The effect of substrate heating on the tunability of rf-sputtered Bi2O3-ZnO-Nb2O5 thin films (Englisch)
- Neue Suche nach: Ha, S.
- Neue Suche nach: Lee, Y.S.
- Neue Suche nach: Hong, Y.P.
- Neue Suche nach: Lee, H.Y.
- Neue Suche nach: Lee, Y.C.
- Neue Suche nach: Ko, K.H.
- Neue Suche nach: Kim, D.-W.
- Neue Suche nach: Hong, H.B.
- Neue Suche nach: Hong, K.S.
- Neue Suche nach: Ha, S.
- Neue Suche nach: Lee, Y.S.
- Neue Suche nach: Hong, Y.P.
- Neue Suche nach: Lee, H.Y.
- Neue Suche nach: Lee, Y.C.
- Neue Suche nach: Ko, K.H.
- Neue Suche nach: Kim, D.-W.
- Neue Suche nach: Hong, H.B.
- Neue Suche nach: Hong, K.S.
In:
Applied Physics A
;
80
, 3
;
585-590
;
2005
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:The effect of substrate heating on the tunability of rf-sputtered Bi2O3-ZnO-Nb2O5 thin films
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Beteiligte:Ha, S. ( Autor:in ) / Lee, Y.S. ( Autor:in ) / Hong, Y.P. ( Autor:in ) / Lee, H.Y. ( Autor:in ) / Lee, Y.C. ( Autor:in ) / Ko, K.H. ( Autor:in ) / Kim, D.-W. ( Autor:in ) / Hong, H.B. ( Autor:in ) / Hong, K.S. ( Autor:in )
-
Erschienen in:Applied Physics A ; 80, 3 ; 585-590
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Verlag:
- Neue Suche nach: Springer Berlin Heidelberg
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Erscheinungsort:Berlin/Heidelberg
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Erscheinungsdatum:01.02.2005
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Format / Umfang:6 pages
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ISSN:
-
DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 80, Ausgabe 3
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