Porous ultra low k deposited by PECVD: From deposition to material properties (Unbekannt)
- Neue Suche nach: Jousseaume, V.
- Neue Suche nach: Jousseaume, V.
- Neue Suche nach: Favennec, L.
- Neue Suche nach: Zenasni, A.
- Neue Suche nach: Gourhant, O.
In:
Surface & coatings technology
;
201
, 22
; 9248-9251
;
2007
-
ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Porous ultra low k deposited by PECVD: From deposition to material properties
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Beteiligte:
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Erschienen in:Surface & coatings technology ; 201, 22 ; 9248-9251
-
Verlag:
- Neue Suche nach: Elsevier Sequoia
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Erscheinungsort:Lausanne
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Erscheinungsdatum:2007
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ISSN:
-
ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Unbekannt
- Neue Suche nach: 52.78 / 51.20 / 51.20 / 52.78
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 645/5255
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 201, Ausgabe 22
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Effect of source materials on film thickness and compositional uniformity of MOCVD-P(Zr,Ti)O3 filmsFunakubo, Hiroshi / Nagai, Atsushi / Asano, Gouji / Koo, June-Mo / Shin, Sang-Min / Park, Youngsoo et al. | 2007
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MgO and CaO stabilized ZrO2 thin films obtained by Metal Organic Chemical Vapor DepositionCarta, Giovanni / El Habra, Naida / Rossetto, Gilberto / Zanella, Pierino / Casarin, Maurizio / Barreca, Davide / Maragno, Cinzia / Tondello, Eugenio et al. | 2007
- 9294
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Effect of annealing in oxygen atmosphere on morphological and electrical properties of iridium and ruthenium thin films prepared by liquid delivery MOCVDLisker, Marco / Hur’yeva, Tetyana / Ritterhaus, Yves / Burte, Edmund P. et al. | 2007
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Wear properties of MOCVD-grown aluminium oxide films studied by cavitation erosion experimentsPflitsch, Christian / Curdts, Benjamin / Buck, Volker / Atakan, Burak et al. | 2007
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Growth of TiO2 thin films by AP-MOCVD on stainless steel substrates for photocatalytic applicationsDuminica, F.-D. / Maury, F. / Hausbrand, R. et al. | 2007
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Effects of crystallinity and grain size on photocatalytic activity of titania filmsMaeda, Masahiko / Watanabe, Teruyoshi et al. | 2007
- 9313
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Technology and optoelectronic properties of APCVD Cr2O3 and Mo–Cr mixed oxide thin filmsIvanova, T. / Gesheva, K.A. / Sharlandjiev, P. / Koserkova-Georgieva, A. et al. | 2007
- 9319
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Photoactive and antibacterial TiO2 thin films on stainless steelEvans, P. / Sheel, D.W. et al. | 2007
- 9325
-
Silicon CVD deposition for low cost applications in photovoltaicsSchmich, Evelyn / Schillinger, Norbert / Reber, Stefan et al. | 2007
- 9330
-
Development of micromorph tandem solar cells on foil deposited by VHF-PECVDLiu, Y. / Rath, J.K. / Schropp, R.E.I. et al. | 2007
- 9334
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Structure and electrical properties of selectively chemically vapor deposited vanadium oxide films from Vanadium tri-i-propoxy oxide vaporsKritikos, L. / Zambelis, L. / Papadimitropoulos, G. / Davazoglou, D. et al. | 2007
- 9340
-
Ferroelectric PbTiO3 films grown by pulsed liquid injection MOCVDBartasyte, A. / Bouregba, R. / Dogheche, E. / Boudard, M. / Poullain, G. / Chaix-Pluchery, O. / Jimenez, C. / Plausinaitiene, V. / Remiens, D. / Abrutis, A. et al. | 2007
- 9345
-
