Evolution in the concentration of activities in lithography (Englisch)
- Neue Suche nach: Levinson, Harry J.
- Neue Suche nach: Levinson, Harry J.
In:
Proc. SPIE
;
9776
; 977601
;
2016
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Elektronische Ressource
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Titel:Evolution in the concentration of activities in lithography
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Beteiligte:Levinson, Harry J. ( Autor:in )
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Kongress:Extreme Ultraviolet (EUV) Lithography VII ; 2016 ; San Jose,California,United States
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Erschienen in:Proc. SPIE ; 9776 ; 977601
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:18.03.2016
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ISBN:
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ISSN:
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DOI:
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Medientyp:Aufsatz (Konferenz)
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Format:Elektronische Ressource
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Sprache:Englisch
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Datenquelle:
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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EUV lithography performance for manufacturing: status and outlookPirati, Alberto / Peeters, Rudy / Smith, Daniel / Lok, Sjoerd / van Noordenburg, Martijn / van Es, Roderik / Verhoeven, Eric / Meijer, Henk / Minnaert, Arthur / van der Horst, Jan-Willem et al. | 2016
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Demonstration of an N7 integrated fab process for metal oxide EUV photoresistDe Simone, Danilo / Mao, Ming / Kocsis, Michael / De Schepper, Peter / Lazzarino, Frederic / Vandenberghe, Geert / Stowers, Jason / Meyers, Stephen / Clark, Benjamin L. / Grenville, Andrew et al. | 2016
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EUV process establishment through litho and etch for N7 nodeKuwahara, Yuhei / Kawakami, Shinichiro / Kubota, Minoru / Matsunaga, Koichi / Nafus, Kathleen / Foubert, Philippe / Mao, Ming et al. | 2016
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Improvement of EUV mix-match overlay for production implementationPark, Sarohan / Lee, ByoungHoon / Lee, Byong-Seog / Lee, Inwhan / Lim, Chang-Moon et al. | 2016
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3D mask effects of absorber geometry in EUV lithography systemsHaque, Riaz R. / Levinson, Zac / Smith, Bruce W. et al. | 2016
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Etched-multilayer black border formed on EUV mask: Does it cause image degradation during pattern inspection using EB optics?Amano, Tsuyoshi / Iida, Susumu / Hirano, Ryoichi / Abe, Tsukasa / Morikawa, Yasutaka / Watanabe, Hidehiro et al. | 2016
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Aerial imaging study of the mask-induced line-width roughness of EUV lithography masksWojdyla, Antoine / Donoghue, Alexander / Benk, Markus P. / Naulleau, Patrick P. / Goldberg, Kenneth A. et al. | 2016
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High-radiance LDP source: clean, reliable, and stable EUV source for mask inspectionTeramoto, Yusuke / Santos, Bárbara / Mertens, Guido / Kops, Ralf / Kops, Margarete / von Wezyk, Alexander / Bergmann, Klaus / Yabuta, Hironobu / Nagano, Akihisa / Ashizawa, Noritaka et al. | 2016
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Energy effective dual-pulse bispectral laser for EUV lithographyZhevlakov, A. P. / Seisyan, R. P. / Bespalov, V. G. / Elizarov, V. V. / Grishkanich, A. S. / Kascheev, S. V. / Sidorov, I. S. et al. | 2016
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Free electron lasers for 13nm EUV lithography: RF design strategies to minimise investment and operational costsKeens, Simon / Rossa, Bernhard / Frei, Marcel et al. | 2016
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Actinic review of EUV masks: performance data and status of the AIMS EUV SystemHellweg, Dirk / Perlitz, Sascha / Magnusson, Krister / Capelli, Renzo / Koch, Markus / Malloy, Matt et al. | 2016
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EUV mask and wafer defectivity: strategy and evaluation for full die defect inspectionBonam, Ravi / Tien, Hung-Yu / Chou, Acer / Meli, Luciana / Halle, Scott / Wu, Ivy / Huang, Xiaoxia / Lei, Chris / Kuan, Chiyan / Wang, Fei et al. | 2016
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Enhancing native defect sensitivity for EUV actinic blank inspection: optimized pupil engineering and photon noise studyWang, Yow-Gwo / Neureuther, Andrew / Naulleau, Patrick et al. | 2016
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Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generationHirano, Ryoichi / Iida, Susumu / Amano, Tsuyoshi / Watanabe, Hidehiro / Hatakeyama, Masahiro / Murakami, Takeshi / Suematsu, Kenichi / Terao, Kenji et al. | 2016
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Advances in the detection capability on actinic blank inspectionYamane, Takeshi / Amano, Tsuyoshi / Takagi, Noriaki / Watanabe, Hidehiro / Mori, Ichro / Ino, Tomohisa / Suzuki, Tomohiro / Takehisa, Kiwamu / Miyai, Hiroki / Kusunose, Haruhiko et al. | 2016
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Current development status of HSFET (High NA Small Field Exposure Tool) in EIDECTanaka, Satoshi / Magoshi, Shunko / Kawai, Hidemi / Inoue, Soichi / Rosenthal, Wylie / Girard, Luc / Marchetti, Lou / Kestner, Bob / Kincade, John et al. | 2016
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Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designsKim, Ryoung-Han / Wood, Obert / Crouse, Michael / Chen, Yulu / Plachecki, Vince / Hsu, Stephen / Gronlund, Keith et al. | 2016
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Evolution in the concentration of activities in lithographyLevinson, Harry J. et al. | 2016
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EUV progress toward HVM readinessTurkot, Britt / Carson, Steven L. / Lio, Anna / Liang, Ted / Phillips, Mark / McCool, Brian / Stenehjem, Eric / Crimmins, Tim / Zhang, Guojing / Sivakumar, Sam et al. | 2016
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