0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography (Englisch)
- Neue Suche nach: Vorbringer-Doroshovets, Nataliya
- Neue Suche nach: Balzer, Felix
- Neue Suche nach: Fuessl, Roland
- Neue Suche nach: Manske, Eberhard
- Neue Suche nach: Kaestner, Marcus
- Neue Suche nach: Schuh, Andreas
- Neue Suche nach: Zoellner, Jens-Peter
- Neue Suche nach: Hofer, Manuel
- Neue Suche nach: Guliyev, Elshad
- Neue Suche nach: Ahmad, Ahmad
- Neue Suche nach: Ivanov , Tzvetan
- Neue Suche nach: Rangelow, Ivo W.
- Neue Suche nach: Vorbringer-Doroshovets, Nataliya
- Neue Suche nach: Balzer, Felix
- Neue Suche nach: Fuessl, Roland
- Neue Suche nach: Manske, Eberhard
- Neue Suche nach: Kaestner, Marcus
- Neue Suche nach: Schuh, Andreas
- Neue Suche nach: Zoellner, Jens-Peter
- Neue Suche nach: Hofer, Manuel
- Neue Suche nach: Guliyev, Elshad
- Neue Suche nach: Ahmad, Ahmad
- Neue Suche nach: Ivanov , Tzvetan
- Neue Suche nach: Rangelow, Ivo W.
In:
Proc. SPIE
;
8680
; 868018
;
2013
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Elektronische Ressource
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Titel:0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography
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Beteiligte:Vorbringer-Doroshovets, Nataliya ( Autor:in ) / Balzer, Felix ( Autor:in ) / Fuessl, Roland ( Autor:in ) / Manske, Eberhard ( Autor:in ) / Kaestner, Marcus ( Autor:in ) / Schuh, Andreas ( Autor:in ) / Zoellner, Jens-Peter ( Autor:in ) / Hofer, Manuel ( Autor:in ) / Guliyev, Elshad ( Autor:in ) / Ahmad, Ahmad ( Autor:in )
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Kongress:Alternative Lithographic Technologies V ; 2013 ; San Jose,California,USA
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Erschienen in:Proc. SPIE ; 8680 ; 868018
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:26.03.2013
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ISBN:
-
ISSN:
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DOI:
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Medientyp:Aufsatz (Konferenz)
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Format:Elektronische Ressource
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Sprache:Englisch
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Datenquelle:
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 86800C
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Defect reduction for semiconductor memory applications using jet and flash imprint lithographyYe, Zhengmao / Luo, Kang / Irving, J. W. / Lu, Xiaoming / Zhang, Wei / Fletcher, Brian / Liu, Weijun / Xu, Frank / LaBrake, Dwayne / Resnick, Douglas et al. | 2013
- 86800D
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Novel fluorinated compounds for releasing material in nanoimprint lithographyYamashita, Tsuneo / Mitsuhashi, Hisashi / Morita, Masamichi et al. | 2013
- 86800F
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New materials and processes for directed self-assemblyChang, Shih-wei / Evans, Jessica P. / Ge, Shouren / Ginzburg, Valeriy V. / Kramer, John W. / Landes, Brian / Lee, Christopher / Meyers, Greg F. / Murray, Daniel J. / Park, Jong et al. | 2013
- 86800H
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Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chipGubiotti, Thomas / Sun, Jeff Fuge / Freed, Regina / Kidwingira, Francoise / Yang, Jason / Bevis, Chris / Carroll, Allen / Brodie, Alan / Tong, William M. / Lin, Shy-Jay et al. | 2013
- 86800I
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Development of maskless electron-beam lithography using nc-Si electron-emitter arrayKojima, A. / Ikegami, N. / Yoshida, T. / Miyaguchi, H. / Muroyama, M. / Nishino, H. / Yoshida, S. / Sugata, M. / Cakir, S. / Ohyi, H. et al. | 2013
- 86800J
