Demonstration of a ring-FEL as an EUV lithography tool (Englisch)
- Neue Suche nach: Lee, Jaeyu
- Neue Suche nach: Jang, G.
- Neue Suche nach: Kim, J.
- Neue Suche nach: Oh, B.
- Neue Suche nach: Kim, D. E.
- Neue Suche nach: Lee, S.
- Neue Suche nach: Kim, J. H.
- Neue Suche nach: Ko, J.
- Neue Suche nach: Min, C.
- Neue Suche nach: Shin, S.
- Neue Suche nach: Lee, Jaeyu
- Neue Suche nach: Jang, G.
- Neue Suche nach: Kim, J.
- Neue Suche nach: Oh, B.
- Neue Suche nach: Kim, D. E.
- Neue Suche nach: Lee, S.
- Neue Suche nach: Kim, J. H.
- Neue Suche nach: Ko, J.
- Neue Suche nach: Min, C.
- Neue Suche nach: Shin, S.
In:
JOURNAL OF SYNCHROTRON RADIATION
;
27
, Pt 4
;
864-869
;
2020
-
ISSN:
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Demonstration of a ring-FEL as an EUV lithography tool
-
Beteiligte:Lee, Jaeyu ( Autor:in ) / Jang, G. ( Autor:in ) / Kim, J. ( Autor:in ) / Oh, B. ( Autor:in ) / Kim, D. E. ( Autor:in ) / Lee, S. ( Autor:in ) / Kim, J. H. ( Autor:in ) / Ko, J. ( Autor:in ) / Min, C. ( Autor:in ) / Shin, S. ( Autor:in )
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Erschienen in:JOURNAL OF SYNCHROTRON RADIATION ; 27, Pt 4 ; 864-869
-
Verlag:
- Neue Suche nach: International Union of Crystallography
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Erscheinungsdatum:20.05.2020
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Format / Umfang:6 pages
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ISSN:
-
DOI:
-
Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
-
Datenquelle:
Inhaltsverzeichnis – Band 27, Ausgabe Pt 4
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