Role of polycation adsorption in poly-Si, SiO2 and Si3N4 removal during chemical mechanical polishing: Effect of polishing pad surface chemistry (Englisch)
- Neue Suche nach: Penta, Naresh K.
- Neue Suche nach: Matovu, John B.
- Neue Suche nach: Veera, P.R. Dandu
- Neue Suche nach: Krishnan, Sitaraman
- Neue Suche nach: Babu, S.V.
- Neue Suche nach: Penta, Naresh K.
- Neue Suche nach: Matovu, John B.
- Neue Suche nach: Veera, P.R. Dandu
- Neue Suche nach: Krishnan, Sitaraman
- Neue Suche nach: Babu, S.V.
In:
Colloids and Surfaces A: Physicochemical and Engineering Aspects
;
388
, 1-3
;
21-28
;
2011
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ISSN:
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Role of polycation adsorption in poly-Si, SiO2 and Si3N4 removal during chemical mechanical polishing: Effect of polishing pad surface chemistry
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Beteiligte:Penta, Naresh K. ( Autor:in ) / Matovu, John B. ( Autor:in ) / Veera, P.R. Dandu ( Autor:in ) / Krishnan, Sitaraman ( Autor:in ) / Babu, S.V. ( Autor:in )
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Erschienen in:Colloids and Surfaces A: Physicochemical and Engineering Aspects ; 388, 1-3 ; 21-28
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Verlag:
- Neue Suche nach: Elsevier B.V.
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Erscheinungsdatum:28.07.2011
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Format / Umfang:8 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
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Role of polycation adsorption in poly-Si, SiO2 and Si3N4 removal during chemical mechanical polishing: Effect of polishing pad surface chemistryPenta, Naresh K. / Matovu, John B. / Veera, P.R. Dandu / Krishnan, Sitaraman / Babu, S.V. et al. | 2011
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