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Matching of beams on the MAPPER MATRIX tool: a simulation studyBelledent, J. / Berglund, G. Z. M. / Brandt, P. L. / Bérard-Bergery, S. / Wieland, M. J. / Pain, L. et al. | 2013
- 86800L
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Defect source analysis of directed self-assembly process (DSA of DSA)Rincon Delgadillo, Paulina / Harukawa, Ryota / Suri, Mayur / Durant, Stephane / Cross, Andrew / Nagaswami, Venkat R. / Van Den Heuvel, Dieter / Gronheid, Roel / Nealey, Paul et al. | 2013
- 86800O
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MAPPER: progress toward a high-volume manufacturing systemde Boer, G. / Dansberg, M. P. / Jager, R. / Peijster, J. J. M. / Slot, E. / Steenbrink, S. W. H. K. / Wieland, M. J. et al. | 2013
- 86800P
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Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patternsHartley, John G. / Crosland, Nigel / Dowling, Robert C. / Hoyle, Philip C. / McClelland, Andrew / Turnidge, Martin / Smith, James H. et al. | 2013
- 86800Q
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Data delivery system for MAPPER using image compressionYang, Jeehong / Savari, Serap A. et al. | 2013
- 86800W
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High performance wire grid polarizers using jet and flashTMimprint lithographyAhn, Sean / Yang, Jack / Miller, Mike / Ganapathisubramanian, Maha / Menezes, Marlon / Choi, Jin / Xu, Frank / Resnick, Douglas J. / Sreenivasan, S. V. et al. | 2013
- 86800Y
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Deterministically isolated gratings through the directed self-assembly of block copolymersDoerk, Gregory S. / Cheng, Joy Y. / Rettner, Charles T. / Balakrishnan, Srinivasan / Arellano, Noel / Sanders, Daniel P. et al. | 2013
- 86800Z
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Computational solution of inverse directed self-assembly problemLatypov, Azat et al. | 2013
- 86801A
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Influence of high-energy electron irradiation on ultra-low-k characteristics and transistor performanceSteidel, Katja / Choi, Kang-Hoon / Freitag, Martin / Gutsch, Manuela / Hohle, Christoph / Seidel, Robert / Thrun, Xaver / Werner, Thomas et al. | 2013
- 86801B
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A dose modification strategy of electron beam direct writing considering TDDB reliability in LSI interconnectsMidoh, Yoshihiro / Osaki, Atsushi / Nakamae, Koji et al. | 2013
- 86801C
-
Influence of data volume and EPC on process window in massively parallel e-beam direct writeLin, Shy-Jay / Liu, Pei-Yi / Chen, Cheng-Hung / Wang, Wen-Chuan / Shin , Jaw-Jung / Lin, Burn Jeng / McCord, Mark A. / Shriyan, Sameet K. et al. | 2013
- 86801E
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MAPPER alignment sensor evaluation on process wafersVergeer, N. / Lattard, L. / de Boer, G. / Couweleers, F. / Dave, D. / Pradelles, J. / Bustos, J. et al. | 2013
- 86801F
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Fabrication of 28nm pitch Si fins with DSA lithographySchmid, Gerard / Farrell, Richard / Xu, Ji / Park, Chanro / Preil, Moshe / Chakrapani, Vidhya / Mohanty, Nihar / Ko, Akiteru / Cicoria, Michael / Hetzer, David et al. | 2013
- 86801G
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Directed self-assembly process implementation in a 300mm pilot line environmentLiu, Chi-Chun / Estrada-Raygoza, I. Cristina / Abdallah, Jassem / Holmes, Steven / Yin, Yunpeng / Schepis, Anthony / Cicoria, Michael / Hetzer, David / Tsai, Hsinyu / Guillorn, Michael et al. | 2013
- 86801H
