EUV pupil optimization for 32nm pitch logic structures (Englisch)
- Neue Suche nach: Rio, D.
- Neue Suche nach: Blanco, V.
- Neue Suche nach: Franke, J.-H.
- Neue Suche nach: Gillijns, W.
- Neue Suche nach: Dusa, M.
- Neue Suche nach: De Poortere, E.
- Neue Suche nach: Van Adrichem, P.
- Neue Suche nach: Lyakhova, K.
- Neue Suche nach: Spence, C.
- Neue Suche nach: Hendrickx, E.
- Neue Suche nach: Biesemans, S.
- Neue Suche nach: Nafus, K.
- Neue Suche nach: Rio, D.
- Neue Suche nach: Blanco, V.
- Neue Suche nach: Franke, J.-H.
- Neue Suche nach: Gillijns, W.
- Neue Suche nach: Dusa, M.
- Neue Suche nach: De Poortere, E.
- Neue Suche nach: Van Adrichem, P.
- Neue Suche nach: Lyakhova, K.
- Neue Suche nach: Spence, C.
- Neue Suche nach: Hendrickx, E.
- Neue Suche nach: Biesemans, S.
- Neue Suche nach: Nafus, K.
In:
Proc. SPIE
;
10809
; 108090N
;
2018
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Elektronische Ressource
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Titel:EUV pupil optimization for 32nm pitch logic structures
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Beteiligte:Rio, D. ( Autor:in ) / Blanco, V. ( Autor:in ) / Franke, J.-H. ( Autor:in ) / Gillijns, W. ( Autor:in ) / Dusa, M. ( Autor:in ) / De Poortere, E. ( Autor:in ) / Van Adrichem, P. ( Autor:in ) / Lyakhova, K. ( Autor:in ) / Spence, C. ( Autor:in ) / Hendrickx, E. ( Autor:in )
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Kongress:International Conference on Extreme Ultraviolet Lithography 2018 ; 2018 ; Monterey,California,United States
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Erschienen in:Proc. SPIE ; 10809 ; 108090N
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:03.10.2018
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ISBN:
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ISSN:
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DOI:
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Medientyp:Aufsatz (Konferenz)
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Format:Elektronische Ressource
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Sprache:Englisch
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Datenquelle:
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 108090A
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Non‐Gaussian CD distribution characterization for DRAM application in EUV lithographyVaglio Pret, Alessandro / Lee, Inhwan / Lim, Mijung / Blankenship, David / Graves, Trey / Robertson, Stewart A. / Biafore, John J. et al. | 2018
- 108090B
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Measurement and modeling of diffusion characteristics in EUV resistLong, Luke / Neureuther, Andrew / Naulleau, Patrick et al. | 2018
- 108090C
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Massive CD metrology for EUV failure characterization and EPE metrologyDillen, Harm / Chang, Yi-Hsin / Wang, Fei / Kea, Marc / Rispens, Gijsbert / Kooiman, Marleen / Wang, Fuming / Hunsche, Stefan / Tien, Daniel / Tang, Peng et al. | 2018
- 108090F
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Ion beam processing for critical EUV photomask process steps: mask blank deposition and photomask absorber etchRook, Katrina / Lee, Meng H. / Srinivasan, Narasimhan / Ip, Vincent / Kohli, Sandeep / Levoso, Mathew S. / Cerio, Frank / Devasahayam, Adrian J. et al. | 2018
- 108090L
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Evaluation of EUV resists for 5nm technology node and beyondTasdemir, Zuhal / Wang, Xiaolong / Mochi, Iacopo / van Lent-Protasova, Lidia / Meeuwissen , Marieke / Custers, Rolf / Rispens, Gijsbert / Hoefnagels, Rik / Ekinci, Yasin et al. | 2018
- 108090M
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Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300Van Look , Lieve / Bekaert, Joost / Frommhold, Andreas / Hendrickx, Eric / Rispens, Gijsbert / Schiffelers, Guido et al. | 2018
- 108090N
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EUV pupil optimization for 32nm pitch logic structuresRio, D. / Blanco, V. / Franke, J.-H. / Gillijns, W. / Dusa, M. / De Poortere, E. / Van Adrichem, P. / Lyakhova, K. / Spence, C. / Hendrickx, E. et al. | 2018
- 108090O
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Rapid image-based pupil plane characterization for EUV lithography systemsLevinson, Zac / Verduijn, Erik / Brunner, Timothy / Wood, Obert / Smith, Bruce W. et al. | 2018