Atomic layer deposition for the fabrication of 3D photonic crystals structures: Growth of Al2O3 and VO2 photonic crystal systemsPovey, I.M. / Bardosova, M. / Chalvet, F. / Pemble, M.E. / Yates, H.M. et al. | 2007
- 9349
-
N-doped TiO2 coatings grown by atmospheric pressure MOCVD for visible light-induced photocatalytic activityDuminica, F.-D. / Maury, F. / Hausbrand, R. et al. | 2007
- 9354
-
Chemical vapor infiltration of photocatalytically active TiO2 thin films on glass microfibersSarantopoulos, Christos / Gleizes, Alain N. / Maury, Francis et al. | 2007
- 9359
-
FTIR characterization of light emitting Si-rich nitride films prepared by low pressure chemical vapor depositionVamvakas, V. Em. / Gardelis, S. et al. | 2007
- 9365
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Synthesis of undoped and Ni doped InTaO4 photoactive thin films by metal organic chemical vapor depositionMcSporran, N. / Rico, V. / Borrás, A. / González-Elipe, A.R. / Sauthier, G. / György, E. / Santiso, J. / Garcia, G. / Figueras, A. / Parafianovic, L. et al. | 2007
- 9369
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Tungsten doped vanadium dioxide thin films prepared by atmospheric pressure chemical vapour deposition from vanadyl acetylacetonate and tungsten hexachlorideBinions, Russell / Piccirillo, Clara / Parkin, Ivan P. et al. | 2007
- 9373
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Novel multifunctional filmsBrook, L.A. / Evans, P. / Foster, H.A. / Pemble, M.E. / Sheel, D.W. / Steele, A. / Yates, H.M. et al. | 2007
- 9378
-
Structural and surface analysis of Mo–W oxide films prepared by atmospheric pressure chemical vapor depositionGesheva, K.A. / Ivanova, T. / Marsen, B. / Cole, B. / Miller, E.L. / Hamelmann, F. et al. | 2007
- 9385
-
CVD-growth of ZnSxSe1−x with subsequent hot isostatic pressingGavrishchuk, E.M. / Savin, D.V. / Ikonnikov, V.B. et al. | 2007
- 9389
-
Si doped and nanocomposite Si–diamond films: Cathodoluminescence and photoluminescence characterizations of Si centersOrlanducci, S. / Sessa, V. / Tamburri, E. / Terranova, M.L. / Rossi, M. / Botti, S. et al. | 2007
- 9395
-
Study of the growth conditions and characterization of CaCu2Ox and SrCu2Ox thin filmsMillon, C. / Deschanvres, J.L. / Jiménez, C. / Macsporran, N. / Servet, B. / Durand, O. / Modreanu, M. et al. | 2007
- 9400
-
Initiated chemical vapor deposition (iCVD) of polymeric nanocoatingsMartin, Tyler P. / Lau, Kenneth K.S. / Chan, Kelvin / Mao, Yu / Gupta, Malancha / Shannan O'Shaughnessy, W. / Gleason, Karen K. et al. | 2007
- 9406
-
Systematic control of the electrical conductivity of poly (3,4-ethylenedioxythiophene) via oxidative chemical vapor deposition (oCVD)Im, Sung Gap / Olivetti, Elsa A. / Gleason, Karen K. et al. | 2007
- 9413
-
Precursor system for bio-integration ceramics and deposition onto tantala scaffold bone interface surfacesHartshorn, Richard / Stockwell, Samantha / Lebedev, Maxim / Krumdieck, Susan et al. | 2007
- 9417
-
Initiated chemical vapor deposition of perfectly alternating poly(styrene-alt-maleic anhydride)Tenhaeff, Wyatt E. / Gleason, Karen K. et al. | 2007
- 9422
-
Initiated chemical vapour deposition (iCVD) of thermally stable poly-glycidyl methacrylateBakker, R. / Verlaan, V. / van der Werf, C.H.M. / Rath, J.K. / Gleason, K.K. / Schropp, R.E.I. et al. | 2007
- 9426
-
Di- and tri-aminosilane SAM-assisted patterning of highly pure poly(3,4-ethylenedioxythiophene) nanofilms robustly adhered to silicon oxide substratePang, Ilsun / Kim, Sungsoo / Lee, Jaegab et al. | 2007
- 9432
-
Iodine-catalyzed chemical vapor deposition of Cu on MPTMS monolayer surface in a low deposition temperature regimePark, H.J. / Shin, H.J. / Jung, H.S. / Kim, C. / Sung, M.M. / Lee, C.M. / Soh, H.S. / Lee, J.G. et al. | 2007
- 9437
-
Polyimide (PI) films by chemical vapor deposition (CVD): Novel design, experiments and characterizationGonzález, Jaime Puig-Pey / Lamure, Alain / Senocq, François et al. | 2007