SPECIAL SECTION GUEST EDITORIAL - Introduction to the Special Section on Advanced Process Control (Unbekannt)
- Neue Suche nach: Moyne, J
- Neue Suche nach: Moyne, J
- Neue Suche nach: Patel, N S
In:
IEEE transactions on semiconductor manufacturing
;
23
, 2
; 149-151
;
2010
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:SPECIAL SECTION GUEST EDITORIAL - Introduction to the Special Section on Advanced Process Control
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Beteiligte:Moyne, J ( Autor:in ) / Patel, N S
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Erschienen in:IEEE transactions on semiconductor manufacturing ; 23, 2 ; 149-151
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Verlag:
- Neue Suche nach: IEEE
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Erscheinungsort:New York, NY
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Erscheinungsdatum:2010
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ISSN:
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ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Unbekannt
- Neue Suche nach: 770/5670
- Neue Suche nach: 53.56 / 53.56
- Weitere Informationen zu Basisklassifikation
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 23, Ausgabe 2
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SPECIAL SECTION GUEST EDITORIAL - Introduction to the Special Section on Advanced Process ControlMoyne, J et al. | 2010
- 149
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Introduction to the Special Section on Advanced Process ControlMoyne, James / Patel, Nital S. et al. | 2010
- 151
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SPECIAL SECTION PAPERS - Model Regularization for High-Mix ControlPatel, N S et al. | 2010
- 151
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Model Regularization for High-Mix ControlPatel, Nital S et al. | 2010
- 159
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Properties of EWMA Controllers With Gain AdaptationJin Wang, et al. | 2010
- 168
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Compensating for the Initialization and Sampling of EWMA Run-to-Run Controlled ProcessesGood, Richard P / Pabst, Detlef / Stirton, James Broc et al. | 2010
- 178
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Optimization Solvers in Run-to-Run ControlHanish, Courtney K et al. | 2010
- 185
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Addressing Dynamic Process Changes in High Volume Plasma Etch Manufacturing by Using Multivariate Process ControlParkinson, Blake R / Hyung Lee, / Funk, Merritt / Prager, Daniel / Yamashita, Asao / Sundararajan, Radha / Edgar, Thomas F et al. | 2010
- 194
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Large-Scale Semiconductor Process Fault Detection Using a Fast Pattern Recognition-Based MethodHe, Qinghua Peter / Jin Wang, et al. | 2010
- 201
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Introducing a Unified PCA Algorithm for Model Size ReductionGood, Richard P / Kost, Daniel / Cherry, Gregory A et al. | 2010
- 210
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Scheduling Back-End Operations in Semiconductor ManufacturingYumin Deng, / Bard, Jonathan F / Chacon, G Rodolfo / Stuber, John et al. | 2010
- 221
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Yield Management Enhanced Advanced Process Control System (YMeAPC)—Part I: Description and Case Study of Feedback for Optimized Multiprocess ControlMoyne, James / Schulze, Brad et al. | 2010
- 236
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Factory Modeling and Control - Forward Echelon-Based Inventory Monitoring in a Semiconductor Supply ChainGuo, R-S et al. | 2010
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Forward Echelon-Based Inventory Monitoring in a Semiconductor Supply ChainRuey-Shan Guo, / Ming-Huang Chiang, / Hon-Wen Lin, / Jia-Ying Chen, et al. | 2010
- 246
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Scheduling Wafer Lots on Diffusion Machines in a Semiconductor Wafer Fabrication FacilityYeong-Dae Kim, / Byung-Jun Joo, / So-Young Choi, et al. | 2010
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Continuously Improving Methods for Increasing the Running Efficiency of Equipment in 300-mm Semiconductor FabricationYu-Chih Wang, / Lee-Ing Tong, et al. | 2010
