The Application of the Microwave Plasma Ionization Source in Ambient Mass Spectrometry (Englisch)
Freier Zugriff
- Neue Suche nach: Guć, Maria
- Neue Suche nach: Reszke, Edward
- Neue Suche nach: Cegłowski, Michał
- Neue Suche nach: Schroeder, Grzegorz
- Neue Suche nach: Guć, Maria
- Neue Suche nach: Reszke, Edward
- Neue Suche nach: Cegłowski, Michał
- Neue Suche nach: Schroeder, Grzegorz
In:
Plasma Chemistry and Plasma Processing
;
39
, 4
; 1001-1017
;
2019
-
ISSN:
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:The Application of the Microwave Plasma Ionization Source in Ambient Mass Spectrometry
-
Beteiligte:Guć, Maria ( Autor:in ) / Reszke, Edward ( Autor:in ) / Cegłowski, Michał ( Autor:in ) / Schroeder, Grzegorz ( Autor:in )
-
Erschienen in:Plasma Chemistry and Plasma Processing ; 39, 4 ; 1001-1017
-
Verlag:
- Neue Suche nach: Springer US
- Neue Suche nach: Springer Science + Business Media B.V.
-
Erscheinungsort:Dordrecht
-
Erscheinungsdatum:2019
-
ISSN:
-
ZDBID:
-
DOI:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Elektronische Ressource
-
Sprache:Englisch
- Neue Suche nach: 35.00 / 33.00 / 35.00$jChemie: Allgemeines / 33.00$jPhysik: Allgemeines
- Weitere Informationen zu Basisklassifikation
-
Schlagwörter:
-
Klassifikation:
BKL: 35.00 Chemie: Allgemeines / 33.00 Physik: Allgemeines / 35.00$jChemie: Allgemeines / 33.00$jPhysik: Allgemeines -
Datenquelle:
Inhaltsverzeichnis – Band 39, Ausgabe 4
Zeige alle Jahrgänge und Ausgaben
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 729
-
Decomposition of Crystal Violet by an Atmospheric Pressure RF Plasma Jet: The Role of Radicals, Ozone, Near-Interfacial Reactions and Convective TransportTaghvaei, H. / Kondeti, V. S. S. K. / Bruggeman, P. J. et al. | 2019
- 751
-
Simultaneous Degradation of Aqueous Trichloroacetic Acid by the Combined Action of Anodic Contact Glow Discharge Electrolysis and Normal Electrolytic Processes at the CathodeZhao, Chen / Yang, Haiming / Ju, Maowei / Zhao, Xiaotong / Li, Lixiang / Wang, Shaoyan / An, Baigang et al. | 2019
- 769
-
Assessing the Efficiency of Sodium Ferrate Production by Solution Plasma ProcessSamimi-Sedeh, Sina / Saebnoori, Ehsan / Talaiekhozani, Amirreza / Fulazzaky, Mohamad Ali / Roestamy, Martin / Amani, Ali Mohammad et al. | 2019
- 787
-
1D Modeling of the Microwave Discharge in Liquid n-Heptane Including Production of Carbonaceous ParticlesLebedev, Yu. A. / Tatarinov, A. V. / Epstein, I. L. et al. | 2019
- 809
-
Investigation of $ CO_{2} $ Splitting Process Under Atmospheric Pressure Using Multi-electrode Cylindrical DBD Plasma ReactorNiu, Guanghui / Qin, Yue / Li, Wenwen / Duan, Yixiang et al. | 2019
- 825
-
Experimental Study of $ CO_{2} $ Decomposition in a DC Micro-slit Sustained Glow Discharge ReactorMa, Tao / Wang, Hai-Xing / Shi, Qi / Li, Shi-Ning / Sun, Su-Rong / Murphy, Anthony B. et al. | 2019
- 845
-
Cascaded Plasma–Ozone Injection System: A Novel Approach for Controlling Total Hydrocarbon Emission in Diesel ExhaustMadhukar, Apeksha / Rajanikanth, B. S. et al. | 2019
- 863
-
Mechanisms of Xylene Isomer Oxidation by Non-thermal Plasma via Paired Experiments and SimulationsShou, Tianyu / Xu, Nan / Li, Yihan / Sun, Guojin / Bernards, Matthew T. / Shi, Yao / He, Yi et al. | 2019
- 877
-
Effective Removal of $ CF_{4} $ by Combining Nonthermal Plasma with γ-$ Al_{2} $$ O_{3} $Pan, Kuan Lun / Chen, Ya Sheng / Chang, Moo Been et al. | 2019