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Process sensitivities in exemplary chemo-epitaxy directed self-assembly integrationRincon Delgadillo, Paulina A. / Gronheid, Roel / Lin , Guanyang / Cao, Yi / Romo, Ainhoa / Somervell , Mark / Nafus , Kathleen / Nealey , Paul F. et al. | 2013
- 86801I
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Large-scale dynamics of directed self-assembly defects on chemically pre-patterned surfaceYoshimoto, Kenji / Taniguchi, Takashi et al. | 2013
- 86801J
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Dissipative particle dynamics study on directed self-assembly in holesNakano, T. / Matsukuma, M. / Matsuzaki, K. / Muramatsu, M. / Tomita, T. / Kitano, T. et al. | 2013
- 86801K
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Dissipative particle dynamics simulations to optimize contact hole shrink process using graphoepitaxial directed self-assemblySato, Hironobu / Yonemitsu, Hiroki / Seino, Yuriko / Kato, Hirokazu / Kanno, Masahiro / Kobayashi, Katsutoshi / Kawanishi, Ayako / Kodera, Katsuyoshi / Azuma, Tsukasa et al. | 2013
- 86801L
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Computational simulation of block copolymer directed self-assembly in small topographical guiding templatesYi, He / Latypov, Azat / Wong, H.-S. Philip et al. | 2013
- 86801M
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Polymer blends for directed self-assemblyNamie, Yuuji / Anno, Yusuke / Naruoka, Takehiko / Minegishi, Shinya / Nagai, Tomoki / Hishiro, Yoshi / Yamaguchi, Yoshikazu et al. | 2013
- 86801P
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Multifunctional hardmask neutral layer for directed self-assembly (DSA) patterningGuerrero, Douglas J. / Hockey, Mary Ann / Wang, Yubao / Calderas, Eric et al. | 2013
- 86801Q
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Perpendicular orientation of block-co-polymer on controlled neutralization layerShiono, Daiju / Kurosawa, Tsuyoshi / Miyashita, Kenichiro / Matsumiya, Tasuku / Miyagi, Ken / Ohmori, Katsumi et al. | 2013
- 86801R
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Block-copolymer healing of simple defects in a chemoepitaxial templatePatrone, Paul N. / Gallatin, Gregg M. et al. | 2013
- 86801S
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Using process monitor wafers to understand directed self-assembly defectsCao, Yi / Her, YoungJun / Delgadillo, Paulina R. / Vandenbroeck, Nadia / Gronheid, Roel / Chan, Boon Teik / Hashimoto, Yukio / Romo, Ainhoa / Somervell, Mark / Nafus, Kathleen et al. | 2013
- 86801U
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Orientation and position-controlled block copolymer nanolithography for bit-patterned mediaYamamoto, R. / Kanamaru, M. / Sugawara, K. / Sasao, N. / Ootera, Y. / Okino, T. / Hieda, H. / Kihara, N. / Kamata, Y. / Kikitsu, A. et al. | 2013
- 86802A
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Contrast enhanced exposure strategy in multi-beam mask writingBelic, Nikola / Hofmann, Ulrich / Klikovits, Jan / Martens, Stephan et al. | 2013
- 86802B
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Sub-22 nm silicon template nanofabrication by advanced spacer patterning technique for NIL applicationsPark, Jong-Moon / Park, Kun-Sik / Kim, Dong-Pyo / Yoo, Seong-Ook / Lee, Jin-Ho et al. | 2013
- 86802C
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A process for low cost wire grid polarizersWatts, M. P. C. / Little, M. / Egan, E. / Hochbaum, A. / Johns, C. / Stephansen, S. et al. | 2013
- 86802E
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Process enhancements for negative tone development (NTD)Noya, Go / Yamamoto, Kazuma / Matsumoto, Naoki / Takemura, Yukie / Ishii, Maki / Miyamoto, Yoshihiro / Ishii, Masahiro / Nagahara, Tatsuro / Pawlowski, Georg et al. | 2013
- 86802F
