New indexes of the 0.5-μm resolution resist for optical lithography (Englisch)
- Neue Suche nach: Sugimoto, Aritoshi
- Neue Suche nach: Ito, Tetsuo
- Neue Suche nach: Okano, Sadao
- Neue Suche nach: Nozaki, Masahiro
- Neue Suche nach: Kato, Takeshi
- Neue Suche nach: Suko, Kazuyuki
- Neue Suche nach: Tsunematsu, Masayasu
- Neue Suche nach: Kadota, Kazuya
- Neue Suche nach: Sugimoto, Aritoshi
- Neue Suche nach: Ito, Tetsuo
- Neue Suche nach: Okano, Sadao
- Neue Suche nach: Nozaki, Masahiro
- Neue Suche nach: Kato, Takeshi
- Neue Suche nach: Suko, Kazuyuki
- Neue Suche nach: Tsunematsu, Masayasu
- Neue Suche nach: Kadota, Kazuya
In:
Proc. SPIE
;
1264
; 413
;
1990
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Elektronische Ressource
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Titel:New indexes of the 0.5-μm resolution resist for optical lithography
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Beteiligte:Sugimoto, Aritoshi ( Autor:in ) / Ito, Tetsuo ( Autor:in ) / Okano, Sadao ( Autor:in ) / Nozaki, Masahiro ( Autor:in ) / Kato, Takeshi ( Autor:in ) / Suko, Kazuyuki ( Autor:in ) / Tsunematsu, Masayasu ( Autor:in ) / Kadota, Kazuya ( Autor:in )
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Kongress:Optical/Laser Microlithography III ; 1990 ; San Jose,CA,United States
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Erschienen in:Proc. SPIE ; 1264 ; 413
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.06.1990
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ISBN:
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ISSN:
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DOI:
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Medientyp:Aufsatz (Konferenz)
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Format:Elektronische Ressource
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Sprache:Englisch
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Datenquelle:
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 2
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Methods to print optical images at low-k1factorsLin, Burn J. et al. | 1990
- 14
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Phase-shifting mask and FLEX method for advanced photolithographyFukuda, Hiroshi / Imai, Akira / Okazaki, Shinji et al. | 1990
- 26
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Considerations on the focus latitude for G-line and DUV resistsDammel, Ralph R. / Lindley, Charlet R. / Meier, Winfried / Pawlowski, Georg / Theis, Juergen / Henke, Wolfgang et al. | 1990
- 40
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Assessment of high-contrast G- and I-line resists using high-numerical-aperture exposure toolsGutmann, Alois / Binder, Johann / Czech, Guenther / Karl, Juergen / Mader, Leonhard / Sarlette, Daniel / Henke, Wolfgang et al. | 1990
- 54
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Characterization of an asymmetric nonlinear component of process-induced distortion in thermally stressed silicon wafersHerrington, Paul T. / Woolery, Bruce E. et al. | 1990
- 61
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Deep-ultraviolet lithography for 500-nm devicesHolmes, Steven J. / Levy, Ruth / Bergendahl, Albert S. / Holland, Karey L. / Maltabes, John G. / Knight, Stephen E. / Norris, Katherine C. / Poley, Denis et al. | 1990
- 71
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Algorithm for optimizing stepper performance through image manipulationMack, Chris A. et al. | 1990
- 84
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Image quality of higher NA I-line projection lensNakamura, Shinichi / Matsumoto, Koichi / Ushida, Kazuo / Kameyama, Masaomi et al. | 1990
- 94
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High-numerical-aperture I-line stepperKatz, Barton A. / Greeneich, James S. / Bigelow, Mark G. / Katz, Ann / van Hout, Frits J. / Coolsen, Jos F. et al. | 1990
- 127
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0.5-μm photolithography using high-numerical-aperture I-line wafer steppersArnold, William H. / Minvielle, Anna Maria / Phan, Khoi A. / Singh, Bhanwar / Templeton, Michael K. et al. | 1990
- 144
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Dry etching for high-resolution maskmakingTedesco, Serge V. / Pierrat, Christophe / Lamure, Jean M. / Sourd, C. / Martin, Jean-Luc / Guibert, Jean C. et al. | 1990
- 158
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0.5-μm optical mask process for 364-nm scanned laser lithographyBuck, Peter D. et al. | 1990
- 167
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New phase-shifting mask with highly transparent SiO2phase shiftersHanyu, Isamu / Asai, Satoru / Kosemura, Kinjiro / Ito, Hiroshi / Nunokawa, Mitsuji / Abe, Masayuki et al. | 1990
- 178
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Recent advances in prepellicle mask cleaningPlambeck, Bert F. / Cerio, Mark D. / Reynolds, James A. et al. | 1990
- 194
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Precise alignment using optical phase-shifting techniqueXu, Yiping et al. | 1990
- 203
-
Modeling of optical alignment and metrology schemes used in integrated circuit manufacturingYuan, Chi-Min / Strojwas, Andrzej J. et al. | 1990
- 219
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Heterodyne holographic nanometer alignment for a half-micron wafer stepperYamashita, Kazuhiro / Nomura, Noboru / Kubo, Keiji / Yamada, Yuichirou / Suzuki, Masaki et al. | 1990
- 227
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Evaluation of a silicon trench alignment target strategyFlores, Gary E. / Flack, Warren W. et al. | 1990
- 244
