Direct patterned etching of silicon dioxide and silicon nitride dielectric layers by inkjet printing (Englisch)
- Neue Suche nach: Lennon, Alison J.
- Neue Suche nach: Lennon, Alison J.
- Neue Suche nach: Ho-Baillie, Anita W.Y.
- Neue Suche nach: Wenham, Stuart R.
In:
Solar energy materials & solar cells
;
93
, 10
; 1865-1874
;
2009
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:Direct patterned etching of silicon dioxide and silicon nitride dielectric layers by inkjet printing
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Beteiligte:
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Erschienen in:Solar energy materials & solar cells ; 93, 10 ; 1865-1874
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Verlag:
- Neue Suche nach: NH, Elsevier
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Erscheinungsort:Amsterdam [u.a.]
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Erscheinungsdatum:2009
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ISSN:
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ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 53.36 / 52.52 / 52.56 / 50.70
- Weitere Informationen zu Basisklassifikation
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 93, Ausgabe 10
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Calendar| 2009
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Editorial Board| 2009