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Direct electron beam patterning of sub-5nm monolayer graphene interconnectsQi, Zhengqing J. / Rodríguez-Manzo, Julio A. / Hong, Sung Ju / Park, Yung Woo / Stach, Eric A. / Drndić, Marija / Johnson, A. T. Charlie et al. | 2013
- 868001
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Front Matter: Volume 8680| 2013
- 868004
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Electron multi-beam technology for mask and wafer writing at 0.1nm address gridPlatzgummer, Elmar / Klein, Christof / Loeschner, Hans et al. | 2013
- 868006
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Scaling-down lithographic dimensions with block-copolymer materials: 10nm-sized features with PS-b-PMMAChevalier, X. / Nicolet, C. / Tiron, R. / Gharbi, A. / Argoud, M. / Pradelles, J. / Delalande, M. / Cunge, G. / Fleury, G. / Hadziioannou, G. et al. | 2013
- 868009
-
Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymersChuang, Ya-Mi / Cheng, Han-Hao / Jack, Kevin / Whittaker, Andrew / Blakey, Idriss et al. | 2013
- 868010
-
Design strategy of small topographical guiding templates for sub-15nm integrated circuits contact hole patterns using block copolymer directed self assemblyYi, He / Bao, Xin-Yu / Tiberio, Richard / Wong, H.-S. Philip et al. | 2013
- 868011
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Patterning process for semiconductor using directed self assemblyNam, Jaewoo / Kim, Eun Sung / Kang, Daekeun / Yu, Hangeun / Kim, Kyoungseon / Yi, Shiyong / Shin, Chul-Ho / Kang, Ho-Kyu et al. | 2013
- 868012
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The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplicationTiron, R. / Gharbi, A. / Argoud, M. / Chevalier, X. / Belledent, J. / Pimmenta Barros, P. / Servin, I. / Navarro, C. / Cunge, G. / Barnola, S. et al. | 2013
- 868013
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Exploration of the directed self-assembly based nano-fabrication design space using computational simulationsLatypov, Azat / Preil, Moshe / Schmid, Gerard / Xu, Ji / Yi, He / Yoshimoto, Kenji / Zou, Yi et al. | 2013
- 868014
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The hole shrink problem: Theoretical studies of directed self-assembly in cylindrical confinementLaachi, Nabil / Delaney, Kris T. / Kim, Bongkeun / Hur, Su-Mi / Bristol, Robert / Shykind, David / Weinheimer, Corey J. / Fredrickson, Glenn H. et al. | 2013
- 868015
-
Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics methodKodera, Katsuyoshi / Maeda, Shimon / Tanaka, Satoshi / Mimotogi, Shoji / Seino, Yuriko / Yonemitsu, Hiroki / Sato, Hironobu / Azuma, Tsukasa et al. | 2013
- 868016
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Defectivity study of directed self-assembly of cylindrical diblock copolymers in laterally confined thin channelsKim, Bongkeun / Laachi, Nabil / Fredrickson, Glenn H. et al. | 2013
- 868017
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Scanning probe lithography approach for beyond CMOS devicesDurrani, Zahid / Jones, Mervyn / Kaestner, Marcus / Hofer, Manuel / Guliyev, Elshad / Ahmad, Ahmad / Ivanov, Tzvetan / Zoellner, Jens-Peter / Rangelow, Ivo W. et al. | 2013
- 868018
-
0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithographyVorbringer-Doroshovets, Nataliya / Balzer, Felix / Fuessl, Roland / Manske, Eberhard / Kaestner, Marcus / Schuh, Andreas / Zoellner, Jens-Peter / Hofer, Manuel / Guliyev, Elshad / Ahmad, Ahmad et al. | 2013
- 868019
-
Mix & match electron beam & scanning probe lithography for high throughput sub-10 nm lithographyKaestner, Marcus / Hofer, Manuel / Rangelow, Ivo W. et al. | 2013
- 868020
-
Effects of block copolymer polydispersity and χN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymersPeters, Andrew J. / Lawson, Richard A. / Ludovice, Peter J. / Henderson, Clifford L. et al. | 2013
