Summary of the 25th International Conference on Phenomena in Ionized Gases (Englisch)
Nationallizenz
- Neue Suche nach: Toshio Goto
- Neue Suche nach: Masashi Kando
- Neue Suche nach: Toshio Goto
- Neue Suche nach: Masashi Kando
In:
Plasma Sources Science and Technology
;
11
, 3A
;
2002
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ISSN:
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Summary of the 25th International Conference on Phenomena in Ionized Gases
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Beteiligte:Toshio Goto ( Autor:in ) / Masashi Kando ( Autor:in )
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Erschienen in:
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Verlag:
- Neue Suche nach: Institute of Physics
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Erscheinungsdatum:01.08.2002
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Datenquelle:
Inhaltsverzeichnis – Band 11, Ausgabe 3A
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Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- A1
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Industrial innovation based on fundamental physics*Ulrich Kogelschatz et al. | 2002
- A7
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Elementary processes and kinetics of H2 plasmas for different technological applicationsM Capitelli / R Celiberto / F Esposito / A Laricchiuta / K Hassouni / S Longo et al. | 2002
- A26
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Optical plasma emission spectroscopy of etching plasmas used in Si-based semiconductor processingV M Donnelly / M V Malyshev / M Schabel / A Kornblit / W Tai / I P Herman / N C M Fuller et al. | 2002
- A31
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Electronegative plasmas—why are they so different?R N Franklin et al. | 2002
- A38
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Liquid and crystal dust structures in low temperature plasmasAnatoly P Nefedov et al. | 2002
- A42
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Generation and characteristics of detached recombining plasma and its dynamic behaviour—a bridge between fusion plasmas and low-temperature ionized gasesS Takamura / N Ohno / D Nishijima / Y Uesugi et al. | 2002
- A49
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Theory and modelling of arc cathodesM S Benilov et al. | 2002
- A55
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Physics of mercury-free high-pressure discharge lampsM Born et al. | 2002
- A64
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Capillary discharge sources of hard UV radiationC Cachoncinlle / R Dussart / E Robert / S Götze / J Pons / S R Mohanty / R Viladrosa / C Fleurier / J M Pouvesle et al. | 2002
- A69
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Resonant phenomena of hydromagnetic waves in non-uniform space plasmasV M Cadez / J De Keyser / M Roth et al. | 2002
- A74
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Low-pressure plasma sources for etching and depositionM J Cooke / G Hassall et al. | 2002
- A80
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The plasma–wall interaction region: a key low temperature plasma for controlled fusionG F Counsell et al. | 2002
- A86
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Swarm studies on elementary processes and ion–molecule reactions in low-temperature plasmasJ de Urquijo et al. | 2002
- A95
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Line shape study of neutral argon lines in plasma of an atmospheric pressure wall stabilized argon arcS Djurović / D Nikolić / Z Mijatović / R Kobilarov / N Konjević et al. | 2002
- A100
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Plasma expansion: fundamentals and applicationsR Engeln / S Mazouffre / P Vankan / I Bakker / D C Schram et al. | 2002
- A105
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On the interplay between plasma ions, radicals and surfaces: who dominates the interaction?Ellen R Fisher et al. | 2002
- A113
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Structure and dynamics of the Earth's polar ionosphere: recent results inferred from incoherent scatter soundersDominique Fontaine et al. | 2002
- A120
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Helicon sources with m = 1 and m = 2 helical antenna coupling*M Krämer / B Lorenz / B Clarenbach et al. | 2002
- A131
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Energy loss of MeV/n heavy ions in dense hydrogen plasmasG Maynard / C Deutsch / D Gardès / M Chabot et al. | 2002
- A138
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Spatial distribution of turbulence in the Wendelstein 7-AS stellaratorN P Basse / P K Michelsen / S Zoletnik / M Saffman / M Endler / M Hirsch et al. | 2002
- A143
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Laser Thomson scattering studies of glow discharge plasmasK Muraoka / K Uchino / Y Yamagata / Y Noguchi / M Mansour / P Suanpoot / S Narishige / M Noguchi et al. | 2002
- A150
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Reactive molecular plasmasA Ricard / V Monna et al. | 2002
- A154
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3D kinetic simulation of super-intense laser-induced anomalous transportH Ruhl et al. | 2002
- A159
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Some plasma environmental technologies developed in RussiaPh G Rutberg et al. | 2002
- A166
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VUV to UV laser spectroscopy of atomic species in processing plasmasKunihide Tachibana et al. | 2002
- A173
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Investigations of ion emission from plasma produced by high-power 1-ps laser pulseJ Wołowski / J Badziak / J Krása / L Láska / P Parys / K Rohlena / E Woryna et al. | 2002
- A178
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Production and control of planar microwave plasmas for materials processingIvan P Ganachev / Hideo Sugai et al. | 2002
- A191
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Controlling surfaces in plasma processing: role of ions via molecular dynamics simulations of surface chemistryDavid Humbird / David B Graves et al. | 2002
- A196
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Non-thermal plasma application to the abatement of noxious emissions in automotive exhaust gasesThomas Hammer et al. | 2002
- A202
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Mechanism of highly selective SiO2 contact hole etchingMiyako Matsui / Tetsuya Tatsumi / Makoto Sekine et al. | 2002
- A206
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Glow discharge processing in the liquid crystal display industryJacques Schmitt / Mustapha Elyaakoubi / Laurent Sansonnens et al. | 2002
- A211
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Industrial developments of scientific insights in dusty plasmasLaïfa Boufendi / André Bouchoule et al. | 2002
- A219
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Progress in the study of dusty plasmasD A Mendis et al. | 2002
- A229
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Nucleation and subsequent growth of clusters in reactive plasmasYukio Watanabe / Masaharu Shiratani / Kazunori Koga et al. | 2002
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Summary of the 25th International Conference on Phenomena in Ionized GasesToshio Goto / Masashi Kando et al. | 2002