Near-interfacial thermal donor generation during processing of (100)Si/low-κ Si-oxycarbide insulator structures revealed by electron spin resonance (Englisch)
- Neue Suche nach: Stesmans, A
- Neue Suche nach: Stesmans, A
- Neue Suche nach: Iacovo, S
- Neue Suche nach: Nguyen, S
- Neue Suche nach: Afanas’ev, V V
- Neue Suche nach: Baklanov, M R
- Neue Suche nach: Urbanowicz, A M
In:
Semiconductor science and technology
;
29
, 9
; 95008-95008
;
2014
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Near-interfacial thermal donor generation during processing of (100)Si/low-κ Si-oxycarbide insulator structures revealed by electron spin resonance
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Beteiligte:
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Erschienen in:Semiconductor science and technology ; 29, 9 ; 95008-95008
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Verlag:
- Neue Suche nach: IOP Publ.
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Erscheinungsort:Bristol
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Erscheinungsdatum:2014
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ISSN:
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ZDBID:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 275/3475/5670
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 29, Ausgabe 9
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