Epitaxial integration of tetragonal BiFeO3 with silicon for nonvolatile memory applications (Englisch)
- Neue Suche nach: Zhu, Jingbin
- Neue Suche nach: Zhu, Jingbin
- Neue Suche nach: Yin, Zhigang
- Neue Suche nach: Fu, Zhen
- Neue Suche nach: Zhao, Yajuan
- Neue Suche nach: Zhang, Xingwang
- Neue Suche nach: Liu, Xin
- Neue Suche nach: You, Jingbi
- Neue Suche nach: Li, Xingxing
- Neue Suche nach: Meng, Junhua
- Neue Suche nach: Liu, Heng
- Neue Suche nach: Wu, Jinliang
In:
Journal of crystal growth
;
459
; 178-184
;
2017
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Epitaxial integration of tetragonal BiFeO3 with silicon for nonvolatile memory applications
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Beteiligte:Zhu, Jingbin ( Autor:in ) / Yin, Zhigang / Fu, Zhen / Zhao, Yajuan / Zhang, Xingwang / Liu, Xin / You, Jingbi / Li, Xingxing / Meng, Junhua / Liu, Heng
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Erschienen in:Journal of crystal growth ; 459 ; 178-184
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Verlag:
- Neue Suche nach: Elsevier
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Erscheinungsort:Amsterdam [u.a.]
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Erscheinungsdatum:2017
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ISSN:
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ZDBID:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 38.31 / 33.61 / 35.90
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 535/3475
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Schlagwörter:
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Klassifikation:
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Datenquelle:
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- IFC
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Editorial Board| 2016