Structural and Electrical Properties of Ba(ZrxTi1-x)O3 Films Prepared by RF-magnetron Sputtering Using Metal Targets (Englisch)
- Neue Suche nach: Kim, Jin Woong
- Neue Suche nach: Shima, Hiromi
- Neue Suche nach: Funakubo, Hiroshi
- Neue Suche nach: Nishida, Ken
- Neue Suche nach: Yamamoto, Takashi
- Neue Suche nach: Kim, Jin Woong
- Neue Suche nach: Shima, Hiromi
- Neue Suche nach: Funakubo, Hiroshi
- Neue Suche nach: Nishida, Ken
- Neue Suche nach: Yamamoto, Takashi
In:
Integrated Ferroelectrics
;
157
, 1
;
101-113
;
2014
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:Structural and Electrical Properties of Ba(ZrxTi1-x)O3 Films Prepared by RF-magnetron Sputtering Using Metal Targets
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Beteiligte:Kim, Jin Woong ( Autor:in ) / Shima, Hiromi ( Autor:in ) / Funakubo, Hiroshi ( Autor:in ) / Nishida, Ken ( Autor:in ) / Yamamoto, Takashi ( Autor:in )
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Erschienen in:Integrated Ferroelectrics ; 157, 1 ; 101-113
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Verlag:
- Neue Suche nach: Taylor & Francis
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Erscheinungsdatum:13.10.2014
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Format / Umfang:13 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 157, Ausgabe 1
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