A new multiple wavelength ellipsometric imager: design, limitations and applications (Englisch)
- Neue Suche nach: Boher, P.
- Neue Suche nach: Boher, P.
- Neue Suche nach: Thomas, O.
- Neue Suche nach: Piel, J.P.
- Neue Suche nach: Stehle, J.L.
In:
Thin solid films
;
455
, 1
; 809-818
;
2004
-
ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:A new multiple wavelength ellipsometric imager: design, limitations and applications
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Beteiligte:
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Erschienen in:Thin solid films ; 455, 1 ; 809-818
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Erscheinungsort:Amsterdam [u.a.] Elsevier
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Erscheinungsdatum:2004
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ISSN:
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ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 33.68
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 535/3485
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 455, Ausgabe 1
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 1
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Preface| 2004
- 3
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Expanding horizons: new developments in ellipsometry and polarimetryAspnes, D.E. et al. | 2004
- 14
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Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principleChen, Chi et al. | 2004
- 24
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Spectroscopic ellipsometry using the grating division-of-amplitude photopolarimeter (G-DOAP)Krishnan, S. et al. | 2004
- 33
-
Comparison of the capabilities of rotating-analyzer and rotating-compensator ellipsometers by measurements on a single systemMori, T. et al. | 2004
- 39
-
Generalized magneto-optical ellipsometry in ferromagnetic metalsNeuber, G. et al. | 2004
- 43
-
Mueller matrix spectroscopic ellipsometry: formulation and applicationLaskarakis, A. et al. | 2004
- 50
-
Optical anisotropy relevant to rotating-compensator polarimeters: application to the monoplate retarderAsar, M. et al. | 2004
- 54
-
Prism spectroscopic ellipsometerAzzam, R.M.A. et al. | 2004
- 61
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Accurate calibration and optimized measurement: use of an achromatic compensator in rotating polarizer spectroscopic ellipsometryBroch, L. et al. | 2004
- 66
-
Precision in ellipsometrically determined sample parameters: simulation and experimentJohs, Blaine et al. | 2004
- 72
-
Precision auto-alignment for incident angle of an ellipsometer using specimen stagePark, Sunglim et al. | 2004
- 78
-
In situ calibration technique for photoelastic modulator in ellipsometryWang, M.W. et al. | 2004
- 84
-
New design of a spectroscopic ellipsometer by using a spectrometer with multiple gratings and a two-dimensional CCD array detectorYou, Hai-Yang et al. | 2004
- 90
-
Photo-interferometric spectroscopic ellipsometryMartinez-Antón, J.C. et al. | 2004
- 95
-
Evaluation of ellipsometric measurements using complex strategiesPolgár, O. et al. | 2004
- 101
-
Error function for interpretations of ellipsometric measurementsPolovinkin, V.G. et al. | 2004
- 106
-
Application of spectral and temporal weighted error functions for data analysis in real-time spectroscopic ellipsometryZapien, J.A. et al. | 2004
- 112
-
General methods for optimized design and calibration of Mueller polarimetersDe Martino, A. et al. | 2004
- 120
-
Spectroscopic Mueller polarimeter based on liquid crystal devicesGarcia-Caurel, E. et al. | 2004
- 124
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Optical properties of anisotropic materials: an experimental approachAlonso, M.I. et al. | 2004
- 132
-
Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometerAn, Ilsin et al. | 2004
- 138
-
Development and test of a new grating-polarimeter and its application in ellipsometric measurementsMasetti, E. et al. | 2004
- 143
-
Far-infrared ellipsometry using a synchrotron light source-the dielectric response of the cuprate high Tc superconductorsBernhard, C. et al. | 2004
- 150
-
Infrared spectroscopic ellipsometry applied to the characterization of ultra shallow junction on silicon and SOIDefranoux, C. et al. | 2004
