C---N-MeN nanocomposite coatings, deposition and testing of performance (Unbekannt)
- Neue Suche nach: Sobota, J.
- Neue Suche nach: Sobota, J.
- Neue Suche nach: Sorensen, G.
- Neue Suche nach: Jensen, H.
- Neue Suche nach: Bochnicek, Z.
- Neue Suche nach: Holy, V.
In:
Surface & coatings technology
;
142
; 590-595
;
2001
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:C---N-MeN nanocomposite coatings, deposition and testing of performance
-
Beteiligte:
-
Erschienen in:Surface & coatings technology ; 142 ; 590-595
-
Verlag:
- Neue Suche nach: Elsevier Sequoia
-
Erscheinungsort:Lausanne
-
Erscheinungsdatum:2001
-
ISSN:
-
ZDBID:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Print
-
Sprache:Unbekannt
- Neue Suche nach: 52.78 / 51.20 / 51.20 / 52.78
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 645/5255
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 142
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 1
-
Process control for plasma processing of polymersFavia, P. et al. | 2001
- 7
-
The filtered arc process and materials depositionMartin, P.J. et al. | 2001
- 11
-
A unique ECR broad beam source for thin film processingZeuner, Michael et al. | 2001
- 21
-
Radio frequency hollow cathode jet: optical emission studyKorzec, D. et al. | 2001
- 28
-
Microwave plasma characteristics of a circulating fluidized bed-plasma reactor for coating of powdersKarches, Martin et al. | 2001
- 34
-
Effect of plasma inhomogeneity on grid performanceTartz, M. et al. | 2001
- 39
-
Optimisation and characterisation of a TCP type RF broad beam ion sourceZeuner, Michael et al. | 2001
- 49
-
Experimental studies of current sheet structure in IPD coaxial acceleratorRabinski, Marek et al. | 2001
- 52
-
Characteristics of VHF-excited SiH4 plasmas using a ladder-shaped electrodeTakeuchi, Yoshiaki et al. | 2001
- 56
-
Laser assisted aluminum foamingKathuria, Y.P. et al. | 2001
- 61
-
Filtered arc deposition and implantation of aluminium nitrideManova, D. et al. | 2001
- 67
-
Advantages of using self-lubricating, hard, wear-resistant MoS2-based coatingsRenevier, N.M. et al. | 2001
- 78
-
Microstructure and mechanical-thermal properties of Cr-N coatings deposited by reactive unbalanced magnetron sputteringMayrhofer, P.H. et al. | 2001
- 85
-
Tribological properties and wear mechanism of sputtered C-Cr coatingYang, S. et al. | 2001
- 94
-
Influence of CrxNy coatings deposited by magnetron sputtering on tool service life in wood processingNouveau, C. et al. | 2001
- 102
-
Thin hard coatings stress-strain curve determination through a FEM supported evaluation of nanoindentation test resultsBouzakis, K.-D. et al. | 2001
- 110
-
Elastic properties of (Ti,Al,Si)N nanocomposite filmsCarvalho, S. et al. | 2001
- 117
-
Fatigue properties of Ti-based hard coatings deposited onto tool steelsStoiber, M. et al. | 2001
- 125
-
Ab-initio calculation of elastic constants of TiNZhang, M. et al. | 2001
- 132
-
Tribological characterisation of hard coatings on steelRother, B. et al. | 2001
- 137
-
Characteristic curves of voltage and current, phase generation and properties of tungsten- and vanadium-oxides deposited by reactive d.c.-MSIP-PVD-process for self-lubricating applicationsLugscheider, E. et al. | 2001
- 143
-
Practice vs. laboratory tests for plastic injection mouldingVan Stappen, M. et al. | 2001
- 146
-
Magnetron sputtered Cr---Ni---N and Ti---Mo---N films: comparison of mechanical propertiesRegent, F. et al. | 2001
- 152
-
Surface modified tool fabricated by radical nitridingSakamoto, Yukihiro et al. | 2001
- 156
-
Glow discharge vapour deposition polymerisation of polyimide thin coatingsMaggioni, Gianluigi et al. | 2001
- 163
-
RF plasma deposition of SiO2-like films: plasma phase diagnostics and gas barrier film properties optimisationCreatore, Mariadriana et al. | 2001
- 169
-
Rapid surface modification of polyethylene in microwave and r.f.-plasmas: comparative studyAumann, T. et al. | 2001
- 175
-
Optical and electrical properties of sputtered Ag films on PET websCharton, C. et al. | 2001
- 181
-
