Controlling the shape and gap width of silicon electrodes using local anodic oxidation and anisotropic TMAH wet etching (Englisch)
Nationallizenz
- Neue Suche nach: Rouhi, Jalal
- Neue Suche nach: Mahmud, Shahrom
- Neue Suche nach: Hutagalung, Sabar Derita
- Neue Suche nach: Naderi, Nima
- Neue Suche nach: Kakooei, Saeid
- Neue Suche nach: Abdullah, Mat Johar
- Neue Suche nach: Rouhi, Jalal
- Neue Suche nach: Mahmud, Shahrom
- Neue Suche nach: Hutagalung, Sabar Derita
- Neue Suche nach: Naderi, Nima
- Neue Suche nach: Kakooei, Saeid
- Neue Suche nach: Abdullah, Mat Johar
In:
Semiconductor Science and Technology
;
27
, 6
;
2012
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Controlling the shape and gap width of silicon electrodes using local anodic oxidation and anisotropic TMAH wet etching
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Beteiligte:Rouhi, Jalal ( Autor:in ) / Mahmud, Shahrom ( Autor:in ) / Hutagalung, Sabar Derita ( Autor:in ) / Naderi, Nima ( Autor:in ) / Kakooei, Saeid ( Autor:in ) / Abdullah, Mat Johar ( Autor:in )
-
Erschienen in:
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Verlag:
- Neue Suche nach: IOP Publishing
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Erscheinungsdatum:13.06.2012
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Format / Umfang:11 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 27, Ausgabe 6
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