- 868021
-
Alignment strategy for mixed e-beam and optical lithographyDuval, Paul / Tabatabaie-Alavi, Kamal / Shaw, Dale / St. Germain, Alan et al. | 2013
- 868022
-
Block co-polymer multiple patterning directed self-assembly on PS-OH brush layer and AFM based nanolithographyOria, Lorea / de Luzuriaga, Alaitz Ruiz / Alduncín, Juan Antonio / Pérez-Murano, Francesc et al. | 2013
- 868023
-
Image contrast of line-cut / contact hole features in Complementary E-Beam Lithography (CEBL)Liu, Enden D. / Tran, Cong / Lam, David K. / Prescop, Ted et al. | 2013
- 868024
-
Direct-write maskless lithography using patterned oxidation of Si-substrate Induced by femtosecond laser pulsesKiani, Amirkianoosh / Venkatakrishnan, Krishnan / Tan, Bo et al. | 2013
- 868025
-
A slim column cell of 12nm resolution for wider application of e-beam lithographyYamada, Akio / Tanaka, Hitoshi / Abe, Tomohiko / Shimizu, Youichi et al. | 2013
- 868026
-
Practical study on the electron-beam-only alignment strategy for the electron beam direct writing technologyKojima, Yoshinori / Takahashi, Yasushi / Ohshio, Shuzo / Sugatani, Shinji / Kon, Junichi et al. | 2013
- 868027
-
Practical proof of CP element based design for 14nm node and beyondMaruyama, Takashi / Takita, Hiroshi / Ikeno, Rimon / Osawa, Morimi / Kojima, Yoshinori / Sugatani, Shinji / Hoshino, Hiromi / Hino, Toshio / Ito, Masaru / Iizuka, Tetsuya et al. | 2013
- 868028
-
Reticle level compensation for long range effectsFigueiro, Thiago / Browning, Clyde / Thornton, Martin J. / Vannufel, Cyril / Schiavone, Patrick et al. | 2013
- 868029
-
Preliminary investigation of shot noise, dose, and focus latitude for e-beam direct writeBrodie, Alan / Kojima, Shinichi / McCord, Mark / Grella, Luca / Gubiotti, Thomas / Bevis, Chris et al. | 2013
-
Novel fluorinated compounds for releasing material in nanoimprint lithography [8680-12]Yamashita, T. / Mitsuhashi, H. / Morita, M. / SPIE (Society) et al. | 2013
-
Defect source analysis of directed self-assembly process (DSA of DSA) (Invited Paper) [8680-20]Delgadillo, P.R. / Harukawa, R. / Suri, M. / Durant, S. / Cross, A. / Nagaswami, V.R. / Van Den Heuvel, D. / Gronheid, R. / Nealey, P. / SPIE (Society) et al. | 2013
-
Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip [8680-16]Gubiotti, T. / Sun, J.F. / Freed, R. / Kidwingira, F. / Yang, J. / Bevis, C. / Carroll, A. / Brodie, A. / Tong, W.M. / Lin, S.-J. et al. | 2013
-
Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns [8680-24]Hartley, J.G. / Crosland, N. / Dowling, R.C. / Hoyle, P.C. / McClelland, A. / Turnidge, M. / Smith, J.H. / SPIE (Society) et al. | 2013
-
High performance wire grid polarizers using jet and flash™ imprint lithography [8680-31]Ahn, S. / Yang, J. / Miller, M. / Ganapathisubramanian, M. / Menezes, M. / Choi, J. / Xu, F. / Resnick, D.J. / Sreenivasan, S.V. / SPIE (Society) et al. | 2013
-
Design strategy of small topographical guiding templates for sub-15nm integrated circuits contact hole patterns using block copolymer directed self-assembly [8680-35]Yi, H. / Bao, X.-Y. / Tiberio, R. / Wong, H.-S.P. / SPIE (Society) et al. | 2013
-
Mix & match electron beam & scanning probe lithography for high throughput sub-10 nm lithography [8680-45]Kaestner, M. / Hofer, M. / Rangelow, I.W. / SPIE (Society) et al. | 2013
-
Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration [8680-53]Delgadillo, P.A.R. / Gronheid, R. / Lin, G. / Cao, Y. / Romo, A. / Somervell, M. / Nafus, K. / Nealey, P.F. / SPIE (Society) et al. | 2013
-
Practical study on the electron-beam-only alignment strategy for the electron beam direct writing technology [8680-73]Kojima, Y. / Takahashi, Y. / Ohshio, S. / Sugatani, S. / Kon, J. / SPIE (Society) et al. | 2013
-
