1
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A thermal description of the melting of c- and a-silicon under pulsed excimer lasersde Unamuno, S. / Fogarassy, E. et al. | 1988
- 12
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Numerical simulation of temperature distributions in layered structures during laser processingLevoska, J. / Rantala, T.T. / Lenkkeri, J. et al. | 1988
- 23
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Low temperature plasma enhanced CVD of highly conductive single crystalline and polycrystalline silicon materialsNijs, J. / Baert, K. / Symons, J. / Kobayashi, K. / Deschepper, P. et al. | 1988
- 39
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Delta-type doping profiles in siliconEisele, I. et al. | 1988
- 52
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Synthesis of silicon carbide powders by a CW CO2 laserCurcio, F. / Ghiglione, G. / Musci, M. / Nannetti, C. et al. | 1988
- 59
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Low temperature photon-controlled growth of thin films and multilayered structuresLowndes, D.H. / Geohegan, D.B. / Eres, D. / Pennycook, S.J. / Mashburn, D.N. / Jellison, G.E. Jr. et al. | 1988
- 70
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ArF laser photochemical deposition of amorphous silicon from disilane: Spectroscopic studies and comparison with thermal CVDEres, D. / Geohegan, D.B. / Lowndes, D.H. / Mashburn, D.N. et al. | 1988
- 81
-
Precision surface temperature measurement and film characterization for LICVD of a-Si: H from SiH4Hesch, K. / Hess, P. / Oetzmann, H. / Schmidt, C. et al. | 1988
- 89
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Pyrolysis and IR laser photolysis of SiH4 molecules in the presence of non reactive and reactive additivesBertolotti, M. / Consalvo, D. / Mele, A. / Giardini-Guidoni, A. / Teghil, R. et al. | 1988
- 95
-
Photoassisted MBE of CdTe thin filmsBicknell-Tassius, R.N. / Kuhn, T.A. / Ossau, W. et al. | 1988
- 102
-
Precursors for thin film oxides by photo-MOCVDTrundle, C. / Brierley, C.J. et al. | 1988
- 119
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CW and pulsed UV laser-induced deposition from Cr(CO)6, Mo(CO)6, and W(CO)6Jackson, Robert L. / Tyndall, George W. / Sather, Scott D. et al. | 1988
- 134
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Low temperature oxidation of crystalline silicon using excimer laser irradiationNayar, Vishal / Boyd, Ian W. / Goodall, F.N. / Arthur, G. et al. | 1988
- 141
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Deposition of high quality SiO2 layers from TEOS by excimer laserKlumpp, A. / Sigmund, H. et al. | 1988
- 150
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Evaporation of solids by pulsed laser irradiationStafast, H. / Von Przychowski, M. et al. | 1988
- 157
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Pulsed laser ablative deposition of thin metal filmsMogyorósi, P. / Szörényi, T. / Bali, K. / Tóth, Zs. / Hevesi, I. et al. | 1988
- 164
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Growth model for microcrystalline siliconVan Oort, R.C. / Geerts, M.J. / Van den Heuvel, J.C. et al. | 1988
- 170
-
Thin layers obtained by plasma jet deposition at low pressureGuilly, J. / Pennaneach, M. et al. | 1988
- 177
-
Laser-induced chemical vapor deposition of chromium films from chromiumhexacarbonyl using a KrF excimer laserNowak, R. / Konstantinov, L. / Hess, P. et al. | 1988
- 185
-
Oxide growth on silicides in oxygen plasmaCliment, A. / Enard, J.P. / Lavernhe, B. / Perriere, J. / Straboni, A. / Vuillermoz, B. / Levy, D. et al. | 1988
- 196
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Plasma nitrided oxide films as a thin gate dielectricDebenest, P. / Barla, K. / Straboni, A. / Vuillermoz, B. et al. | 1988
- 205
-
Modelling of silicon nitride deposition by 254 nm Hg-photosensitization and 185 nm photolysis of SiH4/NH3 gas mixtureAllain, Bruno / Perrin, Jérôme / Guizot, Jean Luc et al. | 1988
- 213
-
