Relation between residual stresses and microstructure in Mo(Cr) thin films elaborated by ionized magnetron sputtering (Unbekannt)
- Neue Suche nach: Tranchant, J.
- Neue Suche nach: Tranchant, J.
- Neue Suche nach: Tessier, P.Y.
- Neue Suche nach: Landesman, J.P.
- Neue Suche nach: Djouadi, M.A.
- Neue Suche nach: Angleraud, B.
- Neue Suche nach: Renault, P.O.
- Neue Suche nach: Girault, B.
- Neue Suche nach: Goudeau, P.
In:
Surface & coatings technology
;
202
, 11
; 2247-2251
;
2008
-
ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Relation between residual stresses and microstructure in Mo(Cr) thin films elaborated by ionized magnetron sputtering
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Beteiligte:Tranchant, J. ( Autor:in ) / Tessier, P.Y. / Landesman, J.P. / Djouadi, M.A. / Angleraud, B. / Renault, P.O. / Girault, B. / Goudeau, P.
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Erschienen in:Surface & coatings technology ; 202, 11 ; 2247-2251
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Verlag:
- Neue Suche nach: Elsevier Sequoia
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Erscheinungsort:Lausanne
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Erscheinungsdatum:2008
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ISSN:
-
ZDBID:
-
Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Unbekannt
- Neue Suche nach: 52.78 / 51.20 / 51.20 / 52.78
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 645/5255
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 202, Ausgabe 11
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Relation between residual stresses and microstructure in Mo(Cr) thin films elaborated by ionized magnetron sputteringTranchant, J. / Tessier, P.Y. / Landesman, J.P. / Djouadi, M.A. / Angleraud, B. / Renault, P.O. / Girault, B. / Goudeau, P. et al. | 2007
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