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Analysis of Interaction Structure Among Multiple Functional Process Variables for Process Control in Semiconductor ManufacturingXi Zhang, / Qiang Huang, et al. | 2010
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Advanced Process Control - Analysis of Interaction Structure Among Multiple Functional Process Variables for Process Control in Semiconductor ManufacturingZhang, X et al. | 2010
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Structural Feature-Based Fault-Detection Approach for the Recipes of Similar ProductsJong Myoung Ko, / Chang Ouk Kim, / Seung Jun Lee, / Joo Pyo Hong, et al. | 2010
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Yield Modeling and Optimization - Structural Feature-Based Fault-Detection Approach for the Recipes of Similar ProductsKo, J M et al. | 2010
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A Wavelet-Based Approach in Detecting Visual Defects on Semiconductor Wafer DiesChi-Hao Yeh, / Ful-Chiang Wu, / Wei-Lung Ji, / Chien-Yi Huang, et al. | 2010
- 293
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300-mm Production-Worthy Magnetically Enhanced Non-Bosch Through-Si-Via Etch for 3-D Logic IntegrationTeh, W H / Caramto, R / Chidambaram, Thenappan / Wei Wang, / Arkalgud, Sitaram R / Saito, T / Maruyama, K / Maekawa, Kaoru et al. | 2010
- 293
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Process Technology, Characterization, and Optimization - 300-mm Production-Worthy Magnetically Enhanced Non-Bosch Through-Si-Via Etch for 3-D Logic IntegrationTeh, W H et al. | 2010
- 303
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Investigation of Pattern Effects in Rapid Thermal Processing Technology: Modeling and Experimental ResultsCacho, Florian / Bono, H / Beneyton, Remi / Dumont, B / Bianchini, R / Colin, Alexis / Fiori, Vincent / Morin, Pierre et al. | 2010
- 311
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Spacer Gate Lithography for Reduced Variability Due to Line Edge RoughnessXin Sun, / Tsu-Jae King Liu, et al. | 2010
- 316
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Process Performance Prediction for Chemical Mechanical Planarization (CMP) by Integration of Nonlinear Bayesian Analysis and Statistical ModelingZhenyu Kong, / Oztekin, Asil / Beyca, Omer Faruk / Phatak, Upendra / Bukkapatnam, Satish / Komanduri, Ranga et al. | 2010
- 328
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The Growth of Thin Silicon Oxide and Silicon Nitride Films at Low Temperature (400 °C) and High Growth Rates for Semiconductor Device Fabrication by an Advanced Low Electron Temperature Microwave-Excited High-Density Plasma SystemSaito, Y et al. | 2010
- 328
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The Growth of Thin Silicon Oxide and Silicon Nitride Films at Low Temperature (400 $^{\circ}{\hbox{C}}$ ) and High Growth Rates for Semiconductor Device Fabrication by an Advanced Low Electron Temperature Microwave-Excited High-Density Plasma SystemSaito, Yuji / Sekine, Katsuyuki / Kaihara, Ryu / Hirayama, Masaki / Sugawa, Shigetoshi / Aharoni, Herzl / Ohmi, Tadahiro et al. | 2010
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The Growth of Thin Silicon Oxide and Silicon Nitride Films at Low Temperature (400 Formula Not Shown ) and High Growth Rates for Semiconductor Device Fabrication by an Advanced Low Electron Temperature Microwave-Excited High-Density Plasma SystemSaito, Y. / Sekine, K. / Kaihara, R. / Hirayama, M. / Sugawa, S. / Aharoni, H. / Ohmi, T. et al. | 2010
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Alternating Reversed Scanning Sequence for Improved Within-Wafer Uniformity During Nonmelt Laser Annealing of Arsenic-Implanted SiliconChyiu Hyia Poon, / See, Alex / Mei Sheng Zhou, et al. | 2010
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ANNOUNCEMENTS - 2010 IEEE International Interconnect Technology Conference| 2010
- 344
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2010 IEEE International Interconnect Technology Conference| 2010
- C1
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Table of contents| 2010
- C2
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IEEE Transactions on Semiconductor Manufacturing publication information| 2010
- C3
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IEEE Transactions on Semiconductor Manufacturing information for authors| 2010
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SPECIAL SECTION ON ADVANCED PROCESS CONTROL| 2010