Investigation of the mechanism of CO2 laser driven production of ultrafine sinterable (Si3N4 and SiC) powdersBorsella, E. / Caneve, L. / Fantoni, R. / Piccirillo, S. / Basili, N. / Enzo, S. et al. | 1988
- 221
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Excimer laser photolysis of organometallic compounds for Zn depositionBorsella, E. / Larciprete, R. et al. | 1988
- 231
-
Characterization of ion-beam-sputtered tungsten films on siliconMeyer, Françoise / Schwebel, Christian / Pellet, Claude / Gautherin, Guy et al. | 1988
- 240
-
An in situ infrared study of the room temperature oxidation of silicon with atomic and molecular oxygenClaassen, W.C.M. / Schmitz, R.W.A.H. / Dieleman, J. et al. | 1988
- 247
-
Low-temperature crystallisation of amorphous-silicon films for the fabrication of thin-film transistorsPanwar, O.S. / Moore, R.A. / Mitchell, N.S.J. / Gamble, H.S. / Armstrong, B.M. et al. | 1988
- 257
-
UV laser etching processes for film layers used in silicon integrated circuitsLoper, G.L. / Suck-Salk, S.H. / Tabat, M.D. et al. | 1988
- 267
-
Microwave multipolar plasma for etching and depositionBurke, Rudolf R. / Pomot, Claude et al. | 1988
- 278
-
Mercury cadmium telluride chemically photo-assisted etchingRoustan, J.C. / Azema, A. / Botineau, J. / Gaucherel, Ph. et al. | 1988
- 285
-
On the application of XPS, SSIMS and QCM to study the surface of a CF4/O2 plasma treated polycarbonateOcchiello, E. / Morra, M. / Gardassi, F. / Bargon, J. et al. | 1988
- 296
-
Semiconductor surface etching by halogens: Fundamental stepsJackman, R.B. / Price, R.J. / Foord, J.S. et al. | 1988
- 313
-
Laser-induced photoetching of semiconductors and metalsPeyre, J.L. / Vannier, Ch. / Riviere, D. / Villela, G. et al. | 1988
- 322
-
Silicon damage and residue overlayer caused by rie and ribe processes with CHF3Cardinaud, Ch. / Turban, G. / Grolleau, B. / Grandchamp, J.P. / Lejeune, C. / Scheiblin, P. / Collard, E. et al. | 1988
- 332
-
CW-laser induced chemical etching of thin silver and molybdenum filmsMogyorósi, P. et al. | 1988
- 343
-
Laser photoablation of spin-on-glass and poly(ethyl cyanoacrylate) photoresistHogan, M. / Magan, J.D. / Blau, W. / Lunney, J.G. / Woods, J. et al. | 1988
- 350
-
Carbonaceous overlayer and near-surface damage after pure CF4 reactive ion beam etching of silicon: Exposure dose effectsLejeune, C. / Grandchamp, J.P. / Gilles, J.P. / Collard, E. / Scheiblin, P. et al. | 1988
- 362
-
Fine structuring of magnetic and high-T c superconducting ceramic oxides in an HCI plasmaHeijman, M.G.J. et al. | 1988
- 373
-
Laser assisted diffusion in GaAs from thin evaporated layersGarcia, B.J. / Martinez, J. / Piqueras, J. / Castaño, J.L. / Fontaine, C. et al. | 1988
- 384
-
Optimazation of the parameters involved in the photochemical doping of Si with a pulsed ArF excimer laserFoulon, F. / Slaoui, A. / Fogarassy, E. / Stuck, R. / Fuchs, C. / Siffert, P. et al. | 1988
- 394
-
Laser doping of silicon role of the surface status in the incorporation mechanismBentini, G.G. / Bianconi, M. / Correra, L. / Nipoti, R. / Patti, D.A. / Gasparotto, A. et al. | 1988
- 400
-
Defect production during the fabrication of SOI by oxygen ion implantationBarklie, R.C. / Ennis, T.J. / Reeson, K. / Hemment, P.L.F. et al. | 1988
- 408
-
Titanium diffusion into LiNbO3 using excimer laser beamAl-Chalabi, S.A.M. / Goodall, F. et al. | 1988
- 413
-
Interstitial chromium behaviour in silicon during rapid thermal annealingZhu, J. / Barbier, D. / Mayet, L. / Gavand, M. / Chaussemy, G. et al. | 1988
- 421
-
Influence of DUV excimer laser radiation (λ = 193 nm) on CMOS devicesEden, K. / Beneking, H. / Roth, W. et al. | 1988
- 432
-
Microfocused ion beam applications in microelectronicsHarriott, L.R. et al. | 1988
- 443
-
Metal photodeposition and light-induced nucleationFlicstein, J. / Bourée, J.E. et al. | 1988
- 460
-
The structure of nanocrystalline silicon formed by laser-induced explosive crystallizationSinke, W.C. / Warabisako, T. / Miyao, M. / Tokuyama, T. / Roorda, S. et al. | 1988
- 471
-