- 108090Q
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Phase defect inspection on EUV masks using RESCANRajeev, Rajendran / Mochi, Iacopo / Kazazis, Dimitrios / Fernandez, Sara / Li-Teng, Tseng / Helfenstein, Patrick / Ekinci, Yasin et al. | 2018
- 108090R
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Development of full-size EUV pellicle with thermal emission layer coatingHong, Juhee / Park, Chulkyun / Lee, Changhun / Nam, Keesoo / Jang, Yongju / Wi, Seongju / Ahn, Jinho et al. | 2018
- 108090T
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EUV mask characterization with actinic scatterometrySherwin, Stuart / Neureuther, Andrew / Naulleau, Patrick et al. | 2018
- 108090U
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State-of-the-art of EUV materials for N5 logic and DRAM applicationsDe Simone, Danilo / Vesters, Yannick / Venelderen, Pieter / Ran, Xue / Pollentier, Ivan / Vandenberghe, Geert et al. | 2018
- 108090V
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Using resonant soft x-ray scattering to image patterns on undeveloped resistsFreychet, Guillaume / Cordova, Isvar A. / McAfee, Terry / Kumar, Dinesh / Pandolfi, Ronald J. / Anderson, Chris / Naulleau, Patrick / Wang, Cheng / Hexemer, Alexander et al. | 2018
- 108090X
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New resist and underlayer approaches toward EUV lithographyRantala, Juha / Gädda, Thomas / Laukkanen, Markus / Dang, Luong Nguyen / Karaste, Kimmo / Kazizis, Dimitrios / Ekinci, Yasin et al. | 2018
- 108091A
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Holographic masks for computational proximity lithography with EUV radiationDeuter, V. / Grochowicz, M. / Brose, S. / Biller, J. / Danylyuk, S. / Taubner, T. / Grützmacher, D. / Juschkin, L. et al. | 2018
- 108091E
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A tool for full area inband EUV transmission mapping of EUV pelliclesPampfer, C. / Biermanns-Föth, A. / Missalla, T. / Arps, J. / Phiesel, C. / Piel, C. / Lebert, R. et al. | 2018
- 108091G
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Pattern degradation with larger particles on EUV pellicleNo, Hee-Ra / Lee, Sung-Gyu / Oh, Se-Hun / Oh, Hye-Keun et al. | 2018
- 108091H
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Defect avoidance for extreme ultraviolet mask defects using intentional pattern deformationChae, Yoo-Jin / Jonckheere, Rik / Gupta, Puneet et al. | 2018
- 108091I
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AIMERTM: full reticle area, scanner-effective EUV mapping reflectometryBiermanns-Föth, A. / Phiesel, C. / Missalla, T. / Arps, J. / Piel, C. / Lebert, R. et al. | 2018
- 108091L
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NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250WFomenkov, Igor V. / Purvis, Michael A. / Schafgans, Alexander A. / Tao, Yezheng / Rokitski, Slava / Stewart, Jayson / LaForge, Andrew / Ershov, Alexander I. / Rafac, Robert J. / De Dea, Silvia et al. | 2018
- 108091M
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Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic fieldNishimura, Yuichi / Hori, Tsukasa / Yabu, Takayuki / Wakana, Katsuhiko / Ueno, Yoshifumi / Soumagne, Georg / Nagai, Shinji / Yanagida, Tatsuya / Kawasuji, Yasufumi / Shiraishi, Yutaka et al. | 2018
- 108091Q
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Debris-free high-brightness light source based on LPP for actinic EUV microscopy and metrology applicationsKoshelev, Konstantin / Vinokhodov, Alexander / Yakushev, Oleg / Yakushkin, Alexey / Abramenko, Dimitri / Lash, Alexander / Krivokorytov, Mikhail / Sidelnikov, Yuri / Ivanov, Vladimir / Krivtsun, Vladimir et al. | 2018
- 108091R
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A possible wafer heating during EUV exposureOh, Se-Hun / Lee, Sung-Gyu / Park, Jae-Hun / Ban, Chung-Hyun / Oh, Hye-Keun et al. | 2018
- 108091S
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Lateral shearing interferometry for high-NA EUV wavefront metrologyZhu, Wenhua / Miyakawa, Ryan / Chen, Lei / Naulleau, Patrick et al. | 2018
- 108091T
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Reflectance measurement of EUV mirrors withs-andp-polarized light using polarization control unitsHarada, Tetsuo / Watanabe, Takeo et al. | 2018
- 108091U
