A study of the leakage current in TiN/HfO2/TiN capacitors (Englisch)
- Neue Suche nach: Cimino, S.
- Neue Suche nach: Cimino, S.
- Neue Suche nach: Padovani, A.
- Neue Suche nach: Larcher, L.
- Neue Suche nach: Afanas’ev, V.V.
- Neue Suche nach: Hwang, H.J.
- Neue Suche nach: Lee, Y.G.
- Neue Suche nach: Jurczac, M.
- Neue Suche nach: Wouters, D.
- Neue Suche nach: Lee, B.H.
- Neue Suche nach: Hwang, H.
- Neue Suche nach: Pantisano, L.
In:
Microelectronic engineering
;
95
; 71-74
;
2012
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:A study of the leakage current in TiN/HfO2/TiN capacitors
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Beteiligte:Cimino, S. ( Autor:in ) / Padovani, A. / Larcher, L. / Afanas’ev, V.V. / Hwang, H.J. / Lee, Y.G. / Jurczac, M. / Wouters, D. / Lee, B.H. / Hwang, H.
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Erschienen in:Microelectronic engineering ; 95 ; 71-74
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Verlag:
- Neue Suche nach: Elsevier
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Erscheinungsort:Amsterdam [u.a.]
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Erscheinungsdatum:2012
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ISSN:
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ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 535/5670
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Schlagwörter:
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Klassifikation:
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Datenquelle:
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