Effects of chloride, bromide and iodide ions on internal stress in films deposited during high speed nickel electroplating from a nickel sulfamate bath (Englisch)
Nationallizenz
- Neue Suche nach: Tsuru, Y.
- Neue Suche nach: Nomura, M.
- Neue Suche nach: Foulkes, F.R.
- Neue Suche nach: Tsuru, Y.
- Neue Suche nach: Nomura, M.
- Neue Suche nach: Foulkes, F.R.
In:
Journal of Applied Electrochemistry
;
30
, 2
;
231-238
;
2000
- Aufsatz (Zeitschrift) / Elektronische Ressource
-
Titel:Effects of chloride, bromide and iodide ions on internal stress in films deposited during high speed nickel electroplating from a nickel sulfamate bath
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Beteiligte:
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Erschienen in:Journal of Applied Electrochemistry ; 30, 2 ; 231-238
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Verlag:
- Neue Suche nach: Kluwer Academic Publishers
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Erscheinungsort:Dordrecht
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Erscheinungsdatum:01.02.2000
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Format / Umfang:8 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 30, Ausgabe 2
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Calendar| 2000