- 897
-
Cold Atmospheric Pressure Nitrogen Plasma Jet for Enhancement Germination of Wheat SeedsLotfy, Khaled / Al-Harbi, Nadi Awad / Abd El-Raheem, Hany et al. | 2019
- 913
-
Plasma Jet and Dielectric Barrier Discharge Treatment of Wheat SeedsVelichko, Irina / Gordeev, Ivan / Shelemin, Artem / Nikitin, Daniil / Brinar, Jan / Pleskunov, Pavel / Choukourov, Andrei / Pazderů, Kateřina / Pulkrábek, Josef et al. | 2019
- 929
-
Regeneration of a Coked Zeolite via Nonthermal Plasma Process: A Parametric StudyPinard, Ludovic / Ayoub, Nadim / Batiot-Dupeyrat, Catherine et al. | 2019
- 937
-
Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor DepositionXu, Yu / Zhang, Yu / Li, Linjun / Ding, Ke / Guo, Ying / Shi, Jianjun / Huang, Xiaojiang / Zhang, Jing et al. | 2019
- 937
-
Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of $$\hbox {TiO}_2$$ Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor DepositionXu, Yu / Zhang, Yu / Li, Linjun / Ding, Ke / Guo, Ying / Shi, Jianjun / Huang, Xiaojiang / Zhang, Jing et al. | 2019
- 949
-
Fluid Modelling of DC Argon Microplasmas: Effects of the Electron Transport DescriptionBaeva, M. / Loffhagen, D. / Becker, M. M. / Uhrlandt, D. et al. | 2019
- 969
-
Simulation for the Characteristics of Plasma of the Multi-gap Pseudospark DischargeZhang, J. / Zheng, Y. et al. | 2019
- 985
-
The Effect of Background Gas on the Excitation Temperature and Electron Number Density of Basalt Plasma Induced by 10.6 Micron Laser RadiationMomcilovic, Milos / Zivkovic, Sanja / Kuzmanovic, Miroslav / Ciganovic, Jovan / Rankovic, Dragan / Trtica, Milan / Savovic, Jelena et al. | 2019
- 1001
-
The Application of the Microwave Plasma Ionization Source in Ambient Mass SpectrometryGuć, Maria / Reszke, Edward / Cegłowski, Michał / Schroeder, Grzegorz et al. | 2019
- 1019
-
Underwater Electrical Discharges: Temperature, Density and Basic Instability Features with Different Anode MaterialsBhattacharya, S. / Tiwari, N. / Mishra, A. / Mitra, S. / Dey, G. K. / Ghorui, S. et al. | 2019
- 1049
-
Optical Radiation Associated with Photobiological Hazards for Argon GTAW ArcsWang, Fei / Cressault, Yann / Teulet, Philippe / Li, Huan / Yang, Ke et al. | 2019
- 1071
-
Formation of CuCo Alloy From Their Oxide Mixtures Through Reduction by Low-Temperature Hydrogen PlasmaSabat, Kali Charan et al. | 2019
- 1087
-
Equilibrium Chemistry in $${\text {BCl}}_3$$–$${\text {H}}_2$$–Ar PlasmaGornushkin, I. B. / Shabanov, S. V. / Sennikov, P. G. et al. | 2019
- 1087
-
Equilibrium Chemistry in – –Ar PlasmaGornushkin, I. B. / Shabanov, S. V. / Sennikov, P. G. et al. | 2019
- 1103
-
Densities of Active Species in R/x%($ N_{2} $–5%$ H_{2} $) (R = Ar or He) Microwave Flowing AfterglowsRicard, A. / Sarrette, J. P. et al. | 2019
- 1115
-
Strong Sensitized Ultraviolet Luminescence from He–$ C_{2} $$ F_{4} $–NO Flowing Plasma Afterglow: A Route to Short-Wavelength Gas-Flow Lasers?Schmiedberger, Josef / Fuß, Werner / Juha, Libor et al. | 2019
- 1127
-
Etching Mechanisms and Surface Conditions for $ SiO_{x} $$ N_{y} $ Thin Films in $ CF_{4} $ + $ CHF_{3} $ + $ O_{2} $ Inductively Coupled PlasmaLee, Junmyung / Kim, Jihun / Efremov, Alexander / Kim, Changmok / Lee, Hyun Woo / Kwon, Kwang-Ho et al. | 2019
- 1145
-
A Study on the $ NF_{3} $ Plasma Etching Reaction with Cobalt Oxide Grown on Inconel Base Metal SurfaceLee, Jaeyong / Kim, Kyungmin / Kim, Yong-Soo et al. | 2019