Plasma polymerized barrier films on membranes for direct methanol fuel cellsFeichtinger, J. et al. | 2001
- 187
-
Correlation between the gas composition and the stoichiometry of SnOx films prepared by DC magnetron reactive sputteringSnyders, R. et al. | 2001
- 192
-
Modeling the stability of reactive sputtering processesBartzsch, H. et al. | 2001
- 201
-
Control of structure in magnetron sputtered thin filmsPoláková, H. et al. | 2001
- 206
-
Influence of two reactive gases on the instabilities of the reactive sputtering processRousselot, Christophe et al. | 2001
- 211
-
Colorimetric properties of ZrN and TiN coatings prepared by DC reactive sputteringNose, M. et al. | 2001
- 218
-
Main features of magnetron sputtered aluminium-transition metal alloy coatingsSanchette, F. et al. | 2001
- 225
-
Plasma-carburising - a surface heat treatment process for the new centuryEdenhofer, B. et al. | 2001
- 235
-
Surface modification of aluminum using ion nitriding and fluidized bedOkumiya, Masahiro et al. | 2001
- 241
-
Plasma assisted nitriding of Inconel 690Leroy, C. et al. | 2001
- 248
-
Plasma-assisted boriding of pure titanium and TiAl6V4Kaestner, P. et al. | 2001
- 253
-
Pd-Ag membranes on porous alumina substrates by unbalanced magnetron sputteringO'Brien, J. et al. | 2001
- 260
-
Characterization of a-phase aluminum oxide films deposited by filtered vacuum arcYamada-Takamura, Y. et al. | 2001
- 265
-
Thermal plasma deposition of nanophase hard coatingsHeberlein, J. et al. | 2001
- 272
-
Atmospheric pressure plasma processing with microstructure electrodes and microplanar reactorsSchlemm, H. et al. | 2001
- 277
-
Wear resistance of plasma sprayed Al-Si binary alloy coatings on A6063 Al alloy substrateNakata, Kazuhiro et al. | 2001
- 283
-
Creep behaviour prediction and optimum design of plasma sprayed coatings with intermediate bonding layerBouzakis, K.-D. et al. | 2001
- 290
-
Generation of a highly uniform and large area corona discharge source adaptable to surface treatmentSugawara, M. et al. | 2001
- 293
-
Electric heating using a liquid electrodeTyurin, Yu N. et al. | 2001
- 300
-
Application of medium frequency atmospheric plasma on continuous aluminum wire cleaning for magnet wire manufacturingChoi, In S. et al. | 2001
- 306
-
Fundamentals and applications of late post-discharge processesBelmonte, T. et al. | 2001
- 314
-
Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristicsThomas, L. et al. | 2001
- 321
-
Plasma diagnostics of pulsed d.c. glow discharge combined with ICP for deep nitriding processKim, Yoon-Kee et al. | 2001
- 328
-
NIR laser diode and FTIR based process control for industrial CVD reactorsHopfe, V. et al. | 2001
- 333
-
Excited species in H2, N2, O2 microwave flowing discharges and post-dischargesRicard, A. et al. | 2001
- 337
-
Space and time resolved Langmuir probe measurements in a 100 kHz pulsed rectangular magnetron systemBradley, J.W. et al. | 2001
- 342
-
Deposition of a-C:H films with an ECWR-reactor at 27 MHz: plasma diagnostics and film propertiesAwakowicz, P. et al. | 2001
- 348
-
Energy resolved ion mass spectroscopy of the plasma during reactive magnetron sputteringMisina, Martin et al. | 2001
- 355
-
Measurements of negative ion density in O2-Ar electron cyclotron resonance plasmaShindo, M. et al. | 2001
- 360
-
The growth process and optical emission spectroscopy of amorphous silicon carbide films from methyltrichlorosilane by rf plasma enhanced CVDKaneko, Tsutomu et al. | 2001
- 365
-
Control of plasma nitriding using oxygen probesReinhold, B. et al. | 2001
- 371
-
Synthesis of metal nitrides by low-energy ion assisted film growthRauschenbach, Bernd et al. | 2001
- 376
-
The effect of HV in the nitriding of ferritic steels by plasma immersion ion implantationBlawert, C. et al. | 2001
- 384
-
A new thermally assisted, plasma based, ionic implantation system of treatment and deposition.Marot, L. et al. | 2001
- 388
-
Generation of triggerless silicon shunting plasma and ion extractionYukimura, Ken et al. | 2001
- 392
-
Effects of rare earth additions on nitriding of EN40B by plasma immersion ion implantationCleugh, D. et al. | 2001