Energy transfer and size effects by laser irradiation of solid (metallic) samples presenting surface periodical structures basic processes and applicationsUrsu, I. / Mihailescu, I.N. / Campean, Cālina-Diana / Prokhorov, A.M. / Konov, V.I. / Tokarev, V.N. et al. | 1988
- 485
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Sub-micron lithography techniquesLawes, Ronald A. et al. | 1988
- 500
-
Silicon carbide formation with e-beam and laser pulsesD'Anna, E. / Leggieri, G. / Luches, A. / Nassisi, V. / Perrone, A. / Majni, G. / Mengucci, P. et al. | 1988
- 511
-
Laser alloying of AuTe contacts on GaAsWuyts, K. / Van Grunderbesk, J. / Silverans, R.E. / Van Hove, M. / Van Rossum, M. et al. | 1988
- 520
-
Nitriding of bulk titanium and thin titanium films in a NH3 low pressure plasmaLaidani, N. / Perriere, J. / Lincot, D. / Gicquel, A. / Amouroux, J. et al. | 1988
- 530
-
Chemical reactivity of the gaseous species in a plasma discharge in air: An acid-base studyBrisset, J.L. / Doubla, A. / Amouroux, J. / Lelievre, J. / Goldmann, M. et al. | 1988
- 539
-
Laser and ion beam processing of conductive polyimideDavenas, J. et al. | 1988
- 545
-
Outdiffusion modelling of arsenic from As+ implanted crystalline p-type silicon during rapid thermal annealingKumar, S.N. / Chaussemy, G. / Cauut, B. / Barbier, D. / Laugier, A. et al. | 1988
- 554
-
Effect of rapid thermal processing on the intragrain properties of polysilicon as deduced from LBIC analysisMasri, K. / Boyeaux, J.P. / Kumar, S.N. / Mayet, L. / Chaussemy, G. / Laugier, A. et al. | 1988
- 564
-
Characteristics of electron traps in rapidly thermal annealed GaAs using a capping proximity techniqueMarrakchi, G. / Joly, J.F. / Vincent, F. / Chaussemy, G. / Laugier, A. / Guillot, G. et al. | 1988
- 572
-
Enhanced mobility in SOI films annealed by rapid thermal annealingAlmaggoussi, A. / Sicart, J. / Robert, J.L. / Joly, J.F. / Laugier, A. et al. | 1988
- 579
-
Generation and electrical characterization of thick SOI filmsTillack, B. / Banisch, R. / Richter, H.H. / Hoeppner, K. et al. | 1988
- 588
-
Rapid nucleation in pulsed laser heated amorphous SiRoorda, S. / Sinke, W.C. et al. | 1988
- 597
-
Combined CW laser and furnace annealing of amorphous Si and Ge in contact with some metalsCaune, S. / Marfaing, J. / Marine, W. et al. | 1988
- 605
-
Selective crystallization of silicon layers without seeding and capping layerStumpff, C. / Sigmund, H. et al. | 1988
- 614
-
Seed window defects in silicon on insulator materialWilliams, D.A. / McMahon, R.A. / Ahmed, H. et al. | 1988
- 623
-
Study of dashed seed lines and capping layers for laser seeded zone melting recrystallizationMermet, J.L. / Achard, H. / Bono, H. / Joly, J.P. et al. | 1988
- 632
-
Explosive crystallization phenomena in SOI structuresGeiler, H.D. / Glaser, E. / Andrä, G. / Wolff, D. / Götz, G. et al. | 1988
- 640
-
Excimer laser induced crystallization and oxidation of amorphous Cr thin filmsUrsu, I. / Birjega, M.I. / Dinescu, M. / Mihailescu, I.N. / Popescu-Pogrion, N. / Rubco, L. / Prokhorov, A.M. / Konov, V.I. / Tokarev, V.N. et al. | 1988
- 648
-
Electron bombardment applied to EPR polysilicon ribbon crystal growthM'Ghaieth, R. / Gauthier, R. / Pinard, P. et al. | 1988
- 654
-
Rapid electron beam induced tantalum-silicon reactionsRaman, V.K. / Mahmood, F. / McMahon, R.A. / Ahmed, H. / Jeynes, C. / Sarkar, D. et al. | 1988
- 664
-
Ablation of metal particles by surface plasmon excitation with laser lightHoheisel, W. / Schulte, U. / Vollmer, M. / Weidenauer, R. / Träger, F. et al. | 1988
- 673
-
Characterization of epitaxial silicon layers made by reduced pressure/temperature CVDRegolini, J.L. / Bensahel, D. / Scheid, E. / Perio, A. / Mercier, J. et al. | 1988
- 681
-
Author index| 1989
- 689
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Subject index| 1989
- CO2
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Editorial Board| 1989
- ix
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Conference organisation| 1989
- vii
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Preface| 1989
- x
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Supporting organisations and sponsors| 1989