Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS (Englisch)
- Neue Suche nach: Boudreault, G
- Neue Suche nach: Claudio, G
- Neue Suche nach: Jeynes, C
- Neue Suche nach: Low, R
- Neue Suche nach: Sealy, B.J
- Neue Suche nach: Boudreault, G
- Neue Suche nach: Claudio, G
- Neue Suche nach: Jeynes, C
- Neue Suche nach: Low, R
- Neue Suche nach: Sealy, B.J
In:
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
;
217
, 1
;
177-182
;
2003
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ISSN:
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Accurate calibration of the retained fluence from a versatile single wafer implanter using RBS
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Beteiligte:Boudreault, G ( Autor:in ) / Claudio, G ( Autor:in ) / Jeynes, C ( Autor:in ) / Low, R ( Autor:in ) / Sealy, B.J ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: Elsevier B.V.
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Erscheinungsdatum:17.09.2003
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Format / Umfang:6 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 217, Ausgabe 1
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Calendar| 2004
- CO2
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Editorial board| 2004