- 397
-
Ion beam assisted pulsed laser deposition of epitaxial aluminum nitride thin films on sapphire substratesSix, S. et al. | 2001
- 402
-
Effects of plasma ion implantation from cathodic arc plasmasRother, B. et al. | 2001
- 406
-
Plasma immersion N and N+C implantation into high-speed tool steel: surface morphology, phase composition and mechanical propertiesUglov, V.V. et al. | 2001
- 412
-
Interface properties of TiO2 on Si formed by simultaneous implantation and deposition of titanium and oxygen ionsAttenberger, W. et al. | 2001
- 418
-
Optical characterization of TiN produced by metal-plasma immersion ion implantationHuber, P. et al. | 2001
- 424
-
Dynamics of pulsed d.c. discharges used for PACVD - effect of additional high voltage pulsesKugler, C. et al. | 2001
- 429
-
Analysis of focused ion beam implantation of semiconductors by thermal microscopyDietzel, D. et al. | 2001
- 437
-
On plasma processing of polymers and the stability of the surface properties for enhanced adhesion to metalsArefi-Khonsari, F. et al. | 2001
- 449
-
Plasma modification of polycarbonatesZajicková, L. et al. | 2001
- 455
-
Surface modification of polyimide using dielectric barrier discharge treatmentSeeböck, R. et al. | 2001
- 460
-
Plasma polymers with chemically defined structures in contact with metalsFriedrich, J.F. et al. | 2001
- 468
-
Anti-reflective coating for the deep coloring of PET fabrics using an atmospheric pressure plasma techniqueLee, Hae-Ryong et al. | 2001
- 474
-
Application of atmospheric pressure dielectric barrier discharges in deposition, cleaning and activationGoossens, O. et al. | 2001
- 482
-
Influence of ion-beam induced chemical and structural modification in polymers on moisture uptakeGuenther, M. et al. | 2001
- 489
-
Penetration of plasma effects into textile structuresPoll, H.U. et al. | 2001
- 494
-
Homofunctionalized polymer surfaces formed by selective plasma processesKühn, G. et al. | 2001
- 501
-
Short-time plasma pre-treatment of polytetrafluoroethylene for improved adhesionBaumgärtner, K.-M. et al. | 2001
- 507
-
Surface modification of PMMA by DC glow discharge and microwave plasma treatment for the improvement of coating adhesionSchulz, Ulrike et al. | 2001
- 512
-
Atmospheric pressure DC glow discharge for polymer surface treatmentKröpke, St et al. | 2001
- 517
-
Current progress in the modeling of weakly ionized plasmas in contact with electrodes and insulated wallsUhrlandt, D. et al. | 2001
- 526
-
Fluid dynamic modelling and experimental diagnostics of an inductive high density plasma source (ICP)Scheubert, P. et al. | 2001
- 531
-
Modelling inductively coupled plasmas: a sensitivity study on plasma chemistry and surface chemistryNold, M. et al. | 2001
- 536
-
Sensitivity studies for volume averaged models of plasma etch reactorsKleditzsch, S. et al. | 2001
- 540
-
Investigation into nitrogen-inert gas interactions in d.c. diode glow dischargesWilson, A.D. et al. | 2001
- 546
-
Production of low electron temperature ECR plasma for thin film depositionItagaki, Naho et al. | 2001
- 551
-
Oxidation behaviour of functionally gradient coatings including different composition of cermetsDemirkiran, A.S. et al. | 2001
- 557
-
Magnetron sputtering of hard nanocomposite coatings and their propertiesMusil, J. et al. | 2001
- 567
-
Structural variations in CrN-NbN superlatticesCameron, D.C. et al. | 2001
- 573
-
Physical-mechanical and physical-chemical properties of thin nanostructured boride-nitride filmsAndrievski, Rostislav A. et al. | 2001
- 579
-
Ti-TiN multilayer coatings: deposition technique, characterization and mechanical propertiesDück, A. et al. | 2001
- 585
-
Formation of metal matrix composite layer on aluminum alloy with TiC-Cu powder by laser surface alloying processTomida, S. et al. | 2001
- 590
-
C---N-MeN nanocomposite coatings, deposition and testing of performanceSobota, J. et al. | 2001
- 596
-
The effect of Al composition on the microstructure and mechanical properties of WC-TiAlN superhard composite coatingYoon, J.S. et al. | 2001
