High-aspect-ratio nanoporous membranes made by reactive ion etching and e-beam and interference lithography (Englisch)
- Neue Suche nach: Divan, Ralu
- Neue Suche nach: Makarova, Olga V.
- Neue Suche nach: Skoog, Shelby
- Neue Suche nach: Narayan, Roger
- Neue Suche nach: Sumant, Anirudha V.
- Neue Suche nach: Tang, Cha-Mei
- Neue Suche nach: Moldovan, Nicolaie
- Neue Suche nach: Divan, Ralu
- Neue Suche nach: Makarova, Olga V.
- Neue Suche nach: Skoog, Shelby
- Neue Suche nach: Narayan, Roger
- Neue Suche nach: Sumant, Anirudha V.
- Neue Suche nach: Tang, Cha-Mei
- Neue Suche nach: Moldovan, Nicolaie
In:
Microsystem Technologies
;
20
, 10-11
; 1797-1802
;
2013
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:High-aspect-ratio nanoporous membranes made by reactive ion etching and e-beam and interference lithography
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Beteiligte:Divan, Ralu ( Autor:in ) / Makarova, Olga V. ( Autor:in ) / Skoog, Shelby ( Autor:in ) / Narayan, Roger ( Autor:in ) / Sumant, Anirudha V. ( Autor:in ) / Tang, Cha-Mei ( Autor:in ) / Moldovan, Nicolaie ( Autor:in )
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Erschienen in:Microsystem Technologies ; 20, 10-11 ; 1797-1802
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Verlag:
- Neue Suche nach: Springer Berlin Heidelberg
- Neue Suche nach: Springer
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Erscheinungsort:Berlin
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Erscheinungsdatum:2013
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ISSN:
-
ZDBID:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 50.94
- Weitere Informationen zu Basisklassifikation
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Schlagwörter:
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Klassifikation:
BKL: 50.94 Mikrosystemtechnik, Nanotechnologie -
Datenquelle:
Inhaltsverzeichnis – Band 20, Ausgabe 10-11
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