Nickel induced lateral crystallization behavior of amorphous silicon films (Englisch)
- Neue Suche nach: Li, J.F.
- Neue Suche nach: Li, J.F.
- Neue Suche nach: Sun, X.W.
- Neue Suche nach: Yu, M.B.
- Neue Suche nach: Qi, G.J.
- Neue Suche nach: Zeng, X.T.
In:
Applied surface science
;
240
, 1-4
; 155-160
;
2005
-
ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Nickel induced lateral crystallization behavior of amorphous silicon films
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Beteiligte:
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Erschienen in:Applied surface science ; 240, 1-4 ; 155-160
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Verlag:
- Neue Suche nach: Elsevier
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Erscheinungsort:Amsterdam [u.a.]
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Erscheinungsdatum:2005
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ISSN:
-
ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 52.78 / 35.18 / 33.68
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 535/3485
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 240, Ausgabe 1-4
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Author Index| 2003
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Subject Index| 2003