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Chip leveling and focusing with laser interferometryOshida, Yoshitada / Tanaka, Minoru / Tanimoto, Tetsuzou / Kurosaki, Toshiei et al. | 1990
- 252
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0.10-μm overlay for DRAM production using step and scanSewell, Harry / Smith, Scott J. / Galburt, Daniel N. et al. | 1990
- 263
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Enhanced structures for through-the-lens alignment with DUV lithographySabersky, Andrew P. / Naber, Robert J. / Riddell, Kevin G. et al. | 1990
- 278
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Modeling latent image formation in photolithography using the Helmholtz equationUrbach, H. P. / Bernard, Douglas A. et al. | 1990
- 294
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Simulation of scattering effects in photolithographyTol, A. J. W. / Maxwell, Graeme D. / Urbach, H. P. / Visser, Robert J. et al. | 1990
- 309
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Photolithography simulation on nonplanar substratesYeung, Michael S. et al. | 1990
- 322
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Investigation of reflective notching with massively parallel simulationTadros, Karim H. / Neureuther, Andrew R. / Gamelin, John K. / Guerrieri, Roberto et al. | 1990
- 334
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Comprehensive 3-D notching simulator with nonplanar substratesBarouch, Eytan / Bradie, Brian D. / Hollerbach, Uwe / Karniadakis, George / Orszag, Steven A. et al. | 1990
- 343
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Microcircuit lithography using holographic imagingChen, Ray T. / Aye, Tin M. / Sadovnik, Lev S. / Pelka, David G. / Jannson, Tomasz P. et al. | 1990
- 350
-
Evaluating pattern transfer lenses for deep-UV laser-induced processesSolaro, Gerhard / Keckeis, Erich / Bachmann, Friedrich G. et al. | 1990
- 362
-
Direct writing on structured substrate by pyrolytic laser depositionFarkas, Janos / Hamori, Andras / Szabo, Zsolt et al. | 1990
- 369
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Investigation of phase-conjugated stimulated Brillouin scattering at 248 nm for application to photolithographyPfau, Anton K. / Proch, Detlev / Bachmann, Friedrich G. et al. | 1990
- 379
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Quantitative evaluation method for practical resolution by integration factor in optical lithographyOhtsuka, Hiroshi / Abe, Kazutoshi / Taguchi, Takeshi et al. | 1990
- 387
-
Alignment performance of a 0.6-NA 364-nm laser direct writerBohan, Michael J. et al. | 1990
- 401
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Optimal binary image design for optical lithographyLiu, Yong / Zakhor, Avideh et al. | 1990
- 413
-
New indexes of the 0.5-μm resolution resist for optical lithographySugimoto, Aritoshi / Ito, Tetsuo / Okano, Sadao / Nozaki, Masahiro / Kato, Takeshi / Suko, Kazuyuki / Tsunematsu, Masayasu / Kadota, Kazuya et al. | 1990
- 422
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Considering Babinet principle for optical lithography resolution limit exceeding classical resolving powerDusa, Mircea V. / Nicolau, Dan V. / Fulga, Florin et al. | 1990
- 431
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Simulation and experimental results in O.6-μm lithography using an I-line stepperBauer, Joachim J. / Mehr, Wolfgang / Glaubitz, Ulrich / Baborski, H. / Haase, Norbert / Mueller, Jens-Ullrich et al. | 1990
- 446
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Plasma etching of chrome masks using PBS resistBell, Guido / Spierer, H. et al. | 1990
- 454
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Resolution performance of a 0.60-NA, 364-nm laser direct writerAllen, Paul C. / Buck, Peter D. et al. | 1990
- 466
-
Evaluation of resists using ArF excimer laser projection lithographySasago, Masaru / Tani, Yoshiyuki / Endo, Masayuki / Nomura, Noboru et al. | 1990
- 477
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Effect of central obscuration on image formation in projection lithographyYang, Steven T. / Hsieh, Robert L. / Lee, Y.-H. / Pease, Roger Fabian W. / Owen, Gerry et al. | 1990
- 486
-
Advances in deep-UV lithographyOlson, Setha G. / Sparkes, Christopher et al. | 1990
- 496
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High-repetition-rate KrF lithography excimer laser with narrow bandwidth below 2 pmLokai, Peter / Rebhan, Ulrich / Oesterlin, Peter / Kahlert, Hans-Juergen / Basting, Dirk et al. | 1990
- 505
-
Measurements of beam characteristics relevant to DUV microlithography on a KrF excimer laserSandstrom, Richard L. et al. | 1990
- 520
-
High-power and narrow-band excimer laser with a polarization-coupled resonatorFuruya, Nobuaki / Ono, Takuhiro / Horiuchi, Naoya / Yamanaka, Keiichiro / Miyata, Takeo et al. | 1990
- 534
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Deep-UV wafer stepper with through-the-lens wafer to reticle alignmentWittekoek, Stefan / van den Brink, Martin A. / Linders, Henk F. / Stoeldraijer, Judon M. D. / Martens, J. W. / Ritchie, Douglas R. et al. | 1990
- 548
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Design and performance of a production-oriented deep-UV wafer stepperHollman, Richard F. / Cleveland, Frederick / Da Silveira, Elvino M. / McCleary, Roger W. / Strauten, Robert W. et al. | 1990
- 556
-
Reduction lens and illumination system for deep-UV alignersLiegel, Juergen W. / Ittner, Gerhard P. / Glatzel, Erhard / Wangler, Johannes et al. | 1990
- 564
-
Characterization methods for excimer exposure of deep-UV pelliclesPartlo, William N. / Oldham, William G. et al. | 1990
- 578
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Image-height offset in TTL on-axis alignment methodIshio, Noriaki / Fujiwara, Keiji / Nagata, Hitoshi et al. | 1990