Infrared spectroscopic ellipsometry applied to the characterization of nano-structures of silicon IC manufacturing (Englisch)
- Neue Suche nach: Boher, P.
- Neue Suche nach: Boher, P.
- Neue Suche nach: Bucchia, M.
- Neue Suche nach: Guillotin, C.
- Neue Suche nach: Defranoux, C.
In:
Thin solid films
;
450
, 1
; 173-177
;
2004
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Infrared spectroscopic ellipsometry applied to the characterization of nano-structures of silicon IC manufacturing
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Beteiligte:
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Erschienen in:Thin solid films ; 450, 1 ; 173-177
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Erscheinungsort:Amsterdam [u.a.] Elsevier
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Erscheinungsdatum:2004
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ISSN:
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ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 33.68
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 535/3485
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 450, Ausgabe 1
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Author Index| 2004
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Subject Index| 2004
- iii
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Ed. Board| 2004