High rate reactive dc magnetron sputter deposition of Al2O3 films (Englisch)
- Neue Suche nach: Kharrazi Olsson, M.
- Neue Suche nach: Kharrazi Olsson, M.
- Neue Suche nach: Macák, K.
- Neue Suche nach: Helmersson, U.
- Neue Suche nach: Hjörvarsson, B.
In:
Journal of vacuum science and technology / A
;
16
, 2
; 639-643
;
1998
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:High rate reactive dc magnetron sputter deposition of Al2O3 films
-
Beteiligte:
-
Erschienen in:Journal of vacuum science and technology / A ; 16, 2 ; 639-643
-
Verlag:
- Neue Suche nach: Inst.
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Erscheinungsort:New York, NY
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Erscheinungsdatum:1998
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ISSN:
-
ZDBID:
-
Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 52.78 / 33.09
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 770/3422
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 16, Ausgabe 2
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CUMULATIVE AUTHOR INDEX| 1998