Contrast enhanced exposure strategy in multi-beam mask writing [8680-78]Belic, N. / Hofmann, U. / Klikovis, J. / Martens, S. / SPIE (Society) et al. | 2013
-
Computational solution of inverse directed self-assembly problem [8680-34]Latypov, A. / SPIE (Society) et al. | 2013
-
A dose modification strategy of electron beam direct writing considering TDDB reliability in LSI interconnects [8680-47]Midoh, Y. / Osaki, A. / Nakamae, K. / SPIE (Society) et al. | 2013
-
Direct electron beam patterning of sub-5nm monolayer graphene interconnects [8680-83]Qi, Z.J. / Rodriguez-Manzo, J.A. / Hong, S.J. / Park, Y.W. / Stach, E.A. / Drndic, M. / Johnson, A.T.C. / SPIE (Society) et al. | 2013
-
The potential of block copolymer's directed self-assembly for contact hole shrink and contact multiplication [8680-37]Tiron, R. / Gharbi, A. / Argoud, M. / Chevalier, X. / Belledent, J. / Barros, P.P. / Servin, I. / Navarro, C. / Cunge, G. / Barnola, S. et al. | 2013
-
Dissipative particle dynamics study on directed self-assembly in holes [8680-38]Nakano, T. / Matsukuma, M. / Matsuzaki, K. / Muramatsu, M. / Tomita, T. / Kitano, T. / SPIE (Society) et al. | 2013
-
Computational simulation of block copolymer directed self-assembly in small topographical guiding templates [8680-57]Yi, H. / Latypov, A. / Wong, H.-S.P. / SPIE (Society) et al. | 2013
-
Image contrast of line-cut / contact hole features in Complementary E-Beam Lithography (CEBL) [8680-70]Liu, E.D. / Tran, C. / Larn, D.K. / Prescop, T. / SPIE (Society) et al. | 2013
-
Deterministically isolated gratings through the directed self-assembly of block copolymers [8680-33]Doerk, G.S. / Cheng, J.Y. / Rettner, C.T. / Balakrishnan, S. / Arellano, N. / Sanders, D.P. / SPIE (Society) et al. | 2013
-
Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method [8680-40]Kodera, K. / Maeda, S. / Tanaka, S. / Mimotogi, S. / Seino, Y. / Yonemitsu, H. / Sato, H. / Azuma, T. / SPIE (Society) et al. | 2013
-
Orientation and position-controlled block copolymer nanolithography for bit-patterned media [8680-66]Yamamoto, R. / Kanamaru, M. / Sugawara, K. / Sasao, N. / Ootera, Y. / Okino, T. / Hieda, H. / Kihara, N. / Kamata, Y. / Kikitsu, A. et al. | 2013
-
Block-copolymer healing of simple defects in a chemoepitaxial template [8680-63]Patrone, P.N. / Gallatin, G.M. / SPIE (Society) et al. | 2013
-
Exploration of the directed self-assembly based nano-fabrication design space using computational simulations [8680-56]Latypov, A. / Preil, M. / Schmid, G. / Xu, J. / Yi, H. / Yoshimoto, K. / Zou, Y. / SPIE (Society) et al. | 2013
-
0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography [8680-44]Vorbringer-Doroshovets, N. / Balzer, F. / Fuessl, R. / Manske, E. / Kaestner, M. / Schuh, A. / Zoellner, J.-P. / Hofer, M. / Guliyev, E. / Ahmad, A. et al. | 2013
-
Fabrication of 28nm pitch Si fins with DSA lithography (Invited Paper) [8680-51]Schmid, G. / Farrell, R. / Xu, J. / Park, C. / Preil, M. / Chakrapani, V. / Mohanty, N. / Ko, A. / Cicoria, M. / Hetzer, D. et al. | 2013
-
Polymer blends for directed self-assembly [8680-58]Namie, Y. / Anno, Y. / Naruoka, T. / Minegishi, S. / Nagai, T. / Hishiro, Y. / Yamaguchi, Y. / SPIE (Society) et al. | 2013
-
Directed self-assembly process implementation in a 300mm pilot line environment [8680-52]Liu, C.-C. / Estrada-Raygoza, I.C. / Abdallah, J. / Holmes, S. / Yin, Y. / Schepis, A. / Cicoria, M. / Hetzer, D. / Tsai, H. / Guillorn, M. et al. | 2013
-
Effects of block copolymer polydispersity and xN on pattern line edge roughness and line width roughness from directed self-assembly of diblock copolymers [8680-98]Peters, A.J. / Lawson, R.A. / Ludovice, P.J. / Henderson, C.L. / SPIE (Society) et al. | 2013
-
Electron multi-beam technology for mask and wafer writing at 0.1 nm address grid (Keynote Paper) [8680-3]Platzgummer, E. / Klein, C. / Loeschner, H. / SPIE (Society) et al. | 2013
