Residual stress control in MoCr thin films deposited by ionized magnetron sputtering (Unbekannt)
- Neue Suche nach: Tranchant, J.
- Neue Suche nach: Tranchant, J.
- Neue Suche nach: Angleraud, B.
- Neue Suche nach: Tessier, P.Y.
- Neue Suche nach: Besland, M.P.
- Neue Suche nach: Landesman, J.P.
- Neue Suche nach: Djouadi, M.A.
In:
Surface & coatings technology
;
200
, 22-23
; 6549-6553
;
2006
-
ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Residual stress control in MoCr thin films deposited by ionized magnetron sputtering
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Beteiligte:Tranchant, J. ( Autor:in ) / Angleraud, B. / Tessier, P.Y. / Besland, M.P. / Landesman, J.P. / Djouadi, M.A.
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Erschienen in:Surface & coatings technology ; 200, 22-23 ; 6549-6553
-
Verlag:
- Neue Suche nach: Elsevier Sequoia
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Erscheinungsort:Lausanne
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Erscheinungsdatum:2006
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ISSN:
-
ZDBID:
-
Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Unbekannt
- Neue Suche nach: 52.78 / 51.20 / 51.20 / 52.78
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 645/5255
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 200, Ausgabe 22-23
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-
Author Index of Volume 200/22–23| 2006
- 6642
-
Subject Index of Volume 200/22–23| 2006