Effects of magnetic field strength and deposition pressure on the properties of TiN films produced by high power pulsed magnetron sputtering (HPPMS) (Englisch)
- Neue Suche nach: Wu, Jian
- Neue Suche nach: Wu, Jian
- Neue Suche nach: Wu, B.H
- Neue Suche nach: Ma, D.L
- Neue Suche nach: Xie, D
- Neue Suche nach: Wu, Y.P
- Neue Suche nach: Chen, C.Z
- Neue Suche nach: Li, Y.T
- Neue Suche nach: Sun, H
- Neue Suche nach: Huang, N
- Neue Suche nach: Leng, Y.X
In:
Surface & coatings technology
;
315
; 258-267
;
2017
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Effects of magnetic field strength and deposition pressure on the properties of TiN films produced by high power pulsed magnetron sputtering (HPPMS)
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Beteiligte:
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Erschienen in:Surface & coatings technology ; 315 ; 258-267
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Verlag:
- Neue Suche nach: Elsevier Sequoia
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Erscheinungsort:Lausanne
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Erscheinungsdatum:2017
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ISSN:
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ZDBID:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 52.78 / 51.20 / 51.20 / 52.78
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 645/5255
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Datenquelle:
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