- 157
-
Optical purity evaluation of the noble metal by the ellipsometric methodZhou, Peng et al. | 2004
- 161
-
Infrared dielectric functions and crystal orientation of a-plane ZnO thin films on r-plane sapphire determined by generalized ellipsometryBundesmann, C. et al. | 2004
- 167
-
FTIR phase-modulated ellipsometry characterization of hydrogenated amorphous silicon nitride thin films with embedded nanoparticlesCanillas, A. et al. | 2004
- 172
-
Infrared study of YBa2Cu3O7-La0.67Ca0.33MnO3 superlatticesDubroka, A. et al. | 2004
- 177
-
Diffraction effects in infrared ellipsometry of conducting samplesHumlícek, J. et al. | 2004
- 183
-
Infrared ellipsometry of SiC-Si heterostructures with Ge modified interfacesZgheib, Ch et al. | 2004
- 187
-
Optical properties of silicon carbide polytypes below and around bandgapKildemo, M. et al. | 2004
- 196
-
Simultaneous determination of bulk isotropic and surface-induced anisotropic complex dielectric functions of semiconductors from high speed Mueller matrix ellipsometryChen, Chi et al. | 2004
- 201
-
Optical characterization of aluminum-doped zinc oxide films by advanced dispersion theoriesPflug, Andreas et al. | 2004
- 207
-
Fine art painting characterization by spectroscopic ellipsometry: preliminary measurements on varnish layersChristofides, C. et al. | 2004
- 213
-
Optical properties study of MgB2Chvostová, D. et al. | 2004
- 217
-
Optical constants and interband transitions of Ge1-xSnx alloys (x<0.2) grown on Si by UHV-CVDCook, Candi S. et al. | 2004
- 222
-
Parametric modeling of the dielectric functions of Cd1-xMgxTe alloy filmsIhn, Y.S. et al. | 2004
- 228
-
Optical properties of ZnSe and Zn0.87Mn0.13Se epilayers determined by spectroscopic ellipsometryKvietkova, J. et al. | 2004
- 231
-
Hydrogen implantation in InGaNAs studied by spectroscopic ellipsometryLeibiger, G. et al. | 2004
- 235
-
Infrared to vacuum ultraviolet optical properties of 3C, 4H and 6H silicon carbide measured by spectroscopic ellipsometryLindquist, O.P.A. et al. | 2004
- 239
-
Ion implantation-caused damage in SiC measured by spectroscopic ellipsometryPetrik, P. et al. | 2004
- 244
-
Phase-modulated spectroscopic ellipsometry and polarized transmission intensity studies of wide-gap biaxial CaGa2S4Shim, Yonggu et al. | 2004
- 248
-
Optical properties of bulk c-ZrO2, c-MgO and a-As2S3 determined by variable angle spectroscopic ellipsometrySynowicki, R.A. et al. | 2004
- 256
-
IR ellipsometry and photoluminescence investigations of Zn1-xBexSe and Zn1-x-yBexMnySe mixed crystalsWronkowska, A.A. et al. | 2004
- 261
-
Gate oxide metrology and silicon piezoopticsZollner, Stefan et al. | 2004
- 266
-
Structure analysis of organic films by mid-infrared ellipsometryHinrichs, K. et al. | 2004
- 272
-
Infrared spectroscopic ellipsometry study of molecular orientation induced anisotropy in polymer substratesBungay, Corey et al. | 2004
- 278
-
Temperature dependence of ellipsometric spectra of poly(methyl-phenylsilane)Bonaventurová Zrzavecká, O. et al. | 2004
- 283
-
IR-FUV ellipsometry studies on the optical, electronic and vibrational properties of polymeric membranesGioti, M. et al. | 2004
- 288
-
Envelope analysis in spectroscopic ellipsometry of thin films. Application to a weakly-absorbing polymer filmMartinez-Antón, J.C. et al. | 2004
- 292
-
Swelling of a thin B+ implanted polyimide layer-a dynamic spectroscopic ellipsometry studyEichhorn, K.-J. et al. | 2004
- 295
-
Infrared ellipsometry characterization of conducting thin organic filmsSchubert, M. et al. | 2004
- 301
-
Relationships among surface processing at the nanometer scale, nanostructure and optical properties of thin oxide filmsLosurdo, Maria et al. | 2004
- 313
-
Correlations between the microstructure of Ag-Si3N4 multilayers and their optical propertiesGirardeau, T. et al. | 2004
- 318
-
Characterization of interfacial layer of ultrathin Zr silicate on Si(100) using spectroscopic ellipsometry and HRTEMAhn, H. et al. | 2004
- 323
-
Ellipsometric characterisation of heterogeneous 2D layersWormeester, Herbert et al. | 2004
- 335
-
Dielectric function of Si nanocrystals embedded in SiO2Gallas, B. et al. | 2004
- 339
-
