Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist (Englisch)
- Neue Suche nach: Schuster, Christine
- Neue Suche nach: Ekindorf, Gerda
- Neue Suche nach: Voigt, Anja
- Neue Suche nach: Schleunitz, Arne
- Neue Suche nach: Grützner, Gabi
- Neue Suche nach: Liddle, J. Alexander
- Neue Suche nach: Ruiz, Ricardo
- Neue Suche nach: Schuster, Christine
- Neue Suche nach: Ekindorf, Gerda
- Neue Suche nach: Voigt, Anja
- Neue Suche nach: Schleunitz, Arne
- Neue Suche nach: Grützner, Gabi
In:
Proc. SPIE
;
12497
; 124970P
;
2023
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Elektronische Ressource
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Titel:Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist
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Beteiligte:Liddle, J. Alexander ( Herausgeber:in ) / Ruiz, Ricardo ( Herausgeber:in ) / Schuster, Christine ( Autor:in ) / Ekindorf, Gerda ( Autor:in ) / Voigt, Anja ( Autor:in ) / Schleunitz, Arne ( Autor:in ) / Grützner, Gabi ( Autor:in )
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Kongress:Novel Patterning Technologies 2023 ; 2023 ; San Jose, California, United States
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Erschienen in:Proc. SPIE ; 12497 ; 124970P
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.05.2023
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ISBN:
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ISSN:
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DOI:
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Medientyp:Aufsatz (Konferenz)
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Format:Elektronische Ressource
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Sprache:Englisch
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Datenquelle:
Inhaltsverzeichnis Konferenzband
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