Methods for joint optimization of mask and design targets for improving lithographic process window (Unbekannt)
- Neue Suche nach: Banerjee, Shayak
- Neue Suche nach: Agarwal, Kanak B.
- Neue Suche nach: Orshansky, Michael
- Neue Suche nach: Banerjee, Shayak
- Neue Suche nach: Agarwal, Kanak B.
- Neue Suche nach: Orshansky, Michael
In:
Journal of Micro/Nanolithography, MEMS and MOEMS
;
12
, 2
;
023014
;
2013
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Methods for joint optimization of mask and design targets for improving lithographic process window
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Weitere Titelangaben:J. Micro/Nanolith. MEMS MOEMS
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Beteiligte:
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Erschienen in:Journal of Micro/Nanolithography, MEMS and MOEMS ; 12, 2 ; 023014
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Verlag:
- Neue Suche nach: Society of Photo-Optical Instrumentation Engineers
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Erscheinungsdatum:11.06.2013
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ISSN:
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Coden:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Unbekannt
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 12, Ausgabe 2
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