-
Healing LER using directed self-assembly: treatment of EUVL resists with aqueous solutions of block copolymers [8680-8]Chuang, Y.-M. / Cheng, H.-H. / Jack, K. / Whittaker, A. / Blakey, I. / SPIE (Society) et al. | 2013
-
Defect reduction for semiconductor memory applications using jet and flash imprint lithography [8680-11]Ye, Z. / Luo, K. / Irving, J.W. / Lu, X. / Zhang, W. / Fletcher, B. / Liu, W. / Xu, F. / LaBrake, D. / Resnick, D. et al. | 2013
-
Using process monitor wafers to understand directed self-assembly defects [8680-64]Cao, Y. / Her, Y.J. / Delgadillo, P.R. / Vandenbroeck, N. / Gronheid, R. / Chan, B.T. / Hashimoto, Y. / Romo, A. / Somervell, M. / Nafus, K. et al. | 2013
-
A slim column cell of 12nm resolution for wider application of e-beam lithography [8680-72]Yamada, A. / Tanaka, H. / Abe, T. / Shimizu, Y. / SPIE (Society) et al. | 2013
-
Reticle level compensation for long range effects [8680-76]Figueiro, T. / Browning, C. / Thornton, M.J. / Vannufel, C. / Schiavone, P. / SPIE (Society) et al. | 2013
-
Preliminary investigation of shot noise, dose, and focus latitude for e-beam direct write [8680-77]Brodie, A. / Kojima, S. / McCord, M. / Grella, L. / Gubiotti, T. / Bevis, C. / SPIE (Society) et al. | 2013
-
Influence of data volume and EPC on process window in massively parallel e-beam direct write [8680-48]Lin, S.-J. / Liu, P.-Y. / Chen, C.-H. / Wang, W.-C. / Shin, J.-J. / Lin, B.J. / McCord, M.A. / Shriyan, S.K. / SPIE (Society) et al. | 2013
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Influence of high-energy electron irradiation on ultra-low-k characteristics and transistor performance (Invited Paper) [8680-46]Steidel, K. / Choi, K.-H. / Freitag, M. / Gutsch, M. / Hohle, C. / Seidel, R. / Thrun, X. / Werner, T. / SPIE (Society) et al. | 2013
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Dissipative particle dynamics simulations to optimize contact hole shrink process using graphoepitaxial directed self-assembly [8680-55]Sato, H. / Yonemitsu, H. / Seino, Y. / Kato, H. / Kanno, M. / Kobayashi, K. / Kawanishi, A. / Kodera, K. / Azuma, T. / SPIE (Society) et al. | 2013
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Perpendicular orientation of block-co-polymer on controlled neutralization layer [8680-62]Shiono, D. / Kurosawa, T. / Miyashita, K. / Matsumiya, T. / Miyagi, K. / Ohmori, K. / SPIE (Society) et al. | 2013
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Direct-write maskless lithography using patterned oxidation of Si-substrate Induced by femtosecond laser pulses [8680-71]Kiani, A. / Venkatakrishnan, K. / Tan, B. / SPIE (Society) et al. | 2013
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Defectivity study of directed self-assembly of cylindrical diblock copolymers in laterally confined thin channels [8680-41]Kim, B. / Laachi, N. / Fredrickson, G.H. / SPIE (Society) et al. | 2013
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Development of maskless electron-beam lithography using nc-Si electron-emitter array [8680-17]Kojima, A. / Ikegami, N. / Yoshida, T. / Miyaguchi, H. / Muroyama, M. / Noshino, H. / Yoshida, S. / Sugata, M. / Cakir, S. / Ohyi, H. et al. | 2013
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MAPPER: progress toward a high-volume manufacturing system [8680-23]de Boer, G. / Dansberg, M.P. / Jager, R. / Peijster, J.J.M. / Slot, E. / Steenbrink, S.W.H.K. / Wieland, M.J. / SPIE (Society) et al. | 2013
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Scanning probe lithography approach for beyond CMOS devices (Invited Paper) [8680-42]Durrani, Z. / Jones, M. / Kaestner, M. / Hofer, M. / Guliyev, E. / Ahmad, A. / Ivanov, T. / Zoellner, J.-P. / Rangelow, I.W. / SPIE (Society) et al. | 2013
