Titanium Silicide-Silicon Nonohmic Contact Resistance for NFET's, PFET's, Diffused Resistors, and NPN's in a BiCMOS Technology (Englisch)
- Neue Suche nach: Hook, T.B.
- Neue Suche nach: Hook, T.B.
- Neue Suche nach: Mann, R.W.
- Neue Suche nach: Nowak, E.J.
In:
IEEE transactions on electron devices
;
42
, 4
; 697-703
;
1995
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ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:Titanium Silicide-Silicon Nonohmic Contact Resistance for NFET's, PFET's, Diffused Resistors, and NPN's in a BiCMOS Technology
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Beteiligte:
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Erschienen in:IEEE transactions on electron devices ; 42, 4 ; 697-703
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Verlag:
- Neue Suche nach: IEEE
-
Erscheinungsort:New York, NY
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Erscheinungsdatum:1995
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ISSN:
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ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 53.50 / 53.00 / 52.50 / 54.20
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 770/5670
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 42, Ausgabe 4
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