Effect of deposition temperature on the structure, magnetic and transport properties in $ Co_{2} $MnSi Heusler films (Englisch)
- Neue Suche nach: Liu, H.
- Neue Suche nach: Tang, M.
- Neue Suche nach: Guo, B. L.
- Neue Suche nach: Jin, C.
- Neue Suche nach: Li, P.
- Neue Suche nach: Bai, H. L.
- Neue Suche nach: Liu, H.
- Neue Suche nach: Tang, M.
- Neue Suche nach: Guo, B. L.
- Neue Suche nach: Jin, C.
- Neue Suche nach: Li, P.
- Neue Suche nach: Bai, H. L.
In:
Applied Physics A
;
121
, 1
; 141-148
;
2015
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:Effect of deposition temperature on the structure, magnetic and transport properties in $ Co_{2} $MnSi Heusler films
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Beteiligte:Liu, H. ( Autor:in ) / Tang, M. ( Autor:in ) / Guo, B. L. ( Autor:in ) / Jin, C. ( Autor:in ) / Li, P. ( Autor:in ) / Bai, H. L. ( Autor:in )
-
Erschienen in:Applied Physics A ; 121, 1 ; 141-148
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Verlag:
- Neue Suche nach: Springer Berlin Heidelberg
- Neue Suche nach: Springer
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Erscheinungsort:Berlin
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Erscheinungsdatum:2015
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ISSN:
-
ZDBID:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 51.00 / 33.60 / 53.09
- Weitere Informationen zu Basisklassifikation
- Neue Suche nach: 020/3475/3485
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Schlagwörter:
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Klassifikation:
BKL: 51.00 Werkstoffkunde: Allgemeines / 33.60 Kondensierte Materie: Allgemeines / 53.09 Werkstoffe der Elektrotechnik Lokalklassifikation TIB: 020/3475/3485 -
Datenquelle:
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