Photoresist ashing technology using N2/O2 ferrite-core ICP in the dual damascene process (Englisch)
- Neue Suche nach: Kim, Hyoun Woo
- Neue Suche nach: Myung, Ju Hyun
- Neue Suche nach: Lee, Jong Woo
- Neue Suche nach: Kim, Hyung-Sun
- Neue Suche nach: Kim, Keeho
- Neue Suche nach: Jang, Jeong-Yeol
- Neue Suche nach: Yoon, Tae-Ho
- Neue Suche nach: Kim, Sung Kyeong
- Neue Suche nach: Choi, Dae-Kyu
- Neue Suche nach: Chung, Chin-Wook
- Neue Suche nach: Yeom, Geun Young
- Neue Suche nach: Myoung, Jae-Min
- Neue Suche nach: Kim, Hyoung-June
- Neue Suche nach: Kim, Hyoun Woo
- Neue Suche nach: Myung, Ju Hyun
- Neue Suche nach: Lee, Jong Woo
- Neue Suche nach: Kim, Hyung-Sun
- Neue Suche nach: Kim, Keeho
- Neue Suche nach: Jang, Jeong-Yeol
- Neue Suche nach: Yoon, Tae-Ho
- Neue Suche nach: Kim, Sung Kyeong
- Neue Suche nach: Choi, Dae-Kyu
- Neue Suche nach: Chung, Chin-Wook
- Neue Suche nach: Yeom, Geun Young
- Neue Suche nach: Myoung, Jae-Min
- Neue Suche nach: Kim, Hyoung-June
In:
Journal of Materials Science
;
41
, 15
;
5040-5042
;
2006
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Photoresist ashing technology using N2/O2 ferrite-core ICP in the dual damascene process
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Beteiligte:Kim, Hyoun Woo ( Autor:in ) / Myung, Ju Hyun ( Autor:in ) / Lee, Jong Woo ( Autor:in ) / Kim, Hyung-Sun ( Autor:in ) / Kim, Keeho ( Autor:in ) / Jang, Jeong-Yeol ( Autor:in ) / Yoon, Tae-Ho ( Autor:in ) / Kim, Sung Kyeong ( Autor:in ) / Choi, Dae-Kyu ( Autor:in ) / Chung, Chin-Wook ( Autor:in )
-
Erschienen in:Journal of Materials Science ; 41, 15 ; 5040-5042
-
Verlag:
- Neue Suche nach: Kluwer Academic Publishers-Plenum Publishers
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Erscheinungsort:New York
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Erscheinungsdatum:27.05.2006
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Format / Umfang:3 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 41, Ausgabe 15
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