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MAPPER alignment sensor evaluation on process wafers [8680-50]Vergeer, N. / Lattard, L. / de Boer, G. / Couweleers, F. / Dave, D. / Pradelles, J. / Bustos, J. / SPIE (Society) et al. | 2013
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Large-scale dynamics of directed self-assembly defects on chemically pre-patterned surface [8680-54]Yoshimoto, K. / Taniguchi, T. / SPIE (Society) et al. | 2013
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Block co-polymer multiple patterning directed self-assembly on PS-OH brush layer and AFM based nanolithography [8680-69]Oria, L. / de Luzuriaga, A.R. / Alduncin, J.A. / Perez-Murano, F. / SPIE (Society) et al. | 2013
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Sub-22 nm silicon template nanofabrication by advanced spacer patterning technique for NIL applications [8680-79]Park, J.-M. / Park, K.-S. / Kim, D.-P. / Yoo, S.-O. / Lee, J.-H. / SPIE (Society) et al. | 2013
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Process enhancements for negative tone development (NTD) [8680-82]Noya, G. / Yamamoto, K. / Matsumoto, N. / Takemura, Y. / Ishii, M. / Miyamoto, Y. / Nagahara, T. / Pawlowski, G. / SPIE (Society) et al. | 2013
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Scaling-down lithographic dimensions with block-copolymer materials: 10nm-sized features with PS-b-PMMA [8680-5]Chevalier, X. / Nicolet, C. / Tiron, R. / Gharbi, A. / Argoud, M. / Pradelles, J. / Delalande, M. / Cunge, G. / Fleury, G. / Hadziioannou, G. et al. | 2013
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Data delivery system for MAPPER using image compression [8680-25]Yang, J. / Savari, S.A. / SPIE (Society) et al. | 2013
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Patterning process for semiconductor using directed self assembly (Invited Paper) [8680-36]Nam, J. / Kim, E.S. / Kang, D. / Yu, H. / Kim, K. / Yi, S. / Shin, C.-H. / Kang, H.-K. / SPIE (Society) et al. | 2013
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The hole shrink problem: theoretical studies of directed self-assembly in cylindrical confinement [8680-39]Laachi, N. / Delaney, K.T. / Kim, B. / Hur, S.-M. / Bristol, R. / Shykind, D. / Weinheimer, C.J. / Fredrickson, G.H. / SPIE (Society) et al. | 2013
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Alignment strategy for mixed e-beam and optical lithography [8680-67]Duval, P. / Tabatabaie-Alavi, K. / Shaw, D. / St. Germain, A. / SPIE (Society) et al. | 2013
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Practical proof of CP element based design for 14nm node and beyond [8680-75]Maruyama, T. / Takita, H. / Ikeno, R. / Osawa, M. / Kojima, Y. / Sugatani, S. / Hoshino, H. / Hino, T. / Ito, M. / Iizuka, T. et al. | 2013
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A process for low cost wire grid polarizers [8680-80]Watts, M.P.C. / Little, M. / Egan, E. / Hochbaum, A. / Johns, C. / Stephansen, S. / SPIE (Society) et al. | 2013
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Matching of beams on the MAPPER MATRIX tool: a simulation study [8680-18]Belledent, J. / Berglund, G.Z.M. / Brandt, P.L. / Berard-Bergery, S. / Wieland, M.J. / Pain, L. / SPIE (Society) et al. | 2013
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New materials and processes for directed self-assembly [8680-14]Chang, S.-W. / Evans, J.P. / Ge, S. / Ginzburg, V.V. / Kramer, J.W. / Landes, B. / Lee, C. / Meyers, G.F. / Murray, D.J. / Park, J. et al. | 2013
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Multifunctional hardmask neutral layer for directed self-assembly (DSA) patterning [8680-61]Guerrero, D.J. / A.-Hockey, M. / Wang, Y. / Calderas, E. / SPIE (Society) et al. | 2013