- 603
-
Hard and superhard nanocomposite Al-Cu-N films prepared by magnetron sputteringMusil, J. et al. | 2001
- 610
-
Effect of coated edge geometry on internal stress distribution in multilayered coatingsKubart, T. et al. | 2001
- 615
-
Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing techniqueMartin, N. et al. | 2001
- 621
-
Characterisation studies of the pulsed dual cathode magnetron sputtering process for oxide filmsO'Brien, J. et al. | 2001
- 628
-
A versatile coating tool for reactive in-line sputtering in different pulse modesFrach, P. et al. | 2001
- 635
-
Substrate effects during mid-frequency pulsed DC biasingKelly, P.J. et al. | 2001
- 642
-
A composition spread approach to the optimization of (Ti,Al)N hard coatings deposited by DC and bipolar pulsed magnetron sputteringCremer, R. et al. | 2001
- 649
-
Deposition of SiO2 films from different organosilicon-O2 plasmas under continuous wave and pulsed modesBapin, E. et al. | 2001
- 655
-
Deposition rate and thickness uniformity of thin films deposited by a pulsed cathodic arc processFuchs, H. et al. | 2001
- 661
-
Comparison of radio frequency and pulsed-d.c. plasma CVD of Ti---C---N---H and Zr---C---N---H layers at low temperatureWöhle, J. et al. | 2001
- 665
-
Influence of the pulsing of the current of a vacuum arc on rate and dropletsBüschel, M. et al. | 2001
- 669
-
Abrasion resistant low friction diamond-like multilayersDekempeneer, E. et al. | 2001
- 674
-
Wear mechanisms of diamond-coated toolsDeuerler, Friederike et al. | 2001
- 681
-
CNx coatings deposited by pulsed RF supersonic plasma jet: hardness, nitrogenation and optical propertiesHubicka, Z. et al. | 2001
- 688
-
The effect of d.c. substrate bias on the properties of nitrogen-rich CNx filmsPopov, C. et al. | 2001
- 693
-
Diamond-like carbon film deposition by a 13.56 MHz hollow cathode RF-RF system using different precursor gasesFedosenko, G. et al. | 2001
- 698
-
The preparation of (001) textured diamond films with large areasGu, Changzhi et al. | 2001
- 702
-
Degradation and stress evolution in a-C, a-C:H and Ti-C:H filmsKulikovsky, V. et al. | 2001
- 707
-
Properties and characterization of multilayers of carbides and diamond-like carbonStrondl, C. et al. | 2001
- 714
-
Field emission properties of amorphous carbon nitride thin films prepared by arc ion platingSugimura, Hiroyuki et al. | 2001
- 719
-
Nanoindentation studies on amorphous carbon nitride thin films prepared by shielded arc ion platingTakai, Osamu et al. | 2001
- 724
-
The effects of substrate rotation on thermal plasma chemical vapor deposition of diamondAsmann, M. et al. | 2001
- 733
-
Properties of tungsten coatings deposited onto fine grain graphite by different methodsMaier, H. et al. | 2001
- 738
-
Quantitative measurement for the effect of enhanced nucleation on the adhesive strength of diamond coatingsKamiya, Shoji et al. | 2001
- 743
-
Luminescence of plasma-treated polymer surfaces at ambient temperatureDuran, Maxime et al. | 2001
- 748
-
Reactive magnetron sputtering of tin-doped indium oxide (ITO): influence of argon pressure and plasma excitation modeMientus, R. et al. | 2001
- 755
-
The influence on surface free energy of PVD-coatingsLugscheider, E. et al. | 2001
- 761
-
Surface cleaning and passivation of an iron foil by a nitrogen post-discharge surface treatmentMézerette, D. et al. | 2001
- 767
-
Glass substrate cleaning using a low energy ion sourceOchs, D. et al. | 2001
- 771
-
Surface passivation of silicon with the PlasmodulSchulz, A. / Baumgartner, K. M. / Feichtinger, J. / Walker, M. / Schumacher, U. / Eike, A. / Herz, K. / Kessler, F. et al. | 2001
- 771
-
Surface passivation of silicon with the Plasmodul(R)Schulz, A. et al. | 2001
- 776
-
Characterization of transparent conductive ITO thin films deposited on titanium dioxide film by a sol-gel processAlam, M.J. et al. | 2001
- 781
-
ITO-film gas sensor for measuring photodecomposition of NO2 gasSako, T. et al. | 2001
- 786
-
Low-temperature ICPECVD of silicon nitride in SiH4-NH3-Ar discharges analyzed by spectroscopic ellipsometry and etch behavior in KOH and BHFWolf, R. et al. | 2001