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Spatially resolved reflectometry for EUV optical componentsScholze, Frank / Fischer, Andreas / Tagbo, Claudia / Buchholz, Christian / Soltwisch, Victor / Laubis, Christian et al. | 2018
- 108091V
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Actinic tools for EUV resist characterization in research and productionLebert, R. / Missalla, T. / Phiesel, C. / Piel, C. / Brose, S. / Danylyuk, S. / Loosen, P. / Bergmann, K. / Vieker, J. et al. | 2018
- 108091W
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In-situ measurement of outgassing generated from EUV metal oxide nanoparticles resist during electron irradiationMinami, Y. / Takahashi, S. / Minami, H. / Matsumoto, Y. / Kadoi, M. / Sekiguchi, A. / Watanabe, T. et al. | 2018
- 108091X
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EUV sensitizer for resists and spin-on-carbon materialsSato, Takashi / Togashi, Yuta / Shinjo, Sachiko / Toida, Takumi / Makinoshima, Takashi / Echigo, Masatoshi et al. | 2018
- 108091Y
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Development of absorption-coefficient-measurement method of EUV resist by direct-resist coating on a photodiodeNiihara, Shota / Harada, Tetsuo / Watanabe, Takeo et al. | 2018
- 108091Z
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Studying resist performance for contact holes printing using EUV interference lithographyWang, Xiaolong / Tseng, Li-Ting / Kazazis, Dimitrios / Tasdemir , Zuhal / Vockenhuber, Michaela / Mochi, Iacopo / Ekinci, Yasin et al. | 2018
- 1080901
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Front Matter: Volume 10809| 2018
- 1080902
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Accelerate lithography improvement for high performance computingChen, John Y. et al. | 2018
- 1080903
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Current challenges and opportunities for EUV lithographyLevinson, Harry J. / Brunner, Timothy A. et al. | 2018
- 1080904
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EUV industrialization high volume manufacturing with NXE3400BMastenbroek, Marcel et al. | 2018
- 1080905
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NXE:3400B imaging performance assessed from a customer perspectiveWittebrood, Friso / Schiffelers, Guido / Legein, Colette et al. | 2018
- 1080907
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Accelerator-based compact extreme ultraviolet (EUV) sources for lithographyWu, Juhao / Chao, Alexander W. et al. | 2018
- 1080909
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EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systemsSah, Kaushik / Cross, Andrew / Plihal, Martin / Anantha, Vidyasagar / Babulnath, Raghav / Fung, Derek / De Bisschop, Peter / Halder, Sandip et al. | 2018
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Integration via 3rd dimension: 3D power scalingGargini, Paolo A. et al. | 2018
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Benchmarking of EUV lithography line/space patterning versus immersion lithography multipatterning schemes at equivalent pitchRaley, Angélique / Mack, Chris / Thibaut, Sophie / Liu, Eric / Ko, Akiteru et al. | 2018
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Study of resist hardmask interaction through surface activation layersDe Silva, Anuja / Meli, Luciana / Guo, Jing / Church, Jennifer / Felix, Nelson M. / Goldfarb, Dario L. / Kumar, Bharat / Wojtecki, Rudy J. / Mettry, Magi / Hess, Alexander et al. | 2018
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Optimization of absorber and multilayer in EUV mask for 1D and 2D patternsYang, Zhizhen / Fan, Taian / Dong, Lisong / Wei, Yayi / Wang, Yanrong / Zhang, Jing / Yan, Jiang et al. | 2018
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Track based techniques to improve high-resolution EUV patterning defectivityShibata, Naoki / Huli, Lior / Lemley, Corey / Hetzer, Dave / Liu, Eric / Akiteru, Ko / Kawakami, Shinichiro / Petrillo, Karen / Meli, Luciana / Felix, Nelson et al. | 2018
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Improvement of CD stability and defectivity in resist coating and developing process in EUV lithography processKamei, Yuya / Kawakami, Shinichiro / Tadokoro, Masahide / Hashimoto, Yusaku / Shimoaoki, Takeshi / Enomoto, Masashi / Nafus, Kathleen / Sonoda, Akihiro / Foubert, Philippe et al. | 2018