FN-degradation of S-RCAT with different grain size and oxidation method (Englisch)
- Neue Suche nach: Park, Segeun
- Neue Suche nach: Kim, Ilgweon
- Neue Suche nach: Park, Yongjik
- Neue Suche nach: Choi, Joosun
- Neue Suche nach: Roh, Yonghan
- Neue Suche nach: Park, Segeun
- Neue Suche nach: Kim, Ilgweon
- Neue Suche nach: Park, Yongjik
- Neue Suche nach: Choi, Joosun
- Neue Suche nach: Roh, Yonghan
In:
Microelectronic Engineering
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119
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32-36
;
2014
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ISSN:
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:FN-degradation of S-RCAT with different grain size and oxidation method
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Beteiligte:Park, Segeun ( Autor:in ) / Kim, Ilgweon ( Autor:in ) / Park, Yongjik ( Autor:in ) / Choi, Joosun ( Autor:in ) / Roh, Yonghan ( Autor:in )
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Erschienen in:Microelectronic Engineering ; 119 ; 32-36
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Verlag:
- Neue Suche nach: Elsevier B.V.
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Erscheinungsdatum:01.01.2014
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Format / Umfang:5 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 119
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Author Index| 2014
- IFC
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Inside Front Cover - Editorial Board| 2014
- v
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Table of Contents| 2014
- vii
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EditorialSaito, Shinichi / Holmes, Andrew S. et al. | 2014