- 792
-
Plasma-deposited hydrogenated carbon-germanium semiconducting films doped with acceptor and donor centersTyczkowski, J. et al. | 2001
- 797
-
Variation of etch profile and surface properties during patterning of silicon substratesRichter, K. et al. | 2001
- 803
-
Plasma treatment for fluxless solderingDeltschew, R. et al. | 2001
- 808
-
Low-temperature PECVD-deposited silicon nitride thin films for sensor applicationsSuchaneck, G. et al. | 2001
- 813
-
Deposition of solder for micro-joining on M.E.M.S. components by means of magnetron sputteringLugscheider, E. et al. | 2001
- 817
-
Low temperature epitaxial growth of metal carbides using fullerenesJansson, U. et al. | 2001
- 823
-
Deposition of TiN, TiC and Ti1-xAlxN coatings by pulsed d.c. plasma enhanced chemical vapour deposition methodsTäschner, Ch et al. | 2001
- 829
-
Ion bombardment and temperature effects on the microstructure of RF plasma chemical vapor-deposited SiC:HThomas, L. et al. | 2001
- 835
-
Properties of PECVD-deposited thermal barrier coatingsPréauchat, Boris et al. | 2001
- 843
-
Amorphous semiconductor and amorphous insulator - two kinds of hydrogenated carbon-silicon films fabricated in the three-electrode reactorTyczkowski, J. et al. | 2001
- 849
-
Deposition rate and three-dimensional uniformity of RF plasma deposited SiOx filmsHegemann, D. et al. | 2001
- 856
-
Room temperature synthesis of SiO2 thin films by ion beam induced and plasma enhanced CVDBarranco, A. et al. | 2001
- 861
-
Stress measurements in thermal loaded (Ti,Al)N hard coatingsGöbel, Th et al. | 2001
- 868
-
In-situ stress diagnosticsFukarek, W. et al. | 2001
- 874
-
Synthesis of carbon nitride films by high-density helicon wave-excited plasma sputteringSetsuhara, Y. et al. | 2001
- 881
-
Structural features of thick c-boron nitride coatings deposited via a graded B-C-N interlayerYamamoto, K. et al. | 2001
- 889
-
Nitrogen incorporation into boron carbide films deposited by dc-magnetron sputtering: film microstructure and tribological propertiesReigada, D.C. et al. | 2001
- 894
-
Transparent BCN coatings by RF PACVD at low temperature using metallo-organic precursorsAhn, H. et al. | 2001
- 899
-
Dynamic stress investigations for cubic boron nitride films deposited by triode sputtering techniqueDjouadi, M.A. et al. | 2001
- 906
-
Structural and electrical properties of sputtered titanium boronitride filmsPierson, J.F. et al. | 2001
- 911
-
Molecular dynamics study of the role of ion bombardment in cubic boron nitride thin film depositionKoga, H. et al. | 2001
- 916
-
High performance computing of coating-substrate systemsLeopold, Jürgen et al. | 2001
- 923
-
Atomistic simulation of surface evolution during PVD coating processesLugscheider, E. et al. | 2001
- 928
-
Improvement in the load-bearing capacity and adhesion of TiC coatings on TiAl6V4 by duplex treatmentKaestner, P. et al. | 2001
- 934
-
A model for calculating the thickness profile of TiB2 and Al multilayer coatings produced by planar magnetron sputteringSilva, M.Fátima Vales et al. | 2001
- 939
-
A new linearly extended bifocal microwave plasma deviceKaiser, M. et al. | 2001
- 943
-
Effects of plasma non-homogeneity on the physical properties of sputtered thin filmsRigato, V. et al. | 2001
- 950
-
Use of the finite element technique to analyze the influence of coating materials, material phase state and the purity on the level of the developed thermal stresses in plasma coating systems under thermal loading conditionsUcar, V. et al. | 2001
- 954
-
The effects of Si addition on the structure and mechanical properties of ZrN thin films deposited by an r.f. reactive sputtering methodMae, T. et al. | 2001
- 959
-
Heat and mass transfer phenomenon from an oxygen plasma to a semiconductor surfaceGuyon, C. et al. | 2001
- 964
-
How is the chemical bonding of W-Si-N sputtered coatings?Louro, C. et al. | 2001
- 971
-
Wear and corrosion properties of (Ti1-xCrx)N coatings produced by the ion-plating methodLee, K.H. et al. | 2001
- 978
-
