Linewidth dependence of electromigration in evaporated Al-0,5% Cu (Englisch)
- Neue Suche nach: Vaidya, S.
- Neue Suche nach: Sheng, T.T.
- Neue Suche nach: Sinha, A.K.
- Neue Suche nach: Vaidya, S.
- Neue Suche nach: Sheng, T.T.
- Neue Suche nach: Sinha, A.K.
In:
Applied Physics Letters
;
36
, 6
;
464-466
;
1980
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Linewidth dependence of electromigration in evaporated Al-0,5% Cu
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Weitere Titelangaben:Abhaengigkeit des Elektrotransports von der Streifenbreite aufgedampfter Al-0,5% Cu-Schichten
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Beteiligte:
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Erschienen in:Applied Physics Letters ; 36, 6 ; 464-466
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Verlag:
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Erscheinungsdatum:1980
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Format / Umfang:3 Seiten, 5 Quellen
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
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