Spectroscopic ellipsometry of carbon nanotube formation in SiC surface decompositionMatsumoto, K. et al. | 2004
- 344
-
Depth distribution of disorder and cavities in high dose helium implanted silicon characterized by spectroscopic ellipsometryPetrik, P. et al. | 2004
- 349
-
The simultaneous determination of n, k, and t from polarimetric dataFlock, K. et al. | 2004
- 356
-
Water adsorption in porous TiO2-SiO2 sol-gel films analyzed by spectroscopic ellipsometryAlvarez-Herrero, A. et al. | 2004
- 361
-
Determination of refractive index of printed and unprinted paper using spectroscopic ellipsometryBakker, J.W.P. et al. | 2004
- 366
-
Description of the porosity of inhomogeneous porous low-k films using solvent adsorption studied by spectroscopic ellipsometry in the visible rangeBourgeois, A. et al. | 2004
- 370
-
Visible and infrared ellipsometry applied to the study of metal-containing diamond-like carbon coatingsCorbella, C. et al. | 2004
- 376
-
Application of in-situ ellipsometry to the fabrication of multi-layer optical coatings with sub-nanometre accuracyDligatch, Svetlana et al. | 2004
- 380
-
Complete wetting transition at the fluid-vapour interface of Ga-Bi studied by spectroscopic ellipsometryDogel, S. et al. | 2004
- 384
-
Spectroscopic ellipsometry characterization of ZnO-In2O3 systemsEl Rhaleb, H. et al. | 2004
- 388
-
Analytical model for the optical functions of amorphous semiconductors and its applications for thin film solar cellsFerlauto, A.S. et al. | 2004
- 393
-
Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometryFranta, Daniel et al. | 2004
- 399
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Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometryFranta, Daniel et al. | 2004
- 404
-
Dose-dependence of ion implantation-caused damage in silicon measured by ellipsometry and backscattering spectrometryFried, M. et al. | 2004
- 410
-
Characterisation of porous silicon composite material by spectroscopic ellipsometryGaillet, M. et al. | 2004
- 417
-
Spectroellipsometric characterization of sol-gel TiO2-CuO thin coatingsGartner, M. et al. | 2004
- 422
-
Ex situ spectroscopic ellipsometry investigations of chemical vapor deposited nanocomposite carbon thin filmsGupta, S. et al. | 2004
- 429
-
Optical and magnetooptical properties of bismuth and gallium substituted iron garnet filmsHansteen, Fredrik et al. | 2004
- 433
-
Contributions to the static dielectric constant of low-k xerogel films derived from ellipsometry and IR spectroscopyHimcinschi, C. et al. | 2004
- 438
-
Study of structure and optical properties of silver oxide films by ellipsometry, XRD and XPS methodsGao, Xiao-Yong et al. | 2004
- 443
-
Dielectric function of thin metal films by combined in situ transmission ellipsometry and intensity measurementsPribil, G.K. et al. | 2004
- 450
-
Mn1-xFex alloy films studied by optical and magneto-optical spectroscopiesKim, J.B. et al. | 2004
- 453
-
Effect of ion irradiation on the optical properties and room temperature oxidation of copper surfacePoperenko, L.V. et al. | 2004
- 457
-
Spectroscopic ellipsometry characterization of interface reactivity in GaAs-based superlatticesLosurdo, M. et al. | 2004
- 462
-
The finite difference time domain method as a numerical tool for studying the polarization optical response of rough surfacesLehner, B. et al. | 2004
- 468
-
Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin filmsMasetti, E. et al. | 2004
- 473
-
Spectroscopic ellipsometry of TaNx and VN filmsMistrik, J. et al. | 2004
- 478
-
Spectroscopic ellipsometry of pulsed laser irradiated c-Ge surfacesMistrik, J. et al. | 2004
- 482
-
Spectroscopic ellipsometry analysis for investigation of the modification of thin film p-a-Si1-xCx:H after ultraviolet treatment in an Argon ambientMyong, Seung Yeop et al. | 2004
- 486
-
Correlation between silicon nanocrystalline size effect and spectroscopic ellipsometry responsesEn Naciri, A. et al. | 2004
- 491
-
Ellipsometry characterization of oxidized copper layers for chemical mechanical polishing processNishizawa, H. et al. | 2004
- 495
-
Optical characterization of ferroelectric strontium-bismuth-tantalate (SBT) thin filmsSchmidt, C. et al. | 2004
- 500
-