Structural investigation and wear resistance of submicron TiN coatings obtained by a hybrid plasma immersion ion implantation processGünzel, R. et al. | 2001
- 984
-
The influence of the addition of C and N on the wear behaviour of W-S-C-N coatingsNossa, A. et al. | 2001
- 992
-
Chemical bonding in magnetron sputtered TiNx coatings and its relation to diamond turnabilityKohlscheen, J. et al. | 2001
- 999
-
The properties of (Ti,Al)N coatings deposited by inductively coupled plasma assisted d.c. magnetron sputteringPark, H.S. et al. | 2001
- 1005
-
Optimization of plasma-assisted chemical vapour deposition hard coatings for their application in aluminium die-castingMitterer, C. et al. | 2001
- 1012
-
A comparative study of microstructure and mechanical properties for CrNx films with various deposition rates by magnetron sputteringNam, Kyung H. et al. | 2001
- 1017
-
Tribological properties of sputtered CrN coatings under dry sliding oscillation motion at elevated temperaturesScheerer, H. et al. | 2001
- 1023
-
Parametric effects of residual stress in pulsed d.c. plasma enhanced CVD TiN coatingsMa, S. et al. | 2001
- 1028
-
Ion nitriding of Al: growth kinetics and characterisation of the nitride layerTelbizova, T. et al. | 2001
- 1034
-
Effect of substrate temperature on the physical properties of copper nitride films by r.f. reactive sputteringGhosh, S. et al. | 2001
- 1040
-
Nitrogen transport mechanisms in low temperature ion nitridingSokolowska, A. et al. | 2001
- 1046
-
Plasma immersion ion implantation treatment of medical implantsMändl, S. et al. | 2001
- 1051
-
Adsorption of protein on plasma-polysiloxane layers of different surface energiesJanocha, B. et al. | 2001
- 1056
-
Wear reduction effect on ultra-high-molecular-weight polyethylene by application of hard coatings and ion implantation on cobalt chromium alloy, as measured in a knee wear simulation machineOñate, J.I. et al. | 2001
- 1063
-
Investigation of low-reflective ZrCN-PVD-arc coatings for application on medical tools for minimally invasive surgeryHollstein, F. et al. | 2001
- 1069
-
Plasma treatment - an increasing technology for paper restoration?Vohrer, U. et al. | 2001
- 1074
-
Low pressure plasma treatments inside a closed packageHolländer, A. et al. | 2001
- 1078
-
Wear and corrosion protection of 316-L femoral implants by deposition of thin filmsHübler, R. et al. | 2001
- 1084
-
Repassivating tantalum-tantalum oxide surface modification on stainless steel implantsMacionczyk, F. et al. | 2001
- 1088
-
In situ electrical transport measurements and self-organization in gold nanoparticle films during and after depositionKish, L.B. et al. | 2001
- 1094
-
In situ investigation by energy dispersive X-ray diffraction (EDXRD) of the growth of magnetron sputtered ITO filmsEllmer, K. et al. | 2001
- 1100
-
X-Ray diffraction characterization of pre-treated cemented carbides for optimizing adhesion strength of sputtered hard coatingsTönshoff, H.K. et al. | 2001
- 1105
-
In situ film diagnostics during plasma polymerisation using waveguide mode spectroscopyJacobsen, V. et al. | 2001
- 1109
-
Thermal fatigue resistance of plasma duplex-treated tool steelPellizzari, M. et al. | 2001
- 1116
-
Plasma duplex treatment of stellitePfohl, C. et al. | 2001
- 1121
-
Chemical structure and morphology of thin, organo-silicon plasma-polymer films as a function of process parametersShirtcliffe, Neil et al. | 2001
- 1129
-
Duplex surface treatments combining plasma electrolytic nitrocarburising and plasma-immersion ion-assisted depositionYerokhin, A.L. et al. | 2001
- 1137
-
Micro-abrasive wear of PVD duplex and single-layered coatingsBatista, J.C.A. et al. | 2001
- 1144
-
The use of preliminary ion implantation and heating on the substrate for modifying TiN coating properties and TiN-substrate interfaceSolodukhin, I.A. et al. | 2001
- 1148
-
Improvement of hot-working processes with PVD coatings and duplex treatmentNavinsek, B. et al. | 2001
- 1155
-
Author Index of Volume 142-144| 2001
- 1158
-
Subject Index of Volume 142-144| 2001
-
Committees| 2001
-
Preface| 2001