SiOCH thin films deposited by chemical vapor deposition: From low-κ to chemical and biochemical sensors (Englisch)
- Neue Suche nach: Jousseaume, V
- Neue Suche nach: Jousseaume, V
- Neue Suche nach: El Sabahy, J
- Neue Suche nach: Yeromonahos, C
- Neue Suche nach: Castellan, G
- Neue Suche nach: Bouamrani, A
- Neue Suche nach: Ricoul, F
In:
Microelectronic engineering
;
167
; 69-79
;
2017
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:SiOCH thin films deposited by chemical vapor deposition: From low-κ to chemical and biochemical sensors
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Beteiligte:Jousseaume, V ( Autor:in ) / El Sabahy, J / Yeromonahos, C / Castellan, G / Bouamrani, A / Ricoul, F
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Erschienen in:Microelectronic engineering ; 167 ; 69-79
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Verlag:
- Neue Suche nach: Elsevier
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Erscheinungsort:Amsterdam [u.a.]
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Erscheinungsdatum:2017
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ISSN:
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ZDBID:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 535/5670
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 167
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- 1
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- 10
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Edge trimming for surface activated dielectric bonded wafersInoue, Fumihiro / Jourdain, Anne / Visker, Jakob / Peng, Lan / Moeller, Berthold / Yokoyama, Kaori / Phommahaxay, Alain / Rebibis, Kenneth June / Miller, Andy / Beyne, Eric et al. | 2016
- 17
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- 37
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Resistivity scaling in metallic thin films and nanowires due to grain boundary and surface roughness scatteringMoors, Kristof / Sorée, Bart / Magnus, Wim et al. | 2016
- 42
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Doping of graphene for the application in nano-interconnectWu, Xiangyu / Asselberghs, Inge / Politou, Maria / Contino, Antonino / Radu, Iuliana / Huyghebaert, Cedric / Tokei, Zsolt / Soree, Bart / De Gendt, Stefan / De Feyter, Steven et al. | 2016
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- 52
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- 58
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Properties of power electronic substrates based on thick printed copper technologyReboun, Jan / Hromadka, Karel / Hermansky, Vojtech / Johan, Jan et al. | 2016
- 63
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Buckle induced delamination techniques to measure the adhesion of metal dielectric interfacesKleinbichler, A. / Zechner, J. / Cordill, M.J. et al. | 2016
- 69
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SiOCH thin films deposited by chemical vapor deposition: From low-κ to chemical and biochemical sensorsJousseaume, V. / El Sabahy, J. / Yeromonahos, C. / Castellan, G. / Bouamrani, A. / Ricoul, F. et al. | 2016
- 80
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Conformal isolation of high-aspect-ratio TSVs using a low-κ dielectric deposited by filament-assisted CVDJousseaume, V. / Altemus, B. / Ribière, C. / Minoret, S. / Gottardi, M. / Ratin, C. / Ichiki, K. / Mourier, T. / Faguet, J. et al. | 2016
- 85
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Hydrogen plasma effect toward the AZO/CuCr/AZO transparent conductive electrodeLin, Tien-Chai / Huang, Wen-Chang / Tsai, Fu-Chun et al. | 2016
- 90
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Dielectrics stability for intermediate BEOL in 3D sequential integrationDeprat, Fabien / Fenouillet-Beranger, Claire / Jousseaume, Vincent / Guerin, Chloé / Beugin, Virginie / Rochat, Névine / Licitra, Christophe / Caubet-Hilloutou, Véronique / Benoit, Daniel / Imbert, Gregory et al. | 2016
- 95
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Effects of catalyst configurations and process conditions on the formation of catalyst nanoparticles and growth of single-walled carbon nanotubesJafarpour, Saeed Motaragheb / Kini, Mandar / Schulz, Stefan E. / Hermann, Sascha et al. | 2016
- 105
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Stability enhancement of low temperature thin-film transistors with atomic-layer-deposited ZnO:Al channelsLiu, Wen-Jun / Wang, You-Hang / Zheng, Li-Li / Lu, Hong-Liang / Ding, Shi-Jin et al. | 2016
- 110
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Accelerated thermo-mechanical fatigue of copper metallizations studied by pulsed laser heatingWurster, Stefan / Bigl, Stephan / Cordill, Megan J. / Kiener, Daniel et al. | 2016
- 119
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Author Index| 2016
- A1
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PrefaceWilson, Christopher J. / Detavernier, Christophe et al. | 2016
- IFC
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Editorial Board| 2016
- v
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Table of Contents| 2016