UV-VUV spectroscopic ellipsometry of ternary MgxZn1-xO (0<=x<=0.53) thin filmsSchmidt-Grund, R. et al. | 2004
- 505
-
Vacuum ultraviolet spectroscopic ellipsometry investigations of guanine layers on H-passivated Si(111) surfacesSilaghi, S.D. et al. | 2004
- 509
-
Spectroellipsometric study of the sol-gel nanocrystalline ITO multilayer filmsStoica, T.F. et al. | 2004
- 513
-
Photopolarimetric investigations of liquid crystals-electrochromic oxides interfaceStrangi, G. et al. | 2004
- 519
-
Spectroscopic ellipsometry (SE) and grazing X-ray reflectometry (GXR) analyses on tungsten carbide films for diffusion barrier in copper metallization schemesSun, Lianchao et al. | 2004
- 525
-
Spectroscopic ellipsometry study on e-beam deposited titanium dioxide filmsSun, Lianchao et al. | 2004
- 530
-
Spectroscopic ellipsometry investigation of amorphous carbon films with different sp3 content: relation with protein adsorptionVinnichenko, M. et al. | 2004
- 535
-
The ideal vehicle for optical model development: porous silicon multilayersVolk, J. et al. | 2004
- 540
-
Spectroscopic ellipsometry study of focused ion beam induced GaAs surface modificationBasnar, B. et al. | 2004
- 545
-
Ellipsometric analysis of gamma radiation effects on standard optical coatings used in aerospace applicationsFernández-Rodríguez, M. et al. | 2004
- 551
-
Determination of the anisotropic dielectric function for metal free phthalocyanine thin filmsGordan, O.D. et al. | 2004
- 557
-
Investigation of optical anisotropy of Langmuir-Blodgett films of long-chain acetylenic acidsBadmaeva, I.A. et al. | 2004
- 563
-
Far-infrared magnetooptic generalized ellipsometry: determination of free-charge-carrier parameters in semiconductor thin film structuresSchubert, Mathias et al. | 2004
- 571
-
Analysis of the optical properties and structure of sculptured thin films from spectroscopic Mueller matrix ellipsometryPodraza, N.J. et al. | 2004
- 576
-
Anisotropic optical functions of pentaerythrytol, an uniaxial organic crystalSassella, A. et al. | 2004
- 581
-
Generalized ellipsometry for the characterization of anisotropic materials: influence of the sample adjustment on the extracted optical indicesBoher, P. et al. | 2004
- 586
-
VASE and IR spectroscopy: excellent tools to study biaxial organic molecular thin films: DiMe-PTCDI on S-passivated GaAs(100)Friedrich, M. et al. | 2004
- 591
-
Mueller-matrix characterization of liquid crystalsHilfiker, J.N. et al. | 2004
- 596
-
Generalized spectroscopic ellipsometry and Mueller-matrix study of twisted nematic and super twisted nematic liquid crystalsHilfiker, J.N. et al. | 2004
- 601
-
Far-infrared dielectric function and phonon modes of spontaneously ordered (AlxGa1-x)0.52In0.48PHofmann, Tino et al. | 2004
- 605
-
Concentration and size dependence of optical properties of Ag:Bi2O3 composite films by using the co-sputtering methodZhou, Peng et al. | 2004
- 609
-
Ellipsometry on uniaxial ZnO and Zn1-xMgxO thin films grown on (0001) sapphire substrateKang, T.D. et al. | 2004
- 615
-
Magneto-optical ellipsometry of systems containing thick layersPostava, K. et al. | 2004
- 619
-
Generalized ellipsometry for orthorhombic, absorbing materials: dielectric functions, phonon modes and band-to-band transitions of Sb2S3Schubert, M. et al. | 2004
- 624
-
Mueller matrix ellipsometry study of uniaxial deuterated potassium dihydrogen phosphate (DKDP)Synowicki, R.A. et al. | 2004
- 628
-
Coherent and incoherent interference modelling and measurement of anisotropic multilayer stacks using conventional ellipsometryTouir, H. et al. | 2004
- 632
-
General virtual interface algorithm for in situ spectroscopic ellipsometric data analysisJohs, Blaine et al. | 2004
- 639
-
Integrated rotating-compensator polarimeter for real-time measurements and analysis of organometallic chemical vapor depositionFlock, K. et al. | 2004
- 645
-
Control of etch depth in patterned semiconductor substrates using real time spectroscopic ellipsometryCho, S.-J. et al. | 2004
- 650
-
Spectroellipsometric evaluation of colour and oxidation resistance of TiMgN coatingsBanakh, O. et al. | 2004
- 656
-
An in situ study of mesostructured CTAB-silica film formation using infrared ellipsometry: evolution of water contentBrunet-Bruneau, A. et al. | 2004
