Structural characterization of the interface structure of amorphous silicon thin films after post-deposition argon or hydrogen plasma treatment (Englisch)
- Neue Suche nach: Neumüller, Alex
- Neue Suche nach: Sergeev, Oleg
- Neue Suche nach: Vehse, Martin
- Neue Suche nach: Agert, Carsten
- Neue Suche nach: Neumüller, Alex
- Neue Suche nach: Sergeev, Oleg
- Neue Suche nach: Vehse, Martin
- Neue Suche nach: Agert, Carsten
In:
Applied Surface Science
;
403
;
200-205
;
2017
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ISSN:
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Structural characterization of the interface structure of amorphous silicon thin films after post-deposition argon or hydrogen plasma treatment
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Beteiligte:Neumüller, Alex ( Autor:in ) / Sergeev, Oleg ( Autor:in ) / Vehse, Martin ( Autor:in ) / Agert, Carsten ( Autor:in )
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Erschienen in:Applied Surface Science ; 403 ; 200-205
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Verlag:
- Neue Suche nach: Elsevier B.V.
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Erscheinungsdatum:18.01.2017
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Format / Umfang:6 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 403
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Editorial Board| 2017