Fabrication of uniform and high resolution copper nanowire using intermediate self-assembled monolayers through direct AFM lithography (Englisch)
Nationallizenz
Paper
- Neue Suche nach: G Kwon
- Neue Suche nach: H Chu
- Neue Suche nach: J Yoo
- Neue Suche nach: H Kim
- Neue Suche nach: C Han
- Neue Suche nach: C Chung
- Neue Suche nach: J Lee
- Neue Suche nach: H Lee
- Neue Suche nach: G Kwon
- Neue Suche nach: H Chu
- Neue Suche nach: J Yoo
- Neue Suche nach: H Kim
- Neue Suche nach: C Han
- Neue Suche nach: C Chung
- Neue Suche nach: J Lee
- Neue Suche nach: H Lee
In:
Nanotechnology
;
23
, 18
;
185307
;
2012
-
ISSN:
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Fabrication of uniform and high resolution copper nanowire using intermediate self-assembled monolayers through direct AFM lithography
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Untertitel:Paper
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Weitere Titelangaben:Fabrication of uniform and high resolution copper nanowire using intermediate self-assembled monolayers through direct AFM lithography
-
Beteiligte:
-
Erschienen in:Nanotechnology ; 23, 18 ; 185307
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Verlag:
- Neue Suche nach: Institute of Physics
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Erscheinungsdatum:11.05.2012
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Format / Umfang:6 pages
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ISSN:
-
DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
-
Datenquelle:
Inhaltsverzeichnis – Band 23, Ausgabe 18
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