- 661
-
In-situ spectroscopic ellipsometry investigation and control of GaN growth mode in metal-organic vapor phase epitaxy at low pressures of 20 TorrCao, B. et al. | 2004
- 665
-
Evaluation of compositional depth profiles in mixed-phase (amorphous+crystalline) silicon films from real time spectroscopic ellipsometryFerlauto, A.S. et al. | 2004
- 670
-
Real-time studies of amorphous and microcrystalline Si:H growth by spectroscopic ellipsometry and infrared spectroscopyFujiwara, Hiroyuki et al. | 2004
- 675
-
Observation of the cascaded phase transformation of Ge-Sb-Te alloy at elevated temperature by using nanosecond time resolved ellipsometryKim, Sang Jun et al. | 2004
- 679
-
In-situ studies of the growth of amorphous and nanocrystalline silicon using real time spectroscopic ellipsometryLevi, D.H. et al. | 2004
- 684
-
In-situ growth monitoring by spectroscopy ellipsometry of MOCVD cubic-GaN(001)Montaigne Ramil, A. et al. | 2004
- 688
-
In situ ellipsometry for control of Hg1-xCdxTe nanolayer structures and inhomogeneous layers during MBE growthShvets, V.A. et al. | 2004
- 695
-
In situ spectroscopic ellipsometry of hydrogen-argon plasma cleaned silicon surfacesFörster, Ch et al. | 2004
- 700
-
Time-resolved microellipsometry for rapid thermal processes monitoringSpesivtsev, E.V. et al. | 2004
- 705
-
Realtime layer-by-layer analysis for multilayer fabrication monitoring by an automatic null ellipsometerTsuru, T. et al. | 2004
- 710
-
In situ measurements of chemical sensor film dynamics by spectroscopic ellipsometry. Three case studiesZudans, Imants et al. | 2004
- 716
-
Protein monolayers monitored by internal reflection ellipsometryPoksinski, M. et al. | 2004
- 722
-
Application of FTIR ellipsometry to detect and classify microorganismsGarcia-Caurel, Enric et al. | 2004
- 726
-
Protein adsorption in porous silicon gradients monitored by spatially-resolved spectroscopic ellipsometryKarlsson, L.M. et al. | 2004
- 731
-
Spectroscopic ellipsometry on biological materials - investigation of hydration dynamics and structural propertiesSchulz, B. et al. | 2004
- 735
-
In situ ellipsometric and electrochemical monitoring of the oxidation of a Pb-Ca-Sn alloy used in the lead acid batteriesStein, N. et al. | 2004
- 742
-
Use of in-situ spectroscopic ellipsometry to study aluminium-oxide surface modifications in chloride and sulfuric solutionsVan Gils, S. et al. | 2004
- 747
-
CO2 sorption of a ceramic separation membraneWormeester, Herbert et al. | 2004
- 752
-
Reflection anisotropy spectroscopy of molecular assembly at metal surfacesMartin, D.S. et al. | 2004
- 759
-
Atomic-layer resolved monitoring of thermal oxidation of Si(001) by reflectance difference oscillation techniqueYasuda, Tetsuji et al. | 2004
- 764
-
Calculation of surface optical properties: from qualitative understanding to quantitative predictionsSchmidt, W.G. et al. | 2004
- 772
-
Industrial applications of spectroscopic ellipsometryTompkins, Harland G. et al. | 2004
- 779
-
Biplate artifacts in rotating-compensator ellipsometersEbert, K. et al. | 2004
- 784
-
Ellipsometric monitoring of molecular evolution in freely suspended films of M12-10 ferroelectric liquid crystalBortchagovsky, E.G. et al. | 2004
- 790
-
Performance analysis of ellipsometer systemsAsinovski, Leo et al. | 2004
- 794
-
Spectroscopic ellipsometry for in-line monitoring of silicon nitridesCook, Candi S. et al. | 2004
- 798
-
Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronicsBoher, P. et al. | 2004
- 804
-
Application of the genetic algorithms in spectroscopic ellipsometryKudla, Andrzej et al. | 2004
- 809
-
A new multiple wavelength ellipsometric imager: design, limitations and applicationsBoher, P. et al. | 2004
- 819
-
Oxidation behaviour of thin silver films deposited on plastic web characterized by spectroscopic ellipsometry (SE)Sahm, H. et al. | 2004
- 824
-
A memory application of light reflection from anisotropic micro-structured thin filmsTazawa, M. et al. | 2004
- 828
-
Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoringHuang, Hsu-Ting et al. | 2004
- 837
-
Author Index| 2004
- 840
-
Subject Index| 2004
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Editorial Board| 2004