Low-temperature oxidation of silicon in microwave oxygen plasma (Englisch)
- Neue Suche nach: Ray, S. K.
- Neue Suche nach: Maiti, C. K.
- Neue Suche nach: Chakraborti, N. B.
- Neue Suche nach: Ray, S. K.
- Neue Suche nach: Maiti, C. K.
- Neue Suche nach: Chakraborti, N. B.
In:
Journal of Materials Science
;
25
, 5
; 2344-2348
;
1990
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:Low-temperature oxidation of silicon in microwave oxygen plasma
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Beteiligte:
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Erschienen in:Journal of Materials Science ; 25, 5 ; 2344-2348
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Verlag:
- Neue Suche nach: Kluwer Academic Publishers
- Neue Suche nach: Springer Science + Business Media B.V.
-
Erscheinungsort:Norwell, Mass
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Erscheinungsdatum:1990
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ISSN:
-
ZDBID:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 51.00
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 275/5010
